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The Journal of chemical physics, 1991-02, Vol.94 (4), p.2548-2556
1991

Details

Autor(en) / Beteiligte
Titel
Dissociative electron attachment in NO
Ist Teil von
  • The Journal of chemical physics, 1991-02, Vol.94 (4), p.2548-2556
Ort / Verlag
Woodbury, NY: American Institute of Physics
Erscheinungsjahr
1991
Link zum Volltext
Quelle
Alma/SFX Local Collection
Beschreibungen/Notizen
  • Previously reported experimental data on dissociative electron attachment (DEA) in NO are reinterpreted. The negative-ion yield resulting from DEA in NO has peak intensities at electron energies around 8 and 9 eV. It is demonstrated that the 8 and 9 eV peaks are due to O− ions and long-lived N− ions, respectively. It is also shown that the O− ions are produced via the single repulsive state, NO−(1π−12π2)1Δ. The possibility that two or more NO− repulsive states might be involved is ruled out. It is further argued that the long-lived N− ions are produced via electron attachment to an excited state of NO, rather than to the ground state. The responsible excited state is believed to be the metastable NO(1π−12π)4Π state.
Sprache
Englisch
Identifikatoren
ISSN: 0021-9606
eISSN: 1089-7690
DOI: 10.1063/1.459882
Titel-ID: cdi_crossref_primary_10_1063_1_459882

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