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Nitridation of niobium oxide films by rapid thermal processing

Analytical and bioanalytical chemistry, 2008-03, Vol.390 (6), p.1507-1515

2008

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Formation of tantalum nitride films by rapid thermal processing

Thin solid films, 2003-08, Vol.437 (1), p.108-115

2003

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A combined SNMS and EFTEM/EELS study on focused ion beam prepared vanadium nitride thin films

Applied surface science, 2005-09, Vol.252 (1), p.66-76

2005

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Formation of niobium oxynitrides by rapid thermal processing (RTP)

Applied surface science, 2005-09, Vol.252 (1), p.205-210

2005

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Annealing of thin B/Nb₂N bilayers, B/Nb bilayers and Nb/B/Nb trilayers via rapid thermal processing (RTP)

Analytical and bioanalytical chemistry, 2008-03, Vol.390 (6), p.1517-1525

2008

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Niobium nitride films formed by rapid thermal processing (RTP): a study of depth profiles and interface reactions by complementary analytical techniques

Analytical and bioanalytical chemistry, 2004-06, Vol.379 (4), p.554-567

2004

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Formation of vanadium nitride by rapid thermal processing

Thin solid films, 1999-07, Vol.349 (1-2), p.14-18

1999

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Comparing the chemical properties of evaporated and sputtered niobium films on oxidized Si(1 0 0) wafers – preparation of oxynitride films

Applied surface science, 2005-09, Vol.252 (1), p.177-184

2005

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Formation of niobium nitride by rapid thermal processing

Spectrochimica acta. Part A, Molecular and biomolecular spectroscopy, 2001-09, Vol.57 (10), p.2077-2089

2001

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Analysis of Time-Dependent Haze on Silicon Surfaces

Journal of the Electrochemical Society, 2003-03, Vol.150 (3), p.G192

2003

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Formation and nitridation of vanadium-aluminum intermetallic compounds

Analytical and bioanalytical chemistry, 2002-10, Vol.374 (4), p.724-731

2002

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Decoration and preferential etching of crystal defects in silicon materials: influence of metal decoration on the defect etching process

Physica status solidi. C, 2011-03, Vol.8 (3), p.788-791

2011

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Nitridation of vanadium in molecular nitrogen: a comparison of rapid thermal processing (RTP) and conventional furnace annealing

Vacuum, 2001-05, Vol.61 (2), p.479-484

2001

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Influence of silicon crystal defects and contamination on the electrical behavior of power devices

Solid-state electronics, 1998-12, Vol.42 (12), p.2187-2197

1998

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Total-reflection X-ray fluorescence study of electrochemical deposition of metals on a glass-ceramic carbon electrode surface

Spectrochimica acta. Part B: Atomic spectroscopy, 2001-11, Vol.56 (11), p.2117-2126

2001

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Trace element determination in drugs by total-reflection X-ray fluorescence spectrometry

Spectrochimica acta. Part B : Atomic spectroscopy, 1997-07, Vol.52 (7), p.961-965

1997

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Alkaline cleaning of silicon wafers: additives for the prevention of metal contamination

Microelectronic engineering, 1999-07, Vol.45 (2-3), p.197-208

1999

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Depth distribution of zinc adsorbed on silicon surfaces out of alkaline aqueous solutions

Applied surface science, 1998-05, Vol.133 (1), p.73-83

1998

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Determination of metal-cofactors in enzyme complexes by total-reflection X-ray fluorescence spectrometry

Spectrochimica acta. Part B : Atomic spectroscopy, 1997-07, Vol.52 (7), p.1033-1038

1997

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Analytical Tools for the Characterization of Power Devices

Journal of the Electrochemical Society, 2000-10, Vol.147 (10), p.3879

2000

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Thin niobium/boron bilayers and multilayers annealed via Rapid Thermal Processing (RTP)

Physica status solidi. C, 2007-05, Vol.4 (6), p.1852-1858

2007

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Total-reflection X-ray fluorescence spectrometry, a powerful tool for semiquantitative analysis of archaeological glass samples

Spectrochimica acta. Part B : Atomic spectroscopy, 1997-07, Vol.52 (7), p.1057-1061

1997

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Characterization of transition metal nitride formation in rapid thermal processing (RTP)

Fresenius' journal of analytical chemistry, 1999-09, Vol.365 (1-3), p.199-202

1999

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Capability and limitations of the determination of sulfur in inorganic and biological matrices by total reflection X-ray fluorescence spectrometry

SPECTROCHIM. ACTA PART B AT. SPECTROSC, 2001-11, Vol.56 (11), p.2165-2173

2001

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A Dislocation Formation Model of Trench‐Induced Dislocations in Dynamic Random Access Memories

Journal of the Electrochemical Society, 1996-01, Vol.143 (1), p.210-215

1996

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Nitridation of niobium oxide films by rapid thermal processing

Formation of tantalum nitride films by rapid thermal processing

A combined SNMS and EFTEM/EELS study on focused ion beam prepared vanadium nitride thin films

Formation of niobium oxynitrides by rapid thermal processing (RTP)

Annealing of thin B/Nb₂N bilayers, B/Nb bilayers and Nb/B/Nb trilayers via rapid thermal processing (RTP)

Niobium nitride films formed by rapid thermal processing (RTP): a study of depth profiles and interface reactions by complementary analytical techniques

Formation of vanadium nitride by rapid thermal processing

Comparing the chemical properties of evaporated and sputtered niobium films on oxidized Si(1 0 0) wafers – preparation of oxynitride films

Formation of niobium nitride by rapid thermal processing

Analysis of Time-Dependent Haze on Silicon Surfaces

Formation and nitridation of vanadium-aluminum intermetallic compounds

Decoration and preferential etching of crystal defects in silicon materials: influence of metal decoration on the defect etching process

Nitridation of vanadium in molecular nitrogen: a comparison of rapid thermal processing (RTP) and conventional furnace annealing

Influence of silicon crystal defects and contamination on the electrical behavior of power devices

Total-reflection X-ray fluorescence study of electrochemical deposition of metals on a glass-ceramic carbon electrode surface

Trace element determination in drugs by total-reflection X-ray fluorescence spectrometry

Alkaline cleaning of silicon wafers: additives for the prevention of metal contamination

Depth distribution of zinc adsorbed on silicon surfaces out of alkaline aqueous solutions

Determination of metal-cofactors in enzyme complexes by total-reflection X-ray fluorescence spectrometry

Analytical Tools for the Characterization of Power Devices

Thin niobium/boron bilayers and multilayers annealed via Rapid Thermal Processing (RTP)

Total-reflection X-ray fluorescence spectrometry, a powerful tool for semiquantitative analysis of archaeological glass samples

Characterization of transition metal nitride formation in rapid thermal processing (RTP)

Capability and limitations of the determination of sulfur in inorganic and biological matrices by total reflection X-ray fluorescence spectrometry

A Dislocation Formation Model of Trench‐Induced Dislocations in Dynamic Random Access Memories

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