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Analysis of high-rate a-Si:H deposition in a VHF plasma

Journal of physics. D, Applied physics, 1993-10, Vol.26 (10), p.1781-1786

1993

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Plasma-assisted partial oxidation of methane to synthesis gas in a dielectric barrier discharge

Applied catalysis. A, General, 2004-04, Vol.261 (1), p.19-24

2004

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Role of higher silanes in the plasma-induced deposition of amorphous silicon from silane

Applied physics letters, 1989-04, Vol.54 (14), p.1320-1322

1989

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Detection of SiH2 radicals in an a-Si:H deposition plasma by laser-induced fluorescence

Journal of physics. D, Applied physics, 1995-12, Vol.28 (12), p.2470-2472

1995

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Atomic scale study of local TiSi2/Si epitaxies

Journal of applied physics, 1990-02, Vol.67 (4), p.1820-1825

1990

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Characterization of polycrystalline and amorphous silicon films by angle-resolved light scattering

Journal of physics. D, Applied physics, 1993-02, Vol.26 (2), p.271-280

1993

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Oxygen impurity effects on the formation of thin titanium silicide films by rapid thermal annealing

Journal of physics. D, Applied physics, 1990-08, Vol.23 (8), p.1076-1081

1990

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New diagnostic aspects of high rate a-Si:H deposition in a VHF plasma

Journal of non-crystalline solids, 1996, Vol.198200, p.1038-1041

1996

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Surface functionalisation of carbon nano-fibres in fluidised bed plasma

Surface & coatings technology, 2003, Vol.174-75, p.831-834

2003

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Control of a-Si:H deposition by the ion flux in a VHF plasma

Journal of non-crystalline solids, 1993, Vol.164-66, p.55-58

1993

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Properties of amorphous boron nitride thin films

Journal of non-crystalline solids, 1996, Vol.198200, p.403-406

1996

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Laser induced nucleation and growth of polycrystalline silicon

Journal of non-crystalline solids, 1996, Vol.198200, p.887-890

1996

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Deposition of a-Si:H with the hot-wire technique

Journal of non-crystalline solids, 1993, Vol.164-66, p.83-86

1993

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Surface controlled plasma deposition and etching of silicon near the chemical equilibrium

Journal of non-crystalline solids, 1993, Vol.164-66, p.985-988

1993

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Amorphous hydrogenated silicon carbon from VHF deposition

Journal of non-crystalline solids, 1993, Vol.164-66, p.1031-1034

1993

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Thermally induced changes of conductivity in undoped and doped amorphous germanium

Journal of non-crystalline solids, 1991, Vol.137-38, p.187-190

1991

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Infrared spectroscopy during hydrogen effusion of a-Si:H, a-SiGe:H and a-Ge:H

Journal of non-crystalline solids, 1991, Vol.137-38, p.49-52

1991

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The sulphoxide moiety of substituted benzimidazoles is essential for inhibition of parietal cell K+/H+‐ATPase

British journal of pharmacology, 1986-06, Vol.88 (2), p.389-395

1986

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Measurement of the angular distributions of particles in air showers

Physical review. D, Particles and fields, 1992-10, Vol.46 (7), p.2831-2845

1992

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Analysis of high-rate a-Si:H deposition in a VHF plasma

Plasma-assisted partial oxidation of methane to synthesis gas in a dielectric barrier discharge

Role of higher silanes in the plasma-induced deposition of amorphous silicon from silane

Detection of SiH2 radicals in an a-Si:H deposition plasma by laser-induced fluorescence

Atomic scale study of local TiSi2/Si epitaxies

Characterization of polycrystalline and amorphous silicon films by angle-resolved light scattering

Oxygen impurity effects on the formation of thin titanium silicide films by rapid thermal annealing

New diagnostic aspects of high rate a-Si:H deposition in a VHF plasma

Surface functionalisation of carbon nano-fibres in fluidised bed plasma

Control of a-Si:H deposition by the ion flux in a VHF plasma

Properties of amorphous boron nitride thin films

Laser induced nucleation and growth of polycrystalline silicon

Deposition of a-Si:H with the hot-wire technique

Surface controlled plasma deposition and etching of silicon near the chemical equilibrium

Amorphous hydrogenated silicon carbon from VHF deposition

Thermally induced changes of conductivity in undoped and doped amorphous germanium

Infrared spectroscopy during hydrogen effusion of a-Si:H, a-SiGe:H and a-Ge:H

The sulphoxide moiety of substituted benzimidazoles is essential for inhibition of parietal cell K+/H+‐ATPase

Measurement of the angular distributions of particles in air showers

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