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Electrostatically driven microgripper

Microelectronic engineering, 2002-07, Vol.61, p.1015-1023

2002

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Quasi-monolithic integration of silicon-MEMS with piezoelectric actuators for high-speed non-contact atomic force microscopy

Measurement science & technology, 2012-07, Vol.23 (7), p.74012-1-8

2012

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High speed quasi-monolithic silicon/piezostack SPM scanning sta

Microelectronic engineering, 2012, Vol.98, p.520-523

2012

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Piezoresistive and self-actuated 128-cantilever arrays for nanotechnology applications

Microelectronic engineering, 2007-05, Vol.84 (5), p.1260-1264

2007

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Duo-action electro thermal micro gripper

Microelectronic engineering, 2007-05, Vol.84 (5), p.1329-1332

2007

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Integrated plasma processing simulation framework, linking tool scale plasma models with 2D feature scale etch simulator

Microelectronic engineering, 2009-04, Vol.86 (4), p.976-978

2009

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Aspect ratio dependent plasma polymer deposition of fluorocarbons

Microelectronic engineering, 2006-04, Vol.83 (4), p.1174-1177

2006

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New method for the precise flux calculation of neutrals for arbitrary surfaces in profile etch simulations

Microelectronic engineering, 2008-05, Vol.85 (5-6), p.982-984

2008

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Characterization of an electro-thermal micro gripper and tip sharpening using FIB technique

Microsystem technologies : sensors, actuators, systems integration, 2010-11, Vol.16 (11), p.1901-1908

2010

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The application of secondary effects in high aspect ratio dry etching for the fabrication of MEMS

Microelectronic engineering, 2001-09, Vol.57, p.641-650

2001

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Micro-fluidic analysis based on total internal light reflection

Microelectronic engineering, 2006-04, Vol.83 (4), p.1294-1297

2006

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High speed quasi-monolithic silicon/piezostack SPM scanning stage

Microelectronic engineering, 2012-10, Vol.98, p.520-523

2012

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The influence of reactant transport on the profiles of gas chopping etching processes: a simulation approach

Microelectronic engineering, 2003-06, Vol.67, p.338-348

2003

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Profile simulation of gas chopping based etching processes

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2002-11, Vol.20 (6), p.3111-3117

2002

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Nanostructuring of Mo/Si multilayers by means of reactive ion etching using a three-level mask

Thin solid films, 2004-06, Vol.458 (1), p.227-232

2004

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856 A Pilot Study of a Point-of-care Wound Bed Assay to Predict Graft Take

Journal of burn care & research, 2020-03, Vol.41 (Supplement_1), p.S266-S266

2020

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Evaluation and fabrication of AFM array for ESA-Midas/Rosetta space mission

Microelectronic engineering, 2001-09, Vol.57, p.825-831

2001

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The heavy ion micro-projection setup at Bochum

Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 2001-07, Vol.181 (1), p.39-43

2001

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Noncontacting laser-based techniques for the determination of elastic constants of thin silicon membranes

Microelectronic engineering, 2001-09, Vol.57, p.475-479

2001

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Fabrication of open stencil masks with asymmetric void ratio for the ion projection lithography space charge experiment

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2000-11, Vol.18 (6), p.3202-3206

2000

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Electron transport in laterally confined phosphorus δ layers in silicon

Physical review. B, Condensed matter and materials physics, 2006-10, Vol.74 (15), Article 153311

2006

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Dry etching with gas chopping without rippled sidewalls

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1999-11, Vol.17 (6), p.2768-2771

1999

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Micromachined piezoresistive proximal probe with integrated bimorph actuator for aligned single ion implantation

Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 2006-11, Vol.24 (6), p.3148-3151

2006

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High-energy ion projection for deep ion implantation as a low cost high throughput alternative for subsequent epitaxy processes

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2004-01, Vol.22 (1), p.152-157

2004

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Heavy ion projection beam system for material modification at high ion energy

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2002-01, Vol.20 (1), p.246-249

2002

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Electrostatically driven microgripper

Quasi-monolithic integration of silicon-MEMS with piezoelectric actuators for high-speed non-contact atomic force microscopy

High speed quasi-monolithic silicon/piezostack SPM scanning sta

Piezoresistive and self-actuated 128-cantilever arrays for nanotechnology applications

Duo-action electro thermal micro gripper

Integrated plasma processing simulation framework, linking tool scale plasma models with 2D feature scale etch simulator

Aspect ratio dependent plasma polymer deposition of fluorocarbons

New method for the precise flux calculation of neutrals for arbitrary surfaces in profile etch simulations

Characterization of an electro-thermal micro gripper and tip sharpening using FIB technique

The application of secondary effects in high aspect ratio dry etching for the fabrication of MEMS

Micro-fluidic analysis based on total internal light reflection

High speed quasi-monolithic silicon/piezostack SPM scanning stage

The influence of reactant transport on the profiles of gas chopping etching processes: a simulation approach

Profile simulation of gas chopping based etching processes

Nanostructuring of Mo/Si multilayers by means of reactive ion etching using a three-level mask

856 A Pilot Study of a Point-of-care Wound Bed Assay to Predict Graft Take

Evaluation and fabrication of AFM array for ESA-Midas/Rosetta space mission

The heavy ion micro-projection setup at Bochum

Noncontacting laser-based techniques for the determination of elastic constants of thin silicon membranes

Fabrication of open stencil masks with asymmetric void ratio for the ion projection lithography space charge experiment

Electron transport in laterally confined phosphorus δ layers in silicon

Dry etching with gas chopping without rippled sidewalls

Micromachined piezoresistive proximal probe with integrated bimorph actuator for aligned single ion implantation

High-energy ion projection for deep ion implantation as a low cost high throughput alternative for subsequent epitaxy processes

Heavy ion projection beam system for material modification at high ion energy

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