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Analysis of high-rate a-Si:H deposition in a VHF plasma

Journal of physics. D, Applied physics, 1993-10, Vol.26 (10), p.1781-1786

1993

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Plasma-assisted partial oxidation of methane to synthesis gas in a dielectric barrier discharge

Applied catalysis. A, General, 2004-04, Vol.261 (1), p.19-24

2004

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The mechanism of plasma-induced deposition of amorphous silicon from silane

Plasma chemistry and plasma processing, 1990-03, Vol.10 (1), p.3-26

1990

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Role of higher silanes in the plasma-induced deposition of amorphous silicon from silane

Applied physics letters, 1989-04, Vol.54 (14), p.1320-1322

1989

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Detection of SiH2 radicals in an a-Si:H deposition plasma by laser-induced fluorescence

Journal of physics. D, Applied physics, 1995-12, Vol.28 (12), p.2470-2472

1995

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Atomic scale study of local TiSi2/Si epitaxies

Journal of applied physics, 1990-02, Vol.67 (4), p.1820-1825

1990

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Characterization of polycrystalline and amorphous silicon films by angle-resolved light scattering

Journal of physics. D, Applied physics, 1993-02, Vol.26 (2), p.271-280

1993

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Oxygen impurity effects on the formation of thin titanium silicide films by rapid thermal annealing

Journal of physics. D, Applied physics, 1990-08, Vol.23 (8), p.1076-1081

1990

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The effects of applied and internal strain on the electronic properties of amorphous silicon

Philosophical magazine. B. Physics of condensed matter. Electronic, optical and magnetic properties, 1986-11, Vol.54 (5), p.343-358

1986

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Measurement of the angular distributions of particles in air showers

Physical review. D, Particles and fields, 1992-10, Vol.46 (7), p.2831-2845

1992

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Analysis of high-rate a-Si:H deposition in a VHF plasma

Plasma-assisted partial oxidation of methane to synthesis gas in a dielectric barrier discharge

The mechanism of plasma-induced deposition of amorphous silicon from silane

Role of higher silanes in the plasma-induced deposition of amorphous silicon from silane

Detection of SiH2 radicals in an a-Si:H deposition plasma by laser-induced fluorescence

Atomic scale study of local TiSi2/Si epitaxies

Characterization of polycrystalline and amorphous silicon films by angle-resolved light scattering

Oxygen impurity effects on the formation of thin titanium silicide films by rapid thermal annealing

The effects of applied and internal strain on the electronic properties of amorphous silicon

Measurement of the angular distributions of particles in air showers

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