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Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion

Thin solid films, 2014-02, Vol.552, p.124-135

2014

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Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors

Thin solid films, 2014-05, Vol.558, p.93-98

2014

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Saturation profile measurement of atomic layer deposited film by X-ray microanalysis on lateral high-aspect-ratio structure

Applied surface science advances, 2021-09, Vol.5, p.100102, Article 100102

2021

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Comparison of Conventional and Lignin-Rich Microcrystalline Cellulose

Bioresources, 2016-05, Vol.11 (2), p.4037-4054

2016

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Saturation profile based conformality analysis for atomic layer deposition: aluminum oxide in lateral high-aspect-ratio channels

Physical chemistry chemical physics : PCCP, 2020-10, Vol.22 (4), p.2317-2312

2020

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Atomic Layer Deposition of Zinc Oxide on Mesoporous Zirconia Using Zinc(II) Acetylacetonate and Air

Chemistry of materials, 2023-10, Vol.35 (19), p.7915-7930

2023

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Nickel Supported on Mesoporous Zirconium Oxide by Atomic Layer Deposition: Initial Fixed-Bed Reactor Study

Topics in catalysis, 2019-08, Vol.62 (7-11), p.611-620

2019

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Aluminum oxide/titanium dioxide nanolaminates grown by atomic layer deposition: Growth and mechanical properties

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2017-01, Vol.35 (1)

2017

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Viscoelasticity and water plasticization of polymer-cellulose composite films and paper sheets

Cellulose (London), 2010-04, Vol.17 (2), p.375-385

2010

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Tribological properties of thin films made by atomic layer deposition sliding against silicon

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2018-01, Vol.36 (1)

2018

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On the reliability of nanoindentation hardness of Al2O3 films grown on Si-wafer by atomic layer deposition

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2014-01, Vol.32 (1)

2014

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On the reliability of nanoindentation hardness of Al{sub 2}O{sub 3} films grown on Si-wafer by atomic layer deposition

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2014-01, Vol.32 (1)

2014

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ChemInform Abstract: Oxygen in Silicon

ChemInform, 2011-02, Vol.42 (7), p.no-no

Haimi, Eero

2011

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Chapter Four - Oxygen in Silicon

Handbook of Silicon Based MEMS Materials and Technologies, 2010, p.59-69

Haimi, Eero

2010

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Evolution of surface roughness in KOH etching of silicon caused by material defects

Sensors and materials, 2003, Vol.15 (1), p.37-42

2003

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Oxygen in Silicon

Handbook of Silicon Based MEMS Materials and Technologies, 2010, p.1-1

2010

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Characterisation of interfacial layer between nitrogen alloyed stainless steel and alumina in a metal matrix composite

Scripta metallurgica et materialia, 1994-05, Vol.30 (10), p.1333-1336

1994

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Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion

Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors

Saturation profile measurement of atomic layer deposited film by X-ray microanalysis on lateral high-aspect-ratio structure

Comparison of Conventional and Lignin-Rich Microcrystalline Cellulose

Saturation profile based conformality analysis for atomic layer deposition: aluminum oxide in lateral high-aspect-ratio channels

Atomic Layer Deposition of Zinc Oxide on Mesoporous Zirconia Using Zinc(II) Acetylacetonate and Air

Nickel Supported on Mesoporous Zirconium Oxide by Atomic Layer Deposition: Initial Fixed-Bed Reactor Study

Aluminum oxide/titanium dioxide nanolaminates grown by atomic layer deposition: Growth and mechanical properties

Viscoelasticity and water plasticization of polymer-cellulose composite films and paper sheets

Tribological properties of thin films made by atomic layer deposition sliding against silicon

On the reliability of nanoindentation hardness of Al2O3 films grown on Si-wafer by atomic layer deposition

On the reliability of nanoindentation hardness of Al{sub 2}O{sub 3} films grown on Si-wafer by atomic layer deposition

ChemInform Abstract: Oxygen in Silicon

Chapter Four - Oxygen in Silicon

Evolution of surface roughness in KOH etching of silicon caused by material defects

Oxygen in Silicon

Characterisation of interfacial layer between nitrogen alloyed stainless steel and alumina in a metal matrix composite

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