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Highly efficient and damage-free polishing of GaN (0 0 0 1) by electrochemical etching-enhanced CMP process

Applied surface science, 2020-06, Vol.514, p.145957, Article 145957

2020

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CMP Aerogels: Ultrahigh-Surface-Area Carbon-Based Monolithic Materials with Superb Sorption Performance

Advanced materials (Weinheim), 2014-12, Vol.26 (47), p.8053-8058

2014

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Approaches to Sustainability in Chemical Mechanical Polishing (CMP): A Review

International Journal of Precision Engineering and Manufacturing-Green Technology, 2022, 9(1), , pp.349-367

2022

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Theoretical validation of inhibition mechanisms of benzotriazole with copper and cobalt for CMP and post-CMP cleaning applications

Microelectronic engineering, 2022-06, Vol.262, p.111833, Article 111833

2022

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A magnetically controlled chemical–mechanical polishing (MC‐CMP) approach for fabricating channel‐cut silicon crystal optics for the High Energy Photon Source

Journal of synchrotron radiation, 2023-01, Vol.30 (1), p.84-89

2023

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Insights into triazole derivatives as potential corrosion inhibitors in CMP process: Experimental evaluation and theoretical analysis

Applied surface science, 2022-11, Vol.602, p.154165, Article 154165

2022

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CMP-PIM: an energy-efficient comparator-based processing-in-memory neural network accelerator

Proceedings of the 55th Annual Design Automation Conference, 2018, p.1-6

2018

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Selection and Optimization of Corrosion Inhibitors for Improved Cu CMP and Post-Cu CMP Cleaning

ECS journal of solid state science and technology, 2019, Vol.8 (5), p.P3058-P3062

2019

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Electrolytically Ionized Abrasive-Free CMP (EAF-CMP) for Copper

Applied sciences, 2021-08, Vol.11 (16), p.7232

2021

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XPS, UV–vis spectroscopy and AFM studies on removal mechanisms of Si-face SiC wafer chemical mechanical polishing (CMP)

Applied surface science, 2014-10, Vol.316, p.643-648

2014

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Origin and Innovations of CMP Slurry

ECS journal of solid state science and technology, 2024-07, Vol.13 (7), p.74006

Morinaga, Hitoshi

2024

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Investigation of green alkaline pH regulators on sapphire UV-CMP

Tribology international, 2023-02, Vol.178, p.108047, Article 108047

2023

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Femtosecond laser modification of silicon carbide substrates and its influence on CMP process

Ceramics international, 2021-05, Vol.47 (10), p.13322-13330

2021

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Removal mechanism on 4H–SiC single crystal by picosecond laser ablation-assisted chemical mechanical polishing (CMP)

Ceramics international, 2024-04, Vol.50 (8), p.13266-13275

2024

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Nanosecond laser irradiation assisted chemical mechanical polishing (CMP) process for promoting material removal of single crystal 4H–SiC

Ceramics international, 2024-10, Vol.50 (19), p.34702-34709

2024

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Influence mechanism of defects on the subsurface damage and structural evolution of diamond in CMP process

Applied surface science, 2021-11, Vol.566, p.150638, Article 150638

2021

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Synergistic effect of 1,2,4-triazole and phytic acid as inhibitors on copper film CMP for ruthenium - based copper interconnected and the surface action mechanism analysis

Materials science in semiconductor processing, 2023-03, Vol.156, p.107276, Article 107276

2023

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CMP Process Optimization Engineering by Machine Learning

IEEE transactions on semiconductor manufacturing, 2021-08, Vol.34 (3), p.280-285

2021

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Germanium electrochemical study and its CMP application

Applied surface science, 2017-11, Vol.422, p.247-256

2017

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Contamination reduction for 150 mm SiC substrates by integrating CMP and Post-CMP cleaning

Materials research express, 2023-10, Vol.10 (10), p.105903

2023

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Fluorescent conjugated microporous polymer (CMP) derived sensor array for multiple Organic/Inorganic contaminants detection

Sensors and actuators. B, Chemical, 2020-10, Vol.320, p.128448, Article 128448

2020

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Synergistic effect of composite complex agent on BTA removal in post CMP cleaning of copper interconnection

Materials chemistry and physics, 2020-09, Vol.252, p.123230, Article 123230

2020

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Effect of ionic strength on ruthenium CMP in H2O2-based slurries

Applied surface science, 2014-10, Vol.317, p.332-337

2014

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Effect of a novel chelating agent on defect removal during post-CMP cleaning

Applied surface science, 2016-08, Vol.378, p.239-244

2016

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Study on high efficient sapphire wafer processing by coupling SG-mechanical polishing and GLA-CMP

International journal of machine tools & manufacture, 2018-08, Vol.130-131, p.12-19

2018

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Highly efficient and damage-free polishing of GaN (0 0 0 1) by electrochemical etching-enhanced CMP process

CMP Aerogels: Ultrahigh-Surface-Area Carbon-Based Monolithic Materials with Superb Sorption Performance

Approaches to Sustainability in Chemical Mechanical Polishing (CMP): A Review

Theoretical validation of inhibition mechanisms of benzotriazole with copper and cobalt for CMP and post-CMP cleaning applications

A magnetically controlled chemical–mechanical polishing (MC‐CMP) approach for fabricating channel‐cut silicon crystal optics for the High Energy Photon Source

Insights into triazole derivatives as potential corrosion inhibitors in CMP process: Experimental evaluation and theoretical analysis

CMP-PIM: an energy-efficient comparator-based processing-in-memory neural network accelerator

Selection and Optimization of Corrosion Inhibitors for Improved Cu CMP and Post-Cu CMP Cleaning

Electrolytically Ionized Abrasive-Free CMP (EAF-CMP) for Copper

XPS, UV–vis spectroscopy and AFM studies on removal mechanisms of Si-face SiC wafer chemical mechanical polishing (CMP)

Origin and Innovations of CMP Slurry

Investigation of green alkaline pH regulators on sapphire UV-CMP

Femtosecond laser modification of silicon carbide substrates and its influence on CMP process

Removal mechanism on 4H–SiC single crystal by picosecond laser ablation-assisted chemical mechanical polishing (CMP)

Nanosecond laser irradiation assisted chemical mechanical polishing (CMP) process for promoting material removal of single crystal 4H–SiC

Influence mechanism of defects on the subsurface damage and structural evolution of diamond in CMP process

Synergistic effect of 1,2,4-triazole and phytic acid as inhibitors on copper film CMP for ruthenium - based copper interconnected and the surface action mechanism analysis

CMP Process Optimization Engineering by Machine Learning

Germanium electrochemical study and its CMP application

Contamination reduction for 150 mm SiC substrates by integrating CMP and Post-CMP cleaning

Fluorescent conjugated microporous polymer (CMP) derived sensor array for multiple Organic/Inorganic contaminants detection

Synergistic effect of composite complex agent on BTA removal in post CMP cleaning of copper interconnection

Effect of ionic strength on ruthenium CMP in H2O2-based slurries

Effect of a novel chelating agent on defect removal during post-CMP cleaning

Study on high efficient sapphire wafer processing by coupling SG-mechanical polishing and GLA-CMP

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