Sie befinden Sich nicht im Netzwerk der Universität Paderborn. Der Zugriff auf elektronische Ressourcen ist gegebenenfalls nur via VPN oder Shibboleth (DFN-AAI) möglich.
mehr Informationen...
A 35-A cascode configuration of a drain-to-source breakdown voltage of 978 V utilizing an silicon carbide (SiC) buried gate static induction transistor (BGSIT) and low voltage Si-MOSFET (SiC-BGSIT cascode) has been experimentally demonstrated for the first time. The SiC-SIT is mounted with the Si-MOSFET in an originally designed resin 4pin package. The ON-resistance <inline-formula> <tex-math notation="LaTeX">R_{\text {DS(ON)}} </tex-math></inline-formula> of this device exhibits 34.3 <inline-formula> <tex-math notation="LaTeX">\text{m}\Omega </tex-math></inline-formula> at room temperature, which is 50% of the commercial SiC MOSFET of the similar rating. The temperature dependence of <inline-formula> <tex-math notation="LaTeX">R_{\text {DS(ON)}} </tex-math></inline-formula> and gate threshold voltage has been revealed. It has been suggested that when compared with the SiC-JFET cascode with the similar rating, the BGSIT cascode has a soft <inline-formula> <tex-math notation="LaTeX">\textit {dV}_{\text {ds}}/\textit {dt} </tex-math></inline-formula> property with a relatively small switching loss.