Sie befinden Sich nicht im Netzwerk der Universität Paderborn. Der Zugriff auf elektronische Ressourcen ist gegebenenfalls nur via VPN oder Shibboleth (DFN-AAI) möglich. mehr Informationen...
In this brief, we demonstrate for the first time that the presence of a hybrid channel, which consists of a p + layer below the n + active device layer in a junctionless (JL) FET, leads to a drastically reduced BTBT-induced parasitic BJT action. Using calibrated 2-D simulations, we show that the JLFET with a p + layer [which we call hole sink (HS)] has a significantly low OFF-state leakage current due to an increased tunneling barrier width, an enhanced source-to-channel barrier height, and a better provision for collecting the band-to-band tunneling (BTBT) generated holes, which results in a diminished parasitic BJT action in the OFF-state. Further, the proposed HS JLFET shows an extremely high ON-state to OFF-state current (I ON /I OFF ) ratio of ~10 7 for a channel length of 10 nm and a significant (I ON /I OFF ) ratio of ~10 4 even for a channel length of 5 nm.