Details

Autor(en) / Beteiligte

• Pfeiffer, Arnold
• Schiebl, Christian
• Wernisch, Johann

Titel

Continuous Fluorescence Correction in Electron Probe Microanalysis Applying an Electron Scattering Model

Ist Teil von

• X-ray spectrometry, 1996-05, Vol.25 (3), p.131-137

Ort / Verlag

Hoboken: Wiley Subscription Services, Inc., A Wiley Company

Erscheinungsjahr

1996

Link zum Volltext

Quelle

Wiley Online Library

Beschreibungen/Notizen

• A derivation of the continuous fluorescence correction factor for use in electron probe microanalysis (EPMA) is presented. The exciting bremsstrahlung is described by using a continuous depth distribution function Φcont(ρz) analogous to Φ(ρz) models describing the generation of characteristic x‐radiation by primary electrons. Therefore, no simplifications and approximations depending on the generation depth and absorption length of the secondarily excited characteristic x‐radiation have to be made. The introduced model is applicable to bulk and layered samples. Calculations of the continuous fluorescence correction factor were made for K, L and M lines of pure element standards. The influence of continuous fluorescence in the field of EPMA, especially concerning the methods of film thickness determination, is shown by examples of calculations on film–substrate samples.