Details

Autor(en) / Beteiligte

• Takehira, Hiroshi
• Karim, Mohammad Razaul
• Shudo, Yuta
• Fukuda, Masahiro
• Mashimo, Tsutomu
• Hayami, Shinya

Titel

Modulating the Work Function of Graphene by Pulsed Plasma Aided Controlled Chlorination

Ist Teil von

• Scientific reports, 2018-11, Vol.8 (1), p.17392-8, Article 17392

Ort / Verlag

England: Nature Publishing Group

Erscheinungsjahr

2018

Link zum Volltext

Quelle

Free E-Journal (出版社公開部分のみ）

Beschreibungen/Notizen

• Chlorine on graphene (G) matrices was doped by pulsed plasma stimulation on graphite electrode submerged in organochlorine solvents (CH Cl , CHCl , CCl ). The study of work function by Kelvin probe force microscopy (KPFM) measurement clearly indicates that Cl-doped G behave like semiconductor and GG@CHCl exhibits the lowest value for the work function. We propose that this report not only represents a new route for tuning the semiconductivity of G but also indicates that doping level of halogen on G based carbon framework can be controlled by pulsed plasma treatment of carbon materials on various organohalogen derivatives.