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Silylation-Driven Volatility Enhancement in Mononuclear Calcium, Magnesium, and Barium Complexes with Monomethyl or Silyl Ether and Bis(diketonate)

ACS omega, 2024-07, Vol.9 (29), p.31864-31870

2024

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High Volatile Antimony(III) Precursors for Metal Oxide Thin Film Deposition

ACS omega, 2024-07, Vol.9 (29), p.31871-31877

2024

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Germanium and Tin Precursors for Chalcogenide Materials Containing N‑Alkoxy Thioamide Ligands

ACS omega, 2024-07, Vol.9 (26), p.28707-28714

2024

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Synthesis and characterization of Mo and W compounds for disulfide materials

Bulletin of the Korean Chemical Society, 2024, 45(7), , pp.576-583

2024

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Growth of Atomic layer-deposited Monoclinic Molybdenum Dioxide Films Stabilized by Tin Oxide Doping for DRAM Capacitor Electrode Applications

ACS applied materials & interfaces, 2024-04, Vol.16 (18), p.23606-23614

2024

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Area-selective atomic layer deposition on 2D monolayer lateral superlattices

Nature communications, 2024-03, Vol.15 (1), p.2138-2138, Article 2138

2024

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Vinyl-addition copolymerization of norbornene and 1-octene catalyzed by a non-bridged half-titanocene with a tetrazole-phenoxy ligand

Polymer (Guilford), 2024-03, Vol.295, p.126679, Article 126679

2024

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Palladium(II)-Catalyzed Synthesis of a Vinyl-Addition Ultrahigh-Molecular-Weight Polynorbornene Copolymer with an Entanglement Network for Enhanced Fracture Resistance

Macromolecules, 2024-01, Vol.57 (2), p.565-573

2024

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Anomalous Temperature and Polarization Dependences of Photoluminescence of Metal‐Organic Chemical Vapor Deposition‐Grown GeSe2

Advanced optical materials, 2024-01, Vol.12 (2), p.n/a

2024

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Role of a cyclopentadienyl ligand in a heteroleptic alkoxide precursor in atomic layer deposition

The Journal of chemical physics, 2024-01, Vol.160 (2)

2024

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Amidoxime-Containing Zr and Hf Atomic Layer Deposition Precursors for Metal Oxide Thin Films

Inorganic chemistry, 2024-01, Vol.63 (1), p.537-547

2024

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Horizontally aligned ALD-SnO films grown on SiO2-passivated high-k HfO2 dielectrics for high-mobility and low-power P-channel thin-film transistor

Surfaces and interfaces, 2024-01, Vol.44, p.103726, Article 103726

2024

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Anomalous Temperature and Polarization Dependences of Photoluminescence of Metal‐Organic Chemical Vapor Deposition‐Grown GeSe 2

Advanced optical materials, 2024-01, Vol.12 (2)

2024

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Ternary Ga–Sn–O and quaternary In–Ga–Sn–O channel based thin film transistors fabricated by plasma-enhanced atomic layer deposition

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2023-12, Vol.41 (6)

2023

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New Heteroleptic Germanium Precursors for GeO 2 Thin Films by Atomic Layer Deposition

ACS omega, 2023-11, Vol.8 (46), p.43759-43770

2023

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New Heteroleptic Germanium Precursors for GeO2 Thin Films by Atomic Layer Deposition

ACS omega, 2023-11, Vol.8 (46), p.43759-43770

2023

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Evaluation of tin nitride (SnN) atomic layer deposition using novel volatile Sn precursors

Dalton transactions : an international journal of inorganic chemistry, 2023-10, Vol.52 (41), p.1533-1542

2023

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Evaluation of tin nitride (Sn 3 N 4 ) via atomic layer deposition using novel volatile Sn precursors

Dalton transactions : an international journal of inorganic chemistry, 2023-10, Vol.52 (41), p.15033-15042

2023

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Mesoporous Metal Fluoride Nanocomposite Films with Tunable Optical Properties Derived from Precursor Instability

Small (Weinheim an der Bergstrasse, Germany), 2023-10, Vol.19 (41), p.e2301395-e2301395

