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Details

Autor(en) / Beteiligte
Titel
Electrochemically sliced low loss AlGaN optical microresonators
Ist Teil von
  • Applied physics letters, 2017-01, Vol.110 (2)
Ort / Verlag
Melville: American Institute of Physics
Erscheinungsjahr
2017
Quelle
AIP Journals
Beschreibungen/Notizen
  • High quality single crystal III-Nitride films are often formed over a thick buffer to reduce growth induced defects on a lattice mismatched substrate. However, it is challenging to fabricate nanophotonic waveguiding structures directly from this very top layer. Here, we demonstrate electrochemical slicing of high quality AlGaN thin films and its subsequent transfer to a lower index oxided silicon substrate for lithographic patterning of photonic waveguide and microresonators. TEM analysis of the nanomembrane waveguide demonstrates an AlGaN layer free of misfit dislocations commonly found in conventional epitaxial AlGaN grown on sapphire or Si. We probe the low material optical loss (1.22 dB/cm) of the nanomembrane by measuring the optical quality (Q) factor at 780 nm. High intrinsic quality factors of 680 000 are achieved after optimizing fabrication process. This versatile, low loss AlGaN device opens applications for nonlinear photonics at visible wavelengths.
Sprache
Englisch
Identifikatoren
ISSN: 0003-6951
eISSN: 1077-3118
DOI: 10.1063/1.4973521
Titel-ID: cdi_crossref_primary_10_1063_1_4973521

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