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Impact of Thin WSIX Insertion in Tungsten Polymetal Gate on Gate Oxide Reliability and Gate Contact Resistance

2006 IEEE International Reliability Physics Symposium Proceedings, 2006, p.374-378

2006

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Impact of gate sidewall spacer structures on DRAM cell transistors under Fowler-Nordheim and gate-induced drain leakage stress conditions

2004 IEEE International Reliability Physics Symposium. Proceedings, 2004, p.485-488

2004

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Highly Scalable Saddle-Fin (S-Fin) Transistor for Sub-50nm DRAM Technology

2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers, 2006, p.32-33

2006

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Reliability of MIM HAO capacitor for 70nm DRAM

2005 IEEE International Reliability Physics Symposium, 2005. Proceedings. 43rd Annual, 2005, p.686-687

2005

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Channel-Stacked NAND Flash Memory with High-κ Charge Trapping Layer for High Scalability

2019 Electron Devices Technology and Manufacturing Conference (EDTM), 2019, p.315-317

2019

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Highly Reliable and Scalable Tungsten Polymetal Gate Process for Memory Devices Using Low-Temperature Plasma Selective Gate Reoxidation

2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers, 2006, p.74-75

2006

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Semi-active control of the Macpherson suspension system: hardware-in-the-loop simulations

Proceedings of the 2000. IEEE International Conference on Control Applications. Conference Proceedings (Cat. No.00CH37162), 2000, p.982-987

2000

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Development of highly robust nano-mixed HfxAlyOz dielectrics for TiN/HfxAlyOz/TiN capacitor applicable to 65nm generation DRAMs

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Development of highly robust nano-mixed Hf/sub x/Al/sub y/O/sub z/ dielectrics for TiN/Hf/sub x/Al/sub y/O/sub z//TiN capacitor applicable to 65nm generation DRAMs

Digest of Technical Papers. 2004 Symposium on VLSI Technology, 2004, 2004, p.126-127

2004

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A novel method for forming gate spacer and its effects on the W/WN/sub x//poly-Si gate stack

Proceedings of the 30th European Solid-State Circuits Conference (IEEE Cat. No.04EX850), 2004, p.97-100

2004

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Novel shallow trench isolation process using flowable oxide CVD for sub-100 nm DRAM

Digest. International Electron Devices Meeting, 2002, p.233-236

2002

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Novel shallow trench isolation process using flowable oxide CVD for sub-100nm DRAM

2002

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Comparative study of geometry-dependent capacitances of planar FETs and double-gate FinFETs: Optimization and process variation

Proceedings of Technical Program of 2012 VLSI Technology, System and Application, 2012, p.1-2

2012

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New investigation of hot carrier degradation of RF small-signal parameters in high-k/metal gate nMOSFETs

2011 International Reliability Physics Symposium, 2011, p.5A.4.1-5A.4.5

2011

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Low-frequency noise behavior of La-doped HfSiON/metal gate nMOSFETs

2011 International Reliability Physics Symposium, 2011, p.XT.1.1-XT.1.5

2011

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An equivalent circuit model for high-k/metal gate stack MOS capacitor with dynamic leakage

2010 IEEE Nanotechnology Materials and Devices Conference, 2010, p.291-294

2010

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Bilateral dislocation of the long head of biceps tendon with intact rotator cuff tendon: A case report

World journal of clinical cases, 2023, Vol.11 (26), p.6304-6310

2023

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An experimental study on channel backscattering in high-k/metal gate nMOSFETs

2012 IEEE International Integrated Reliability Workshop Final Report, 2012, p.171-174

2012

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An optimized software-based echo-processing algorithm for small scale ultrasound systems

IEEE Ultrasonics Symposium, 2004, 2004, Vol.3, p.2053-2056 Vol.3

2004

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Pulmonary and cerebral fat embolism syndrome after total knee replacement

Journal of clinical medicine research, 2013, Vol.5 (3), p.239-242

2013

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Prosthetic mitral valve leaflet escape

Journal of cardiovascular ultrasound, 2013, Vol.21 (2), p.96-99

2013

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Impact of Thin WSIX Insertion in Tungsten Polymetal Gate on Gate Oxide Reliability and Gate Contact Resistance

Impact of gate sidewall spacer structures on DRAM cell transistors under Fowler-Nordheim and gate-induced drain leakage stress conditions

Highly Scalable Saddle-Fin (S-Fin) Transistor for Sub-50nm DRAM Technology

Reliability of MIM HAO capacitor for 70nm DRAM

Channel-Stacked NAND Flash Memory with High-κ Charge Trapping Layer for High Scalability

Highly Reliable and Scalable Tungsten Polymetal Gate Process for Memory Devices Using Low-Temperature Plasma Selective Gate Reoxidation

Semi-active control of the Macpherson suspension system: hardware-in-the-loop simulations

Development of highly robust nano-mixed HfxAlyOz dielectrics for TiN/HfxAlyOz/TiN capacitor applicable to 65nm generation DRAMs

Development of highly robust nano-mixed Hf/sub x/Al/sub y/O/sub z/ dielectrics for TiN/Hf/sub x/Al/sub y/O/sub z//TiN capacitor applicable to 65nm generation DRAMs

A novel method for forming gate spacer and its effects on the W/WN/sub x//poly-Si gate stack

Novel shallow trench isolation process using flowable oxide CVD for sub-100 nm DRAM

Novel shallow trench isolation process using flowable oxide CVD for sub-100nm DRAM

Comparative study of geometry-dependent capacitances of planar FETs and double-gate FinFETs: Optimization and process variation

New investigation of hot carrier degradation of RF small-signal parameters in high-k/metal gate nMOSFETs

Low-frequency noise behavior of La-doped HfSiON/metal gate nMOSFETs

An equivalent circuit model for high-k/metal gate stack MOS capacitor with dynamic leakage

Bilateral dislocation of the long head of biceps tendon with intact rotator cuff tendon: A case report

An experimental study on channel backscattering in high-k/metal gate nMOSFETs

An optimized software-based echo-processing algorithm for small scale ultrasound systems

Pulmonary and cerebral fat embolism syndrome after total knee replacement

Prosthetic mitral valve leaflet escape

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