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EFFECT OF NITROGEN INCORPORATION ON ELECTRICAL PROPERTIES OF HIGH-K NANOMIXED HfxAlyOz FILM CAPACITORS GROWN ON RU METAL ELECTRODES BY ATOMIC LAYER DEPOSITION

Integrated ferroelectrics, 2005-01, Vol.74 (1), p.131-136

2005

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EFFECTS OF HIGH-TEMPERATURE METAL-ORGANIC CHEMICAL VAPOR DEPOSITION OF Pb(Zr,Ti)O3 THIN FILMS ON STRUCTURAL STABILITIES OF HYBRID Pt/IrO2 /Ir STACK AND SINGLE-LAYER Ir BOTTOM ELECTRODES

Jpn.J.Appl.Phys ,Part 1. Vol. 43, no. 5A, pp. 2651-2654. 2004, 2004, Vol.43 (5A), p.2651-2654

2004

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Inhibition of Taq DNA polymerase by seaweed extracts from British Columbia, Canada and Korea

Journal of applied phycology, 1997, Vol.9 (4), p.383-388

1997

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A study of surface-coated SiC whiskers on carbon fiber substrates and their properties for diesel particulate filter applications

Ceramics international, 2011-05, Vol.37 (4), p.1307-1312

2011

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Gelling agents for tissue culture of the seaweed Hizikia fusiformis

Journal of applied phycology, 1997, Vol.9 (6), p.489-493

1997

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Reliability of MIM HAO capacitor for 70nm DRAM

2005 IEEE International Reliability Physics Symposium, 2005. Proceedings. 43rd Annual, 2005, p.686-687

2005

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Effect of In incorporated into SbTe on phase change characteristics resulting from changes in electronic structure

Applied physics letters, 2010-02, Vol.96 (5), p.052112-052112-3

2010

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DIFFERENTIAL DISPLAY OF TISSUE-SPECIFIC MESSENGER RNAs IN PORPHYRA PERFORATA (RHODOPHYTA) THALLUS1

Journal of phycology, 1995-08, Vol.31 (4), p.640-643

1995

Volltextzugriff (PDF)

Physical and electrical characteristics of band-engineered Zr-silicate/SiO 2 stacks for tunnel barrier

Current applied physics, 2010, Vol.10 (1), p.e22-e26

2010

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Highly stable solution-processed ZnO thin film transistors prepared viaa simple Al evaporation process

Journal of materials chemistry. C, Materials for optical and electronic devices, 2014-01, Vol.2 (8), p.1390-1395

2014

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Flowable oxide CVD Process for Shallow Trench Isolation in Silicon Semiconductor

Journal of semiconductor technology and science, 2004, Vol.4 (1), p.45-51

2004

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Effect of fluorine incorporation on silicon dioxide prepared by high density plasma chemical vapor deposition with SiH4∕O2∕NF3 chemistry

Journal of applied physics, 2004-08, Vol.96 (3), p.1435-1442

2004

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Effect of nitrogen incorporation on improvement of leakage properties in high-k Hf O 2 capacitors treated by N 2 -plasma

Applied physics letters, 2005-09, Vol.87 (13), p.132903-132903-3

2005

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Epitaxial growth of CoSi 2 in a decanano contact opening on a (100) silicon substrate

Applied physics letters, 2005-05, Vol.86 (22), p.221919-221919-3

2005

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Community Structure of Subtitdal Marine Algae at Uljin on theEast Coast of Korea

Algae (Korean Phycological Society), 2006-12, Vol.21 (4), p.463-470

2006

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Effect of nitrogen incorporation on improvement of leakage properties in high-k HfO{sub 2} capacitors treated by N{sub 2}-plasma

Applied physics letters, 2005-09, Vol.87 (13)

2005

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Boron pile-up at the interface between plasma enhanced chemical vapor deposited TiSi2 film and BF2-doped Si

Applied physics letters, 2003-07, Vol.83 (3), p.494-496

2003

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Effect of Fluorine on Characteristics of Shallow Trench Isolation Prepared Using High-Density Plasma Chemical Vapor Deposition Including NF 3 Chemistry

Japanese Journal of Applied Physics, 2006-03, Vol.45 (3R), p.1575

2006

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Epitaxial growth of CoSi{sub 2} in a decanano contact opening on a (100) silicon substrate

Applied physics letters, 2005-05, Vol.86 (22)

2005

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Fabrication of Highly Dense Ru Thin Films by High-Temperature Metal-Organic Chemical Vapor Deposition with NH 3 Gas as Ru Oxidation Suppressing Agent

Japanese Journal of Applied Physics, 2004-08, Vol.43 (8R), p.5482

2004

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Algal Succession on Different Substrata Covering the Artificial Iron Reef atIkata in Shikoku, Japan

