Details

Autor(en) / Beteiligte

• Lee, Yao-Jen
• Cho, Ta-Chun
• Chuang, Shang-Shiun
• Hsueh, Fu-Kuo
• Lu, Yu-Lun
• Sung, Po-Jung
• Chen, Hsiu-Chih
• Current, Michael I.
• Tseng, Tseung-Yuen
• Chao, Tien-Sheng
• Hu, Chenming
• Yang, Fu-Liang

Titel

Corrections to "Low-Temperature Microwave Annealing Processes for Future IC Fabrication-A Review" [Mar 14 651-665]

Ist Teil von

• IEEE transactions on electron devices, 2023-07, Vol.70 (7), p.3983-3983

Ort / Verlag

IEEE

Erscheinungsjahr

2023

Link zum Volltext

• Volltext

Quelle

IEEE/IET Electronic Library

Beschreibungen/Notizen

• The above article <xref ref-type="bibr" rid="ref1">[1] presented data on microwave annealing of implanted ions in silicon. There are several typos in the figure captions and labels, and the authors would like to correct them. The text is correct, and the conclusion of <xref ref-type="bibr" rid="ref1">[1] is not impacted by these revisions.