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Atomic Layer Deposition of Emerging 2D Semiconductors, HfS2 and ZrS2, for Optoelectronics

Chemistry of materials, 2019-08, Vol.31 (15), p.5713-5724

2019

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Effect of interstitial carbon on the evolution of early-stage irradiation damage in equi-atomic FeMnNiCoCr high-entropy alloys

Journal of applied physics, 2020-01, Vol.127 (2)

2020

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Thermal Atomic Layer Deposition of Continuous and Highly Conducting Gold Thin Films

Chemistry of materials, 2017-07, Vol.29 (14), p.6130-6136

2017

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Magnetism in Nanocrystalline Gold

ACS nano, 2013-08, Vol.7 (8), p.6691-6699

2013

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Studies on Thermal Atomic Layer Deposition of Silver Thin Films

Chemistry of materials, 2017-03, Vol.29 (5), p.2040-2045

2017

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Low-Temperature Atomic Layer Deposition of Cobalt Oxide as an Effective Catalyst for Photoelectrochemical Water-Splitting Devices

Chemistry of materials, 2017-07, Vol.29 (14), p.5796-5805

2017

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Diamine Adduct of Cobalt(II) Chloride as a Precursor for Atomic Layer Deposition of Stoichiometric Cobalt(II) Oxide and Reduction Thereof to Cobalt Metal Thin Films

Chemistry of materials, 2018-05, Vol.30 (10), p.3499-3507

2018

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Atomic Layer Deposition of PbS Thin Films at Low Temperatures

Chemistry of materials, 2020-10, Vol.32 (19), p.8216-8228

2020

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Atomic Layer Deposition of PbI2 Thin Films

Chemistry of materials, 2019-02, Vol.31 (3), p.1101-1109

2019

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Low-Temperature Atomic Layer Deposition of Low-Resistivity Copper Thin Films Using Cu(dmap)2 and Tertiary Butyl Hydrazine

Chemistry of materials, 2017-08, Vol.29 (15), p.6502-6510

2017

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Atomic Layer Deposition of AlF3 Thin Films Using Halide Precursors

Chemistry of materials, 2015-01, Vol.27 (2), p.604-611

2015

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Atomic Layer Deposition of Crystalline MoS2 Thin Films: New Molybdenum Precursor for Low‐Temperature Film Growth

Advanced materials interfaces, 2017-09, Vol.4 (18), p.n/a

2017

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Atomic Layer Deposition of Molybdenum and Tungsten Oxide Thin Films Using Heteroleptic Imido-Amidinato Precursors: Process Development, Film Characterization, and Gas Sensing Properties

Chemistry of materials, 2018-12, Vol.30 (23), p.8690-8701

2018

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Nucleation and Conformality of Iridium and Iridium Oxide Thin Films Grown by Atomic Layer Deposition

Langmuir, 2016-10, Vol.32 (41), p.10559-10569

2016

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Nickel Germanide Thin Films by Atomic Layer Deposition

Chemistry of materials, 2019-07, Vol.31 (14), p.5314-5319

2019

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Heteroleptic Cyclopentadienyl-Amidinate Precursors for Atomic Layer Deposition (ALD) of Y, Pr, Gd, and Dy Oxide Thin Films

Chemistry of materials, 2016-08, Vol.28 (15), p.5440-5449

2016

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Radiation resistance diagnostics of wide-gap optical materials

Optical materials, 2016-05, Vol.55, p.164-167

2016

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Atomic Layer Deposition of Iridium Thin Films Using Sequential Oxygen and Hydrogen Pulses

Journal of physical chemistry. C, 2016-07, Vol.120 (28), p.15235-15243

2016

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Toward Developing TechniquesAgnostic Machine Learning Classification Models for Forensically Relevant Glass Fragments

Journal of chemical information and modeling, 2023-01, Vol.63 (1), p.87-100

2023

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Low‐Temperature Wafer‐Scale Deposition of Continuous 2D SnS2 Films

Small (Weinheim an der Bergstrasse, Germany), 2018-05, Vol.14 (21), p.e1800547-n/a

2018

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Atomic Layer Deposition of Photoconductive Cu2O Thin Films

ACS omega, 2019-06, Vol.4 (6), p.11205-11214

2019

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Electric and Magnetic Properties of ALD-Grown BiFeO3 Films

Journal of physical chemistry. C, 2016-04, Vol.120 (13), p.7313-7322

2016

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Preparation of Lithium Containing Oxides by the Solid State Reaction of Atomic Layer Deposited Thin Films

Chemistry of materials, 2017-02, Vol.29 (3), p.998-1005

2017

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Charge state optimisation for beryllium accelerator mass spectrometry

Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 2020-04, Vol.469, p.33-36

2020

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Crystalline tungsten sulfide thin films by atomic layer deposition and mild annealing

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2019-03, Vol.37 (2)

2019

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Atomic Layer Deposition of Emerging 2D Semiconductors, HfS2 and ZrS2, for Optoelectronics

Effect of interstitial carbon on the evolution of early-stage irradiation damage in equi-atomic FeMnNiCoCr high-entropy alloys

Thermal Atomic Layer Deposition of Continuous and Highly Conducting Gold Thin Films

Magnetism in Nanocrystalline Gold

Studies on Thermal Atomic Layer Deposition of Silver Thin Films

Low-Temperature Atomic Layer Deposition of Cobalt Oxide as an Effective Catalyst for Photoelectrochemical Water-Splitting Devices

Diamine Adduct of Cobalt(II) Chloride as a Precursor for Atomic Layer Deposition of Stoichiometric Cobalt(II) Oxide and Reduction Thereof to Cobalt Metal Thin Films

Atomic Layer Deposition of PbS Thin Films at Low Temperatures

Atomic Layer Deposition of PbI2 Thin Films

Low-Temperature Atomic Layer Deposition of Low-Resistivity Copper Thin Films Using Cu(dmap)2 and Tertiary Butyl Hydrazine

Atomic Layer Deposition of AlF3 Thin Films Using Halide Precursors

Atomic Layer Deposition of Crystalline MoS2 Thin Films: New Molybdenum Precursor for Low‐Temperature Film Growth

Atomic Layer Deposition of Molybdenum and Tungsten Oxide Thin Films Using Heteroleptic Imido-Amidinato Precursors: Process Development, Film Characterization, and Gas Sensing Properties

Nucleation and Conformality of Iridium and Iridium Oxide Thin Films Grown by Atomic Layer Deposition

Nickel Germanide Thin Films by Atomic Layer Deposition

Heteroleptic Cyclopentadienyl-Amidinate Precursors for Atomic Layer Deposition (ALD) of Y, Pr, Gd, and Dy Oxide Thin Films

Radiation resistance diagnostics of wide-gap optical materials

Atomic Layer Deposition of Iridium Thin Films Using Sequential Oxygen and Hydrogen Pulses

Toward Developing TechniquesAgnostic Machine Learning Classification Models for Forensically Relevant Glass Fragments

Low‐Temperature Wafer‐Scale Deposition of Continuous 2D SnS2 Films

Atomic Layer Deposition of Photoconductive Cu2O Thin Films

Electric and Magnetic Properties of ALD-Grown BiFeO3 Films

Preparation of Lithium Containing Oxides by the Solid State Reaction of Atomic Layer Deposited Thin Films

Charge state optimisation for beryllium accelerator mass spectrometry

Crystalline tungsten sulfide thin films by atomic layer deposition and mild annealing

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