ALGAE, 2006, 21(3), , pp.305-310

2006

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Algal Communities and Useful Seaweed Distribution at Gangnung and It's Vicinity in East Coast of Korea

Algae (Korean Phycological Society), 2007-03, Vol.22 (1), p.45-52

2007

Volltextzugriff (PDF)

Channel-Stacked NAND Flash Memory with High-κ Charge Trapping Layer for High Scalability

2019 Electron Devices Technology and Manufacturing Conference (EDTM), 2019, p.315-317

2019

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EFFECT OF NITROGEN INCORPORATION ON ELECTRICAL PROPERTIES OF HIGH- K NANOMIXED Hf x Al y O z FILM CAPACITORS GROWN ON RU METAL ELECTRODES BY ATOMIC LAYER DEPOSITION

Integrated ferroelectrics, 2005-09, Vol.74 (1), p.131-136

2005

Volltextzugriff (PDF)

Crystallographic Orientation Dependent Ferroelectric Characteristics of (Bi 3.3 ,La 0.8 )Ti 3 O 12 (BLT) Capacitors

Integrated ferroelectrics, 2005-04, Vol.70 (1), p.89-97

2005

Volltextzugriff (PDF)

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EFFECT OF NITROGEN INCORPORATION ON ELECTRICAL PROPERTIES OF HIGH-K NANOMIXED HfxAlyOz FILM CAPACITORS GROWN ON RU METAL ELECTRODES BY ATOMIC LAYER DEPOSITION

EFFECTS OF HIGH-TEMPERATURE METAL-ORGANIC CHEMICAL VAPOR DEPOSITION OF Pb(Zr,Ti)O3 THIN FILMS ON STRUCTURAL STABILITIES OF HYBRID Pt/IrO2 /Ir STACK AND SINGLE-LAYER Ir BOTTOM ELECTRODES

Inhibition of Taq DNA polymerase by seaweed extracts from British Columbia, Canada and Korea

A study of surface-coated SiC whiskers on carbon fiber substrates and their properties for diesel particulate filter applications

Gelling agents for tissue culture of the seaweed Hizikia fusiformis

Reliability of MIM HAO capacitor for 70nm DRAM

Effect of In incorporated into SbTe on phase change characteristics resulting from changes in electronic structure

DIFFERENTIAL DISPLAY OF TISSUE-SPECIFIC MESSENGER RNAs IN PORPHYRA PERFORATA (RHODOPHYTA) THALLUS1

Physical and electrical characteristics of band-engineered Zr-silicate/SiO 2 stacks for tunnel barrier

Highly stable solution-processed ZnO thin film transistors prepared viaa simple Al evaporation process

Flowable oxide CVD Process for Shallow Trench Isolation in Silicon Semiconductor

Effect of fluorine incorporation on silicon dioxide prepared by high density plasma chemical vapor deposition with SiH4∕O2∕NF3 chemistry

Effect of nitrogen incorporation on improvement of leakage properties in high-k Hf O 2 capacitors treated by N 2 -plasma

Epitaxial growth of CoSi 2 in a decanano contact opening on a (100) silicon substrate

Community Structure of Subtitdal Marine Algae at Uljin on theEast Coast of Korea

Effect of nitrogen incorporation on improvement of leakage properties in high-k HfO{sub 2} capacitors treated by N{sub 2}-plasma

Boron pile-up at the interface between plasma enhanced chemical vapor deposited TiSi2 film and BF2-doped Si

Effect of Fluorine on Characteristics of Shallow Trench Isolation Prepared Using High-Density Plasma Chemical Vapor Deposition Including NF 3 Chemistry

Epitaxial growth of CoSi{sub 2} in a decanano contact opening on a (100) silicon substrate

Fabrication of Highly Dense Ru Thin Films by High-Temperature Metal-Organic Chemical Vapor Deposition with NH 3 Gas as Ru Oxidation Suppressing Agent

Algal Succession on Different Substrata Covering the Artificial Iron Reef atIkata in Shikoku, Japan

Algal Communities and Useful Seaweed Distribution at Gangnung and It's Vicinity in East Coast of Korea

Channel-Stacked NAND Flash Memory with High-κ Charge Trapping Layer for High Scalability

EFFECT OF NITROGEN INCORPORATION ON ELECTRICAL PROPERTIES OF HIGH- K NANOMIXED Hf x Al y O z FILM CAPACITORS GROWN ON RU METAL ELECTRODES BY ATOMIC LAYER DEPOSITION

Crystallographic Orientation Dependent Ferroelectric Characteristics of (Bi 3.3 ,La 0.8 )Ti 3 O 12 (BLT) Capacitors

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