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Forming-free bipolar resistive switching in nonstoichiometric ceria films
Ist Teil von
Nanoscale research letters, 2014-01, Vol.9 (1), p.45-45, Article 45
Ort / Verlag
New York: Springer New York
Erscheinungsjahr
2014
Link zum Volltext
Quelle
Alma/SFX Local Collection
Beschreibungen/Notizen
The mechanism of forming-free bipolar resistive switching in a Zr/CeO
x
/Pt device was investigated. High-resolution transmission electron microscopy and energy-dispersive spectroscopy analysis indicated the formation of a ZrO
y
layer at the Zr/CeO
x
interface. X-ray diffraction studies of CeO
x
films revealed that they consist of nano-polycrystals embedded in a disordered lattice. The observed resistive switching was suggested to be linked with the formation and rupture of conductive filaments constituted by oxygen vacancies in the CeO
x
film and in the nonstoichiometric ZrO
y
interfacial layer. X-ray photoelectron spectroscopy study confirmed the presence of oxygen vacancies in both of the said regions. In the low-resistance ON state, the electrical conduction was found to be of ohmic nature, while the high-resistance OFF state was governed by trap-controlled space charge-limited mechanism. The stable resistive switching behavior and long retention times with an acceptable resistance ratio enable the device for its application in future nonvolatile resistive random access memory (RRAM).