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Quantum electronics (Woodbury, N.Y.), 2020-07, Vol.50 (7), p.636-642
2020

Details

Autor(en) / Beteiligte
Titel
Phase-shift speckle-shearing interferometry
Ist Teil von
  • Quantum electronics (Woodbury, N.Y.), 2020-07, Vol.50 (7), p.636-642
Ort / Verlag
Bristol: Kvantovaya Elektronika, Turpion Ltd and IOP Publishing
Erscheinungsjahr
2020
Link zum Volltext
Quelle
Alma/SFX Local Collection
Beschreibungen/Notizen
  • We have numerically simulated the process of measuring stress - strain states by the method of speckle-shearing interferometry using the phase-shift technique. A computer model with the possibility of setting its strain and roughness is developed, which includes a model of a diffusely reflecting test object corresponding to the characteristics of a real membrane, as well as a speckle interferometer model that allows speckle interferograms to be obtained for different speckle sizes and angles between interfering beams. The process of reconstructing the object surface topogram from model speckle interferograms by the phase-shift technique is implemented. Using the developed models, a two-dimensional shearogram are obtained, which is a derivative of the strain field of a circular membrane. Comparison of the results of numerical simulation with experimental data shows that the differences (rms deviations) do not exceed 0.02 μm. It is also shown that the error of interferogram reconstruction by the phase-shift technique increases significantly when the test object strains exceed 12 μm.

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