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Electron‐beam programming and testing of complementary metal‐oxide semiconductor systems

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1987-01, Vol.5 (1), p.97-101

1987

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Techniques for realizing linearly graded composition or doping profiles in molecular‐beam epitaxy

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1987-05, Vol.5 (3), p.718-721

1987

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A new cross sectional thinning technique for transmission electron microscopy

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1985-05, Vol.3 (3), p.918-920

Sweeney, J.

1985

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At-wavelength characterization of the extreme ultraviolet Engineering Test Stand Set-2 optic

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2001-11, Vol.19 (6), p.2396-2400

2001

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Read‐only memory with electron‐beam programmable floating‐gate transistors

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1983-10, Vol.1 (4), p.1084-1087

Shaver, D. C.

1983

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Fabrication of single-electron tunneling transistors with an electrically formed Coulomb island in a silicon-on-insulator nanowire

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2002-07, Vol.20 (4), p.1410-1418

2002

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Manganese oxide microswitch for electronic memory based on neural networks

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1989-05, Vol.7 (3), p.450-454

1989

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Sub-0.1 μ electron-beam lithography for nanostructure development

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2000-11, Vol.18 (6), p.3143-3149

2000

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Controlled growth of ZnSeTe superlattices with sinusoidal compositional modulation

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2000-05, Vol.18 (3), p.1518-1521

2000

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Method for compensation of extreme-ultraviolet multilayer defects

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1999-11, Vol.17 (6), p.3024-3028

1999

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Large scale nanolithography using nanoimprint lithography

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1999-11, Vol.17 (6), p.2961-2964

1999

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Quantitative Auger analysis by depth profiling of line shapes: Application to native oxide‐InSb interfaces

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1985-07, Vol.3 (4), p.959-963

1985

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Chemical patterning for the highly specific and programmed assembly of nanostructures

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2005-07, Vol.23 (4), p.1364-1370

2005

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Three-dimensional thin-film-transistor silicon-oxide-nitride-oxide-silicon memory cell formed on large grain sized polysilicon films using nuclei induced solid phase crystallization

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2005-09, Vol.23 (5), p.2184-2188

2005

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High perfection chirped grating phase masks by electron-beam definition

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1999-11, Vol.17 (6), p.3217-3221

1999

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A computer program for electron gun design using second‐order finite elements

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1989-11, Vol.7 (6), p.1862-1869

1989

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Differential algebraic theory and calculation for arbitrary high order aberrations of a bipotential electrostatic lens

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2003-09, Vol.21 (5), p.2038-2042

2003

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The Cramer–Rao accuracy bound for optimum processing of the edge registration mark signal in electron beam lithography

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1986-09, Vol.4 (5), p.1243-1250

1986

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Integrated circuit repair using focused ion beam milling

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1986-01, Vol.4 (1), p.181-184

1986

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Modeling and simulation for nanometrics

Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 2005-11, Vol.23 (6), p.2578-2583

2005

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Self inspection of integrated circuits pattern defects using support vector machines

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2005-11, Vol.23 (6), p.3085-3089

2005

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Digital electrostatic electron-beam array lithography

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2002-11, Vol.20 (6), p.2646-2650

2002

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Nanoflash device with self-aligned double floating gates using scanning probe lithography and tetramethylammonium hydroxide wet etching

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2004-11, Vol.22 (6), p.3154-3157

2004

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Preoxidation treatments for very thin oxides grown after silicon exposure to reactive ion etching plasma

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1988-01, Vol.6 (1), p.62-65

1988

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Quantitative method of image analysis when drift is present in a scanning probe microscope

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2003-03, Vol.21 (2), p.714-718

2003

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Electron‐beam programming and testing of complementary metal‐oxide semiconductor systems

Techniques for realizing linearly graded composition or doping profiles in molecular‐beam epitaxy

A new cross sectional thinning technique for transmission electron microscopy

At-wavelength characterization of the extreme ultraviolet Engineering Test Stand Set-2 optic

Read‐only memory with electron‐beam programmable floating‐gate transistors

Fabrication of single-electron tunneling transistors with an electrically formed Coulomb island in a silicon-on-insulator nanowire

Manganese oxide microswitch for electronic memory based on neural networks

Sub-0.1 μ electron-beam lithography for nanostructure development

Controlled growth of ZnSeTe superlattices with sinusoidal compositional modulation

Method for compensation of extreme-ultraviolet multilayer defects

Large scale nanolithography using nanoimprint lithography

Quantitative Auger analysis by depth profiling of line shapes: Application to native oxide‐InSb interfaces

Chemical patterning for the highly specific and programmed assembly of nanostructures

Three-dimensional thin-film-transistor silicon-oxide-nitride-oxide-silicon memory cell formed on large grain sized polysilicon films using nuclei induced solid phase crystallization

High perfection chirped grating phase masks by electron-beam definition

A computer program for electron gun design using second‐order finite elements

Differential algebraic theory and calculation for arbitrary high order aberrations of a bipotential electrostatic lens

The Cramer–Rao accuracy bound for optimum processing of the edge registration mark signal in electron beam lithography

Integrated circuit repair using focused ion beam milling

Modeling and simulation for nanometrics

Self inspection of integrated circuits pattern defects using support vector machines

Digital electrostatic electron-beam array lithography

Nanoflash device with self-aligned double floating gates using scanning probe lithography and tetramethylammonium hydroxide wet etching

Preoxidation treatments for very thin oxides grown after silicon exposure to reactive ion etching plasma

Quantitative method of image analysis when drift is present in a scanning probe microscope

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