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The use of atomic layer deposition in advanced nanopatterning

Nanoscale, 2014-10, Vol.6 (19), p.1941-196

2014

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What is limiting low-temperature atomic layer deposition of Al2O3? A vibrational sum-frequency generation study

Applied physics letters, 2016-01, Vol.108 (1)

2016

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Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications

Nanotechnology, 2020-04, Vol.31 (25), p.255603-255603

2020

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Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology

Nanoscale, 2018-05, Vol.10 (18), p.8615-8627

2018

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Ultralow Surface Recombination Velocity in Passivated InGaAs/InP Nanopillars

Nano letters, 2017-04, Vol.17 (4), p.2627-2633

2017

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Surface passivation of high-efficiency silicon solar cells by atomic-layer-deposited Al2O3

Progress in photovoltaics, 2008-09, Vol.16 (6), p.461-466

2008

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Passivating Contacts for Crystalline Silicon Solar Cells: From Concepts and Materials to Prospects

IEEE journal of photovoltaics, 2018-03, Vol.8 (2), p.373-388

2018

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Advanced process technologies: Plasma, direct-write, atmospheric pressure, and roll-to-roll ALD

MRS bulletin, 2011-11, Vol.36 (11), p.907-913

2011

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Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy

Journal of physical chemistry. C, 2021-11, Vol.125 (45), p.24945-24957

2021

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Effect of an electric field during the deposition of silicon dioxide thin films by plasma enhanced atomic layer deposition: an experimental and computational study

Nanoscale, 2020-01, Vol.12 (3), p.289-212

2020

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Atomic layer deposition for photovoltaics: applications and prospects for solar cell manufacturing

Semiconductor science and technology, 2012-07, Vol.27 (7), p.74002

2012

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In situ spectroscopic ellipsometry as a versatile tool for studying atomic layer deposition

Journal of physics. D, Applied physics, 2009-04, Vol.42 (7), p.073001-073001 (19); [np]

2009

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Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition

Physica status solidi. PSS-RRL. Rapid research letters, 2010-02, Vol.4 (1-2), p.10-12

2010

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Metal–Insulator–Semiconductor Nanowire Network Solar Cells

Nano letters, 2016-06, Vol.16 (6), p.3689-3695

2016

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Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma

Physical chemistry chemical physics : PCCP, 2021-01, Vol.23 (15), p.9304-9314

2021

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Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time

Applied physics letters, 2015-07, Vol.107 (1)

2015

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Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells

Physica status solidi. PSS-RRL. Rapid research letters, 2015-07, Vol.9 (7), p.393-396

2015

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Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3

Applied physics letters, 2019-08, Vol.115 (8)

2019

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Atomic-Layer-Deposited Transparent Electrodes for Silicon Heterojunction Solar Cells

IEEE journal of photovoltaics, 2014-11, Vol.4 (6), p.1387-1396

2014

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Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches

The Journal of chemical physics, 2017-02, Vol.146 (5), p.052818-052818

2017

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Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate

Applied physics letters, 2020-07, Vol.117 (3)

2020

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Influence of the SiO2 interlayer thickness on the density and polarity of charges in Si/SiO2/Al2O3 stacks as studied by optical second-harmonic generation

Journal of applied physics, 2014-01, Vol.115 (3)

2014

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Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film

Physica status solidi. PSS-RRL. Rapid research letters, 2011-01, Vol.5 (1), p.22-24

2011

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Progress and prospects in nanoscale dry processes: How can we control atomic layer reactions?

Japanese Journal of Applied Physics, 2017-06, Vol.56 (6S2), p.6

2017

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High mobility In2O3:H transparent conductive oxides prepared by atomic layer deposition and solid phase crystallization

Physica status solidi. PSS-RRL. Rapid research letters, 2014-12, Vol.8 (12), p.987-990

2014

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The use of atomic layer deposition in advanced nanopatterning

What is limiting low-temperature atomic layer deposition of Al2O3? A vibrational sum-frequency generation study

Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications

Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology

Ultralow Surface Recombination Velocity in Passivated InGaAs/InP Nanopillars

Surface passivation of high-efficiency silicon solar cells by atomic-layer-deposited Al2O3

Passivating Contacts for Crystalline Silicon Solar Cells: From Concepts and Materials to Prospects

Advanced process technologies: Plasma, direct-write, atmospheric pressure, and roll-to-roll ALD

Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy

Effect of an electric field during the deposition of silicon dioxide thin films by plasma enhanced atomic layer deposition: an experimental and computational study

Atomic layer deposition for photovoltaics: applications and prospects for solar cell manufacturing

In situ spectroscopic ellipsometry as a versatile tool for studying atomic layer deposition

Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition

Metal–Insulator–Semiconductor Nanowire Network Solar Cells

Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma

Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time

Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells

Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3

Atomic-Layer-Deposited Transparent Electrodes for Silicon Heterojunction Solar Cells

Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches

Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate

Influence of the SiO2 interlayer thickness on the density and polarity of charges in Si/SiO2/Al2O3 stacks as studied by optical second-harmonic generation

Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film

Progress and prospects in nanoscale dry processes: How can we control atomic layer reactions?

High mobility In2O3:H transparent conductive oxides prepared by atomic layer deposition and solid phase crystallization

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