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Nanosphere lithography is a low-cost technique for nanopatterning large-area samples. In this work, a more sophisticated version of this method is presented, which expands the number of possible fabricable structures. It is shown, how tailored nanostructures can be written in a highly parallelized way. By fabricating suitable plasmonic nanoantenna structures in selected areas on a surface it is shown that this technique can then be used to produce optical devices, such as beam shapers or devices for the creation of higher harmonics.