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Atomic layer deposition meets metal–organic frameworks

Progress in materials science, 2023-09, Vol.138, p.101159, Article 101159

2023

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A multisociety Delphi consensus statement on new fatty liver disease nomenclature

Journal of hepatology, 2023-12, Vol.79 (6), p.1542-1556

2023

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Insulin-like growth factor-binding protein7 exacerbates inflammatory response and lipid metabolism imbalance in alcohol-associated liver disease

Free radical biology & medicine, 2024-09

2024

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Energy-enhanced atomic layer deposition for more process and precursor versatility

Coordination chemistry reviews, 2013-12, Vol.257 (23-24), p.3254-3270

2013

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Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD

Chemical vapor deposition, 2013-06, Vol.19 (4-6), p.125-133

2013

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Enhanced dielectric deposition on single-layer MoS2 with low damage using remote N2 plasma treatment

Nanotechnology, 2017-04, Vol.28 (17), p.175202-175202

2017

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Batch ALD: Characteristics, comparison with single wafer ALD, and examples

Surface & coatings technology, 2007-09, Vol.201 (22), p.8899-8907

2007

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Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma

ACS applied materials & interfaces, 2015-09, Vol.7 (35), p.19857-19862

2015

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Portal Fibrosis and the Ductular Reaction: Pathophysiological Role in the Progression of Liver Disease and Translational Opportunities

Gastroenterology (New York, N.Y. 1943), 2024-09

2024

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Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors

Journal of alloys and compounds, 2018-02, Vol.735, p.1181-1188

2018

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Adaptive Type-2 Fuzzy Filter with Kernel Density Estimation for Impulse Noise Removal

IEEE transactions on fuzzy systems, 2024-09, p.1-7

2024

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Scaling Atomic Layer Deposition to Astronomical Optic Sizes: Low-Temperature Aluminum Oxide in a Meter-Sized Chamber

ACS applied materials & interfaces, 2018-12, Vol.10 (48), p.41678-41689

2018

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21.16%-efficiency p-type TOPCon solar cell with ALD-Al2O3/MoOx/Ag as a hole-selective passivating contact

Solar energy, 2022-11, Vol.247, p.171-176

2022

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Al2O3/ \beta -Ga2O3(-201) Interface Improvement Through Piranha Pretreatment and Postdeposition Annealing

IEEE electron device letters, 2016-11, Vol.37 (11), p.1411-1414

2016

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Optimizing process conditions for improved Hf1−xZrxO2 ferroelectric capacitor performance

Microelectronic engineering, 2017-06, Vol.178, p.48-51

2017

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The impact of thickness and thermal annealing on refractive index for aluminum oxide thin films deposited by atomic layer deposition

Nanoscale research letters, 2015-02, Vol.10 (1), p.46-46, Article 46

2015

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H2O-based atomic layer deposition mechanism of aluminum oxide using trimethylaluminum

Surface science, 2024-12, Vol.750, p.122580, Article 122580

2024

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Coordination and organometallic precursors of group 10 and 11: Focused electron beam induced deposition of metals and insight gained from chemical vapour deposition, atomic layer deposition, and fundamental surface and gas phase studies

Coordination chemistry reviews, 2022-05, Vol.458, p.213851, Article 213851

2022

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Recent advances in the growth of gallium oxide thin films employing various growth techniques—a review

Journal of physics. D, Applied physics, 2021-11, Vol.54 (45), p.453002

2021

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Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies

ACS applied materials & interfaces, 2017-01, Vol.9 (2), p.1858-1869

2017

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The effect of STAT1, miR-99b, and MAP2K1 in alcoholic liver disease (ALD) mouse model and hepatocyte

Aging (Albany, NY.), 2024-02, Vol.16 (5), p.4224-4235

2024

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Encapsulation Methods for Control of Catalyst Deactivation: A Review

ACS catalysis, 2020-07, Vol.10 (14), p.7630-7656

2020

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Computational fluid dynamics study of the atomic layer deposition process around cylindrical and planar configurations

Chemical engineering science, 2023-08, Vol.277, p.118862, Article 118862

2023

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Stabilizing the Interface of NASICON Solid Electrolyte against Li Metal with Atomic Layer Deposition

ACS applied materials & interfaces, 2018-09, Vol.10 (37), p.31240-31248

2018

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Inherently Area‐Selective Atomic Layer Deposition of SiO2 Thin Films to Confer Oxide Versus Nitride Selectivity

Advanced functional materials, 2021-08, Vol.31 (33), p.n/a

2021

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Atomic layer deposition meets metal–organic frameworks

A multisociety Delphi consensus statement on new fatty liver disease nomenclature

Insulin-like growth factor-binding protein7 exacerbates inflammatory response and lipid metabolism imbalance in alcohol-associated liver disease

Energy-enhanced atomic layer deposition for more process and precursor versatility

Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD

Enhanced dielectric deposition on single-layer MoS2 with low damage using remote N2 plasma treatment

Batch ALD: Characteristics, comparison with single wafer ALD, and examples

Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma

Portal Fibrosis and the Ductular Reaction: Pathophysiological Role in the Progression of Liver Disease and Translational Opportunities

Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors

Adaptive Type-2 Fuzzy Filter with Kernel Density Estimation for Impulse Noise Removal

Scaling Atomic Layer Deposition to Astronomical Optic Sizes: Low-Temperature Aluminum Oxide in a Meter-Sized Chamber

21.16%-efficiency p-type TOPCon solar cell with ALD-Al2O3/MoOx/Ag as a hole-selective passivating contact

Al2O3/ \beta -Ga2O3(-201) Interface Improvement Through Piranha Pretreatment and Postdeposition Annealing

Optimizing process conditions for improved Hf1−xZrxO2 ferroelectric capacitor performance

The impact of thickness and thermal annealing on refractive index for aluminum oxide thin films deposited by atomic layer deposition

H2O-based atomic layer deposition mechanism of aluminum oxide using trimethylaluminum

Coordination and organometallic precursors of group 10 and 11: Focused electron beam induced deposition of metals and insight gained from chemical vapour deposition, atomic layer deposition, and fundamental surface and gas phase studies

Recent advances in the growth of gallium oxide thin films employing various growth techniques—a review

Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies

The effect of STAT1, miR-99b, and MAP2K1 in alcoholic liver disease (ALD) mouse model and hepatocyte

Encapsulation Methods for Control of Catalyst Deactivation: A Review

Computational fluid dynamics study of the atomic layer deposition process around cylindrical and planar configurations

Stabilizing the Interface of NASICON Solid Electrolyte against Li Metal with Atomic Layer Deposition

Inherently Area‐Selective Atomic Layer Deposition of SiO2 Thin Films to Confer Oxide Versus Nitride Selectivity

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