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The fabrication of photodetectors for the wavelength range of communications λ = 1.3–1.55 µm on the basis of Ge/Si(001) heterostructures with thick (~0.5 µm) Ge layers grown by the hot-wire technique at reduced growth temperatures (350°C) is reported. The single-crystal Ga layers are distinguished by a low density of threading dislocations (~10
5
cm
–2
). The photodetectors exhibit a rather high quantum efficiency (~0.05 at λ = 1.5 µm and 300 K) at moderate reverse saturation current densities (~10
–2
A cm
–2
). Thus, it is shown that the hot-wire technique offers promise for the formation of integrated photodetectors for the wavelength range of communications, especially in the case of limitations on the conditions of heat treatments.