Details

Autor(en) / Beteiligte

• Malinverni, M.
• Lamy, J.-M.
• Martin, D.
• Feltin, E.
• Dorsaz, J.
• Castiglia, A.
• Rossetti, M.
• Duelk, M.
• Vélez, C.
• Grandjean, N.

Titel

Low temperature p- type doping of (Al)GaN layers using ammonia molecular beam epitaxy for InGaN laser diodes

Ist Teil von

• Applied physics letters, 2014-12, Vol.105 (24)

Ort / Verlag

Melville: American Institute of Physics

Erscheinungsjahr

2014

Quelle

American Institute of Physics (AIP) Journals

Beschreibungen/Notizen

• We demonstrate state-of-the-art p-type (Al)GaN layers deposited at low temperature (740 °C) by ammonia molecular beam epitaxy (NH3-MBE) to be used as top cladding of laser diodes (LDs) with the aim of further reducing the thermal budget on the InGaN quantum well active region. Typical p-type GaN resistivities and contact resistances are 0.4 Ω cm and 5 × 10−4 Ω cm2, respectively. As a test bed, we fabricated a hybrid laser structure emitting at 400 nm combining n-type AlGaN cladding and InGaN active region grown by metal-organic vapor phase epitaxy, with the p-doped waveguide and cladding layers grown by NH3-MBE. Single-mode ridge-waveguide LD exhibits a threshold voltage as low as 4.3 V for an 800 × 2 μm2 ridge dimension and a threshold current density of ∼5 kA cm−2 in continuous wave operation. The series resistance of the device is 6 Ω and the resistivity is 1.5 Ω cm, confirming thereby the excellent electrical properties of p-type Al0.06Ga0.94N:Mg despite the low growth temperature.