Details

Autor(en) / Beteiligte

• Biesinger, Mark C.
• Payne, Brad P.
• Lau, Leo W. M.
• Gerson, Andrea
• Smart, Roger St. C.

Titel

X-ray photoelectron spectroscopic chemical state quantification of mixed nickel metal, oxide and hydroxide systems

Ist Teil von

• Surface and interface analysis, 2009-04, Vol.41 (4), p.324-332

Ort / Verlag

Chichester, UK: John Wiley & Sons, Ltd

Erscheinungsjahr

2009

Link zum Volltext

Quelle

Wiley Online Library

Beschreibungen/Notizen

• Quantitative chemical state X‐ray photoelectron spectroscopic analysis of mixed nickel metal, oxide, hydroxide and oxyhydroxide systems is challenging due to the complexity of the Ni 2p peak shapes resulting from multiplet splitting, shake‐up and plasmon loss structures. Quantification of mixed nickel chemical states and the qualitative determination of low concentrations of Ni(III) species are demonstrated via an approach based on standard spectra from quality reference samples (Ni, NiO, Ni(OH)2, NiOOH), subtraction of these spectra, and data analysis that integrates information from the Ni 2p spectrum and the O 1s spectra. Quantification of a commercial nickel powder and a thin nickel oxide film grown at 1‐Torr O2 and 300 °C for 20 min is demonstrated. The effect of uncertain relative sensitivity factors (e.g. Ni 2.67 ± 0.54) is discussed, as is the depth of measurement for thin film analysis based on calculated inelastic mean free paths. Copyright © 2009 John Wiley & Sons, Ltd.