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Subthreshold Performance Evaluation of JLDG-MOSFET
Ist Teil von
2019 5th International Conference on Signal Processing, Computing and Control (ISPCC), 2019, p.181-184
Ort / Verlag
IEEE
Erscheinungsjahr
2019
Quelle
IEEE Xplore
Beschreibungen/Notizen
A new high performance Junction-less double gate MOSFET (JLDG-MOSFET) is proposed for gate length 20nm with performance analysis in terms of Io N /I OFF (~10 7 ) ratio and subthreshold slope(mV/decade) and DIBL(mV/V) in comparison to existing DG-MOSFET structure. The analysis of JLDG-MOSFET is carried out for DC parameters at room temperature (300K). The proposed JLDG-MOSFET exploits the junction-less behavior that supports reasonable value of ON/OFF currents as well as improved subthreshold parameters. The analysis of JLDG-MOSFET is carried out for DC parameters at room temperature. The ON and OFF-state performance of the proposed device is carried out with varying doping, oxide thickness and gate dielectric constant. All the proposed JLDG-MOSFET has been implemented with 2D and 3D Visual-TCAD device simulator.