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Investigation of Imprint in FE-HfO₂ and Its Recovery

IEEE transactions on electron devices, 2020-11, Vol.67 (11), p.4911-4917

2020

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Streptococcus pneumoniae infection suppresses allergic airways disease by inducing regulatory T-cells

The European respiratory journal, 2011, Vol.37 (1), p.53-64

2011

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Nanocrystalline TiO2 films studied by optical, XRD and FTIR spectroscopy

Journal of non-crystalline solids, 2002-05, Vol.303 (1), p.134-138

2002

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First principles investigation of charge transition levels in monoclinic, orthorhombic, tetragonal, and cubic crystallographic phases of HfO2

Journal of applied physics, 2021-02, Vol.129 (8)

2021

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Defect profiling in FEFET Si:HfO2 layers

Applied physics letters, 2020-11, Vol.117 (20)

2020

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Impact of Charge Trapping and Depolarization on Data Retention Using Simultaneous P-V and I-V in HfO₂-Based Ferroelectric FET

IEEE transactions on electron devices, 2021-09, Vol.68 (9), p.4391-4396

2021

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Biomechanical and ergonomic risks associated with cervical musculoskeletal dysfunction amongst surgeons: A systematic review

The surgeon (Edinburgh), 2024-06, Vol.22 (3), p.143-149

2024

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Current trends in craniofacial reconstruction

The surgeon (Edinburgh), 2023-06, Vol.21 (3), p.e118-e125

2023

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Deep-level transient spectroscopy of Al/a-Si:H/c-Si structures for heterojunction solar cell applications

Journal of applied physics, 2014-12, Vol.116 (23)

2014

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Primary calvarial bone grafting in oro-ocular clefts

Journal of plastic, reconstructive & aesthetic surgery, 2010-05, Vol.63 (5), p.769-773

2010

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High-risk cutaneous malignancies and immunosuppression: Challenges for the reconstructive surgeon in the renal transplant population

Journal of plastic, reconstructive & aesthetic surgery, 2017-07, Vol.70 (7), p.922-930

2017

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Investigation of TiO2-doped HfO2 thin films deposited by photo-CVD

Thin solid films, 2003-03, Vol.428 (1-2), p.263-268

2003

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Diabetes mellitus after GDM

Diabetes (New York, N.Y.), 1991-12, Vol.40 Suppl 2, p.131

O'Sullivan, J B

1991

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Interface of ultrathin HfO2 films deposited by UV-photo-CVD

Thin solid films, 2004-04, Vol.453-454 (Complete), p.203-207

2004

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On the choice of the test structure for the electrical characterization of dielectrics for silicon solar cells

Physica status solidi. PSS-RRL. Rapid research letters, 2010-12, Vol.4 (12), p.362-364

2010

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Mapping of CMOS FET degradation in bias space—Application to dram peripheral devices

Journal of vacuum science and technology. B, Nanotechnology & microelectronics, 2017-01, Vol.35 (1)

2017

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Ubiquitous relaxation in BTI stressing-New evaluation and insights

2008 IEEE International Reliability Physics Symposium, 2008, p.20-27

2008

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Characterisation of HfO2 deposited by photo-induced chemical vapour deposition

Thin solid films, 2003-03, Vol.427 (1-2), p.391-396

2003

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Low-frequency noise assessment of ferro-electric field-effect transistors with Si-doped HfO2 gate dielectric

AIP advances, 2021-01, Vol.11 (1), p.015219-015219-4

2021

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Bias Temperature Instability (BTI) of High-Voltage Devices for Memory Periphery

2022 IEEE International Reliability Physics Symposium (IRPS), 2022, p.1-6

2022

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When should we test for voltage-gated potassium channel complex antibodies? A retrospective case control study

Journal of clinical neuroscience, 2016-11, Vol.33, p.198-204

2016

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CD40 Ligation Conditions Dendritic Cell Antigen-Presenting Function Through Sustained Activation of NF-κB

The Journal of immunology (1950), 2002-06, Vol.168 (11), p.5491-5498

2002

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Pulsed liquid-injection MOCVD of high-K oxides for advanced semiconductor technologies

Materials science & engineering. B, Solid-state materials for advanced technology, 2005-04, Vol.118 (1), p.105-111

2005

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Interface of tantalum oxide films on silicon by UV annealing at low temperature

Thin solid films, 2003-03, Vol.428 (1), p.248-252

2003

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Performance enhancement of Poly-Si/TiN/SiON based pMOSFETs by addition of an aluminum oxide (AlO) capping layer

Microelectronic engineering, 2007-09, Vol.84 (9), p.1865-1868

2007

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Investigation of Imprint in FE-HfO₂ and Its Recovery

Streptococcus pneumoniae infection suppresses allergic airways disease by inducing regulatory T-cells

Nanocrystalline TiO2 films studied by optical, XRD and FTIR spectroscopy

First principles investigation of charge transition levels in monoclinic, orthorhombic, tetragonal, and cubic crystallographic phases of HfO2

Defect profiling in FEFET Si:HfO2 layers

Impact of Charge Trapping and Depolarization on Data Retention Using Simultaneous P-V and I-V in HfO₂-Based Ferroelectric FET

Biomechanical and ergonomic risks associated with cervical musculoskeletal dysfunction amongst surgeons: A systematic review

Current trends in craniofacial reconstruction

Deep-level transient spectroscopy of Al/a-Si:H/c-Si structures for heterojunction solar cell applications

Primary calvarial bone grafting in oro-ocular clefts

High-risk cutaneous malignancies and immunosuppression: Challenges for the reconstructive surgeon in the renal transplant population

Investigation of TiO2-doped HfO2 thin films deposited by photo-CVD

Diabetes mellitus after GDM

Interface of ultrathin HfO2 films deposited by UV-photo-CVD

On the choice of the test structure for the electrical characterization of dielectrics for silicon solar cells

Mapping of CMOS FET degradation in bias space—Application to dram peripheral devices

Ubiquitous relaxation in BTI stressing-New evaluation and insights

Characterisation of HfO2 deposited by photo-induced chemical vapour deposition

Low-frequency noise assessment of ferro-electric field-effect transistors with Si-doped HfO2 gate dielectric

Bias Temperature Instability (BTI) of High-Voltage Devices for Memory Periphery

When should we test for voltage-gated potassium channel complex antibodies? A retrospective case control study

CD40 Ligation Conditions Dendritic Cell Antigen-Presenting Function Through Sustained Activation of NF-κB

Pulsed liquid-injection MOCVD of high-K oxides for advanced semiconductor technologies

Interface of tantalum oxide films on silicon by UV annealing at low temperature

Performance enhancement of Poly-Si/TiN/SiON based pMOSFETs by addition of an aluminum oxide (AlO) capping layer

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