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Amorphous and Polycrystalline Thin-Film Silicon Science and Technology--2007, 2007, Vol.989, p.583-588, Article 0989-A25-02
2007

Details

Autor(en) / Beteiligte
Titel
Time-resolved Cavity Ringdown Spectroscopy as a Monitoring Technique of Nanoparticles in Pulsed VHF Plasmas
Ist Teil von
  • Amorphous and Polycrystalline Thin-Film Silicon Science and Technology--2007, 2007, Vol.989, p.583-588, Article 0989-A25-02
Ort / Verlag
New York, USA: Cambridge University Press
Erscheinungsjahr
2007
Link zum Volltext
Beschreibungen/Notizen
  • Time-resolved cavity ringdown (τ-CRD) spectroscopy has been applied to monitor the sylil (SiH3) radicals and nano-particles in pulsed very high frequency (VHF) silane (SiH4)/hydrogen (H2) plasmas under microcrystalline silicon (μc-Si:H) deposition conditions. After the plasma ignition, a small constant cavity loss (~100 ppm) on timescales smaller than ~1 s has been observed, whereas on time scales larger than ~1 s after plasma ignition, an additional cavity loss is observed. By variation of the wavelength of the CRD laser pulse, we demonstrate that the cavity loss on time scales smaller than ~1 s reflects the SiH3 absorption. On time scales larger than ~1 s, the additional cavity loss corresponds to the loss of light due to mainly scattering at the nano-particles. Under the conditions studied, the light scattering at nano-particles can be described by Rayleigh scattering during its initial growth. After ~ 2.5 s, the cavity loss reflects the transition of the scattering mechanism from dominant Rayleigh to dominant Mie-scattering. These results are discussed in terms of nano-particles growing in time and further confirmed by additional scanning electron microscopy analyses on the nano-particles created in the plasma pulse.
Sprache
Englisch
Identifikatoren
ISSN: 0272-9172
eISSN: 1946-4274
DOI: 10.1557/PROC-0989-A25-02
Titel-ID: cdi_crossref_primary_10_1557_PROC_0989_A25_02

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