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Evaluation of tin nitride (Sn 3 N 4 ) via atomic layer deposition using novel volatile Sn precursors

Dalton transactions : an international journal of inorganic chemistry, 2023-10, Vol.52 (41), p.15033-15042

2023

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Role of a cyclopentadienyl ligand in a heteroleptic alkoxide precursor in atomic layer deposition

The Journal of chemical physics, 2024-01, Vol.160 (2)

2024

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Controlled orientation and microstructure of p-type SnO thin film transistors with high-k dielectric for improved performance

Applied physics letters, 2023-08, Vol.123 (7)

2023

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Synthesis of SnS Thin Films by Atomic Layer Deposition at Low Temperatures

Chemistry of materials, 2017-10, Vol.29 (19), p.8100-8110

2017

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Growth of p‑Type Tin(II) Monoxide Thin Films by Atomic Layer Deposition from Bis(1-dimethylamino-2-methyl-2propoxy)tin and H2O

Chemistry of materials, 2014-11, Vol.26 (21), p.6088-6091

2014

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Fabrication of high-performance p-type thin film transistors using atomic-layer-deposited SnO films

Journal of materials chemistry. C, Materials for optical and electronic devices, 2017, Vol.5 (12), p.3139-3145

2017

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Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N‑ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application

ACS applied materials & interfaces, 2016-10, Vol.8 (40), p.26924-26931

2016

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Low-temperature wafer-scale synthesis of two-dimensional SnS2

Nanoscale, 2018-10, Vol.10 (37), p.17712-17721

2018

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Heteroleptic manganese compounds as potential precursors for manganese based thin films and nanomaterials

RSC advances, 2020-08, Vol.1 (5), p.29659-29667

2020

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Synthesis and characterization of Sn complexes containing aminoalkoxide ligands for solution process

Molecular Crystals and Liquid Crystals, 2023-07, Vol.760 (1), p.44-50

2023

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Area-selective atomic layer deposition on 2D monolayer lateral superlattices

Nature communications, 2024-03, Vol.15 (1), p.2138-2138, Article 2138

2024

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Synthesis and characterization of novel zinc precursors for ZnO thin film deposition by atomic layer deposition

Dalton transactions : an international journal of inorganic chemistry, 2020-04, Vol.49 (14), p.436-4314

2020

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Selective coordination with heterogeneous metal atoms for inorganic-organic hybrid layers

RSC advances, 2021-01, Vol.11 (2), p.83-837

2021

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A facile synthetic route to tungsten diselenide using a new precursor containing a long alkyl chain cation for multifunctional electronic and optoelectronic applications

RSC advances, 2019-02, Vol.9 (11), p.6169-6176

2019

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Germanium Compounds Containing GeE Double Bonds (E = S, Se, Te) as Single-Source Precursors for Germanium Chalcogenide Materials

Inorganic chemistry, 2017-04, Vol.56 (7), p.4084-4092

2017

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Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition

Coatings (Basel), 2020-07, Vol.10 (7), p.692

2020

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New Heteroleptic Germanium Precursors for GeO2 Thin Films by Atomic Layer Deposition

ACS omega, 2023-11, Vol.8 (46), p.43759-43770

2023

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Impedance spectroscopy characterization of resistance switching NiO thin films prepared through atomic layer deposition

Applied physics letters, 2006-11, Vol.89 (22), p.222105-222105-3

2006

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Growth of Atomic layer-deposited Monoclinic Molybdenum Dioxide Films Stabilized by Tin Oxide Doping for DRAM Capacitor Electrode Applications

ACS applied materials & interfaces, 2024-04, Vol.16 (18), p.23606-23614

2024

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Ternary Ga–Sn–O and quaternary In–Ga–Sn–O channel based thin film transistors fabricated by plasma-enhanced atomic layer deposition

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2023-12, Vol.41 (6)

2023

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Synthesis and Crystal Structures of New Strontium Complexes with Aminoalkoxy and β‑Diketonato Ligands

ACS omega, 2021-06, Vol.6 (24), p.15948-15956

2021

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High-Performance Thin-Film Transistors of Quaternary Indium–Zinc–Tin Oxide Films Grown by Atomic Layer Deposition

ACS applied materials & interfaces, 2019-04, Vol.11 (16), p.14892-14901

2019

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Highly efficient photocatalytic methylene blue degradation over Sn(O,S)/TiO2 photocatalyst fabricated via powder atomic layer deposition of SnO and subsequent sulfurization

Materials letters, 2020-08, Vol.272, p.127868, Article 127868

2020

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New Volatile Tantalum Imido Precursors with Carboxamide Ligands

ACS omega, 2021-09, Vol.6 (38), p.24795-24802

2021

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Vinyl-addition copolymerization of norbornene and 1-octene catalyzed by a non-bridged half-titanocene with a tetrazole-phenoxy ligand

Polymer (Guilford), 2024-03, Vol.295, p.126679, Article 126679

2024

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Evaluation of tin nitride (Sn 3 N 4 ) via atomic layer deposition using novel volatile Sn precursors

Role of a cyclopentadienyl ligand in a heteroleptic alkoxide precursor in atomic layer deposition

Controlled orientation and microstructure of p-type SnO thin film transistors with high-k dielectric for improved performance

Synthesis of SnS Thin Films by Atomic Layer Deposition at Low Temperatures

Growth of p‑Type Tin(II) Monoxide Thin Films by Atomic Layer Deposition from Bis(1-dimethylamino-2-methyl-2propoxy)tin and H2O

Fabrication of high-performance p-type thin film transistors using atomic-layer-deposited SnO films

Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N‑ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application

Low-temperature wafer-scale synthesis of two-dimensional SnS2

Heteroleptic manganese compounds as potential precursors for manganese based thin films and nanomaterials

Synthesis and characterization of Sn complexes containing aminoalkoxide ligands for solution process

Area-selective atomic layer deposition on 2D monolayer lateral superlattices

Synthesis and characterization of novel zinc precursors for ZnO thin film deposition by atomic layer deposition

Selective coordination with heterogeneous metal atoms for inorganic-organic hybrid layers

A facile synthetic route to tungsten diselenide using a new precursor containing a long alkyl chain cation for multifunctional electronic and optoelectronic applications

Germanium Compounds Containing GeE Double Bonds (E = S, Se, Te) as Single-Source Precursors for Germanium Chalcogenide Materials

Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition

New Heteroleptic Germanium Precursors for GeO2 Thin Films by Atomic Layer Deposition

Impedance spectroscopy characterization of resistance switching NiO thin films prepared through atomic layer deposition

Growth of Atomic layer-deposited Monoclinic Molybdenum Dioxide Films Stabilized by Tin Oxide Doping for DRAM Capacitor Electrode Applications

Ternary Ga–Sn–O and quaternary In–Ga–Sn–O channel based thin film transistors fabricated by plasma-enhanced atomic layer deposition

Synthesis and Crystal Structures of New Strontium Complexes with Aminoalkoxy and β‑Diketonato Ligands

High-Performance Thin-Film Transistors of Quaternary Indium–Zinc–Tin Oxide Films Grown by Atomic Layer Deposition

Highly efficient photocatalytic methylene blue degradation over Sn(O,S)/TiO2 photocatalyst fabricated via powder atomic layer deposition of SnO and subsequent sulfurization

New Volatile Tantalum Imido Precursors with Carboxamide Ligands

Vinyl-addition copolymerization of norbornene and 1-octene catalyzed by a non-bridged half-titanocene with a tetrazole-phenoxy ligand

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