Details

Autor(en) / Beteiligte

• Nolot, E.
• Cadot, S.
• Martin, F.
• Hönicke, P.
• Zech, C.
• Beckhoff, B.

Titel

In-line characterization of ultrathin transition metal dichalcogenides using X-ray fluorescence and X-ray photoelectron spectroscopy

Ist Teil von

• Spectrochimica acta. Part B: Atomic spectroscopy, 2020-04, Vol.166, p.105788, Article 105788

Ort / Verlag

Oxford: Elsevier B.V

Erscheinungsjahr

2020

Quelle

Alma/SFX Local Collection

Beschreibungen/Notizen

• Industry-scalable fabrication methods of sulfur-based transition metal dichalcogenides are being developed, which puts strong requirements on the characterization of these mono- and few-layer materials in a cleanroom environment. In this paper, we show that the stoichiometry of ultrathin molydbenum disulfide layers can be determined by inline X-ray photoemission spectroscopy and wavelength-dispersive X-ray fluorescence, within the uncertainty provided by reference-free X-ray fluorescence in grazing incidence performed at the Physikalisch-Technische Bundesanstalt. In addition, we demonstrate that automated inline wavelength-dispersive X-ray fluorescence analysis can accurately determine the mass deposition of molybdenum and sulfur. Such information is crucial to support and accelerate the development of multi-parametric sulfur-based transition metal dichalcogenides processes, for instance by careful adjustment of the mass deposition per deposition cycle, both on samples and full wafers. [Display omitted] •The stoichiometry of ultrathin MoS layers is characterized in the cleanroom.•Automated WDXRF and XPS tools provide accurate composition of MoS films.•The accuracy of inline metrology is aligned with reference-free GIXRF.•WDXRF-deduced mass deposition is used to optimize deposition processes.