2023

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Controlled orientation and microstructure of p-type SnO thin film transistors with high-k dielectric for improved performance

Applied physics letters, 2023-08, Vol.123 (7)

2023

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Synthesis and characterization of Sn complexes containing aminoalkoxide ligands for solution process

Molecular Crystals and Liquid Crystals, 2023-07, Vol.760 (1), p.44-50

2023

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Novel Volatile Heteroleptic Barium Complexes Using Tetradentate Ligand and β‑Diketonato Ligand

ACS omega, 2023-06, Vol.8 (25), p.22783-22787

2023

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Synthesis and Characterization of Tungsten Amide Complexes for the Deposition of Tungsten Disulfide Thin Films

ACS omega, 2023-06, Vol.8 (22), p.19816-19821

2023

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Atomic Layer Deposition of Ru Thin Film Using a Newly Synthesized Precursor with Open‐Coordinated Ligands

Advanced materials interfaces, 2023-06, Vol.10 (17), p.n/a

2023

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Synthesis of Mononuclear Strontium Complexes with Polyether and β‑Diketonato Ligands

ACS omega, 2023-05, Vol.8 (18), p.16119-16130

2023

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Silylation-Driven Volatility Enhancement in Mononuclear Calcium, Magnesium, and Barium Complexes with Monomethyl or Silyl Ether and Bis(diketonate)

High Volatile Antimony(III) Precursors for Metal Oxide Thin Film Deposition

Germanium and Tin Precursors for Chalcogenide Materials Containing N‑Alkoxy Thioamide Ligands

Synthesis and characterization of Mo and W compounds for disulfide materials

Growth of Atomic layer-deposited Monoclinic Molybdenum Dioxide Films Stabilized by Tin Oxide Doping for DRAM Capacitor Electrode Applications

Area-selective atomic layer deposition on 2D monolayer lateral superlattices

Vinyl-addition copolymerization of norbornene and 1-octene catalyzed by a non-bridged half-titanocene with a tetrazole-phenoxy ligand

Palladium(II)-Catalyzed Synthesis of a Vinyl-Addition Ultrahigh-Molecular-Weight Polynorbornene Copolymer with an Entanglement Network for Enhanced Fracture Resistance

Anomalous Temperature and Polarization Dependences of Photoluminescence of Metal‐Organic Chemical Vapor Deposition‐Grown GeSe2

Role of a cyclopentadienyl ligand in a heteroleptic alkoxide precursor in atomic layer deposition

Amidoxime-Containing Zr and Hf Atomic Layer Deposition Precursors for Metal Oxide Thin Films

Horizontally aligned ALD-SnO films grown on SiO2-passivated high-k HfO2 dielectrics for high-mobility and low-power P-channel thin-film transistor

Anomalous Temperature and Polarization Dependences of Photoluminescence of Metal‐Organic Chemical Vapor Deposition‐Grown GeSe 2

Ternary Ga–Sn–O and quaternary In–Ga–Sn–O channel based thin film transistors fabricated by plasma-enhanced atomic layer deposition

New Heteroleptic Germanium Precursors for GeO 2 Thin Films by Atomic Layer Deposition

New Heteroleptic Germanium Precursors for GeO2 Thin Films by Atomic Layer Deposition

Evaluation of tin nitride (SnN) atomic layer deposition using novel volatile Sn precursors

Evaluation of tin nitride (Sn 3 N 4 ) via atomic layer deposition using novel volatile Sn precursors

Mesoporous Metal Fluoride Nanocomposite Films with Tunable Optical Properties Derived from Precursor Instability

Controlled orientation and microstructure of p-type SnO thin film transistors with high-k dielectric for improved performance

Synthesis and characterization of Sn complexes containing aminoalkoxide ligands for solution process

Novel Volatile Heteroleptic Barium Complexes Using Tetradentate Ligand and β‑Diketonato Ligand

Synthesis and Characterization of Tungsten Amide Complexes for the Deposition of Tungsten Disulfide Thin Films

Atomic Layer Deposition of Ru Thin Film Using a Newly Synthesized Precursor with Open‐Coordinated Ligands

Synthesis of Mononuclear Strontium Complexes with Polyether and β‑Diketonato Ligands

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