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Atomic layer deposition of high-k dielectrics on III–V semiconductor surfaces

Progress in crystal growth and characterization of materials, 2016-12, Vol.62 (4), p.1-21

Gougousi, Theodosia

2016

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Deposition of yttrium oxide thin films in supercritical carbon dioxide

Thin solid films, 2008-07, Vol.516 (18), p.6197-6204

2008

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In situ infrared spectroscopy study of the interface self-cleaning during the atomic layer deposition of HfO2 on GaAs(100) surfaces

Applied physics letters, 2014-09, Vol.105 (12)

2014

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Properties of atomic layer deposited HfO2 thin films

Thin solid films, 2009-10, Vol.517 (24), p.6576-6583

2009

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Low-Temperature Dopant-Assisted Crystallization of HfO2 Thin Films

Crystal growth & design, 2021-11, Vol.21 (11), p.6411-6416

Gougousi, Theodosia

2021

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Atmospheric pressure plasma enhanced chemical vapor deposition of hydrophobic coatings using fluorine-based liquid precursors

Surface & coatings technology, 2013-11, Vol.234, p.21-32

2013

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Low-Temperature Dopant-Assisted Crystallization of HfO 2 Thin Films

Crystal growth & design, 2021-11, Vol.21 (11), p.6411-6416

Gougousi, Theodosia

2021

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Impact of barrier thickness on transistor performance in AlN/GaN high electron mobility transistors grown on free-standing GaN substrates

Applied physics letters, 2014-09, Vol.105 (9)

2014

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High Electron Velocity Submicrometer AlN/GaN MOS-HEMTs on Freestanding GaN Substrates

IEEE electron device letters, 2013-02, Vol.34 (2), p.199-201

2013

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IEEE_Xplore

Metal Oxide Thin Films Deposited from Metal Organic Precursors in Supercritical CO2 Solutions

Chemistry of materials, 2005-10, Vol.17 (20), p.5093-5100

2005

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Indium Diffusion and Native Oxide Removal during the Atomic Layer Deposition (ALD) of TiO2 Films on InAs(100) Surfaces

ACS applied materials & interfaces, 2013-08, Vol.5 (16), p.8081-8087

2013

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Properties of La-silicate high- K dielectric films formed by oxidation of La on silicon

Journal of applied physics, 2003-02, Vol.93 (3), p.1691-1696

2003

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Diffusion and interface evolution during the atomic layer deposition of TiO2 on GaAs(100) and InAs(100) surfaces

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2016-01, Vol.34 (1)

2016

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Interface Between Atomic Layer Deposition Ta2O5 Films and GaAs(100) Surfaces

Journal of physical chemistry. C, 2012-04, Vol.116 (16), p.8924-8931

2012

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Native oxide transport and removal during the atomic layer deposition of Ta2O5 on InAs(100) surfaces

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2016-05, Vol.34 (3)

2016

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In situ infrared spectroscopy study of the surface reactions during the atomic layer deposition of TiO2 on GaAs (100) surfaces

Applied surface science, 2017-11, Vol.422, p.666-674

2017

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Carbonate formation during post-deposition ambient exposure of high-k dielectrics

Applied physics letters, 2003-10, Vol.83 (17), p.3543-3545

2003

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Diffusion and interface evolution during the atomic layer deposition of TiO{sub 2} on GaAs(100) and InAs(100) surfaces

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2016-01, Vol.34 (1)

2016

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Native oxide transport and removal during the atomic layer deposition of Ta{sub 2}O{sub 5} on InAs(100) surfaces

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2016-05, Vol.34 (3)

2016

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Indium Diffusion and Native Oxide Removal during the Atomic Layer Deposition (ALD) of TiO 2 Films on InAs(100) Surfaces

ACS applied materials & interfaces, 2013-08, Vol.5 (16), p.8081-8087

2013

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Surface Defect Engineering of MoS2 for Atomic Layer Deposition of TiO2 Films

ACS applied materials & interfaces, 2020-10, Vol.12 (42), p.48150-48160

2020

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Tip-enhanced strong coupling spectroscopy, imaging, and control of a single quantum emitter

Science advances, 2019-07, Vol.5 (7), p.eaav5931

2019

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Interface Between Atomic Layer Deposition Ta 2 O 5 Films and GaAs(100) Surfaces

Journal of physical chemistry. C, 2012-04, Vol.116 (16), p.8924-8931

2012

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Surface Defect Engineering of MoS 2 for Atomic Layer Deposition of TiO 2 Films

ACS applied materials & interfaces, 2020-10, Vol.12 (42), p.48150-48160

2020

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Supercritical-carbon dioxide-assisted cyclic deposition of metal oxide and metal thin films

Applied physics letters, 2006-02, Vol.88 (9)

2006

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Atomic layer deposition of high-k dielectrics on III–V semiconductor surfaces

Deposition of yttrium oxide thin films in supercritical carbon dioxide

In situ infrared spectroscopy study of the interface self-cleaning during the atomic layer deposition of HfO2 on GaAs(100) surfaces

Properties of atomic layer deposited HfO2 thin films

Low-Temperature Dopant-Assisted Crystallization of HfO2 Thin Films

Atmospheric pressure plasma enhanced chemical vapor deposition of hydrophobic coatings using fluorine-based liquid precursors

Low-Temperature Dopant-Assisted Crystallization of HfO 2 Thin Films

Impact of barrier thickness on transistor performance in AlN/GaN high electron mobility transistors grown on free-standing GaN substrates

High Electron Velocity Submicrometer AlN/GaN MOS-HEMTs on Freestanding GaN Substrates

Metal Oxide Thin Films Deposited from Metal Organic Precursors in Supercritical CO2 Solutions

Indium Diffusion and Native Oxide Removal during the Atomic Layer Deposition (ALD) of TiO2 Films on InAs(100) Surfaces

Properties of La-silicate high- K dielectric films formed by oxidation of La on silicon

Diffusion and interface evolution during the atomic layer deposition of TiO2 on GaAs(100) and InAs(100) surfaces

Interface Between Atomic Layer Deposition Ta2O5 Films and GaAs(100) Surfaces

Native oxide transport and removal during the atomic layer deposition of Ta2O5 on InAs(100) surfaces

In situ infrared spectroscopy study of the surface reactions during the atomic layer deposition of TiO2 on GaAs (100) surfaces

Carbonate formation during post-deposition ambient exposure of high-k dielectrics

Diffusion and interface evolution during the atomic layer deposition of TiO{sub 2} on GaAs(100) and InAs(100) surfaces

Native oxide transport and removal during the atomic layer deposition of Ta{sub 2}O{sub 5} on InAs(100) surfaces

Indium Diffusion and Native Oxide Removal during the Atomic Layer Deposition (ALD) of TiO 2 Films on InAs(100) Surfaces

Surface Defect Engineering of MoS2 for Atomic Layer Deposition of TiO2 Films

Tip-enhanced strong coupling spectroscopy, imaging, and control of a single quantum emitter

Interface Between Atomic Layer Deposition Ta 2 O 5 Films and GaAs(100) Surfaces

Surface Defect Engineering of MoS 2 for Atomic Layer Deposition of TiO 2 Films

Supercritical-carbon dioxide-assisted cyclic deposition of metal oxide and metal thin films

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