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Polarity-Switching Top Coats Enable Orientation of Sub–10-nm Block Copolymer Domains

Science (American Association for the Advancement of Science), 2012-11, Vol.338 (6108), p.775-779

2012

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High-throughput sequencing of the paired human immunoglobulin heavy and light chain repertoire

Nature biotechnology, 2013-02, Vol.31 (2), p.166-169

2013

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Directed Self-Assembly and Pattern Transfer of Five Nanometer Block Copolymer Lamellae

ACS nano, 2017-08, Vol.11 (8), p.7656-7665

2017

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New Approaches to Nanofabrication: Molding, Printing, and Other Techniques

Chemical reviews, 2005-04, Vol.105 (4), p.1171-1196

2005

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Nano Day: Celebrating the Next Decade of Nanoscience and Nanotechnology

ACS nano, 2016-10, Vol.10 (10), p.9093-9103

2016

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Synthesis of Unzipping Polyester and a Study of its Photochemistry

Journal of the American Chemical Society, 2019-09, Vol.141 (37), p.14736-14741

2019

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Double-Patterned Sidewall Directed Self-Assembly and Pattern Transfer of Sub-10 nm PTMSS‑b‑PMOST

ACS applied materials & interfaces, 2015-06, Vol.7 (24), p.13476-13483

2015

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Structure, Stability, and Reorganization of 0.5 L0 Topography in Block Copolymer Thin Films

ACS nano, 2016-11, Vol.10 (11), p.10152-10160

2016

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Directed Self-Assembly of Silicon-Containing Block Copolymer Thin Films

ACS applied materials & interfaces, 2015-02, Vol.7 (5), p.3323-3328

2015

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Synthesis and Characterization of a Two Stage, Nonlinear Photobase Generator

Journal of organic chemistry, 2015-08, Vol.80 (15), p.7530-7535

2015

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Effect of Ring Functionalization on the Reaction Temperature of Benzocyclobutene Thermoset Polymers

Macromolecules, 2016-05, Vol.49 (10), p.3706-3715

2016

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Ordering poly(trimethylsilyl styrene-block-D,L-lactide) block copolymers in thin films by solvent annealing using a mixture of domain-selective solvents

Journal of polymer science. Part B, Polymer physics, 2014-01, Vol.52 (1), p.36-45

2014

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Spatial Control of the Self-assembled Block Copolymer Domain Orientation and Alignment on Photopatterned Surfaces

ACS applied materials & interfaces, 2020-05, Vol.12 (20), p.23399-23409

2020

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The future of lithography: SEMATECH Litho Forum 2008

ACS nano, 2008-07, Vol.2 (7), p.1323-1328

2008

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Photopatterning of Block Copolymer Thin Films

ACS macro letters, 2016-04, Vol.5 (4), p.460-465

2016

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Ultraviolet curable branched siloxanes as low-k dielectrics for imprint lithography

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2013-01, Vol.31 (1)

2013

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Fundamental Optical Properties of Linear and Cyclic Alkanes: VUV Absorbance and Index of Refraction

The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory, 2009-08, Vol.113 (33), p.9337-9347

2009

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Polymeric Cross-Linked Surface Treatments for Controlling Block Copolymer Orientation in Thin Films

Langmuir, 2011-03, Vol.27 (5), p.2000-2006

2011

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Pattern Transfer of Sub-10 nm Features via Tin-Containing Block Copolymers

ACS macro letters, 2016-03, Vol.5 (3), p.391-395

2016

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Design and Synthesis of a Photoaromatization-Based Two-Stage Photobase Generator for Pitch Division Lithography

Journal of organic chemistry, 2013-03, Vol.78 (5), p.1730-1734

2013

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Cracking of Polycrystalline Graphene on Copper under Tension

ACS nano, 2016-10, Vol.10 (10), p.9616-9625

2016

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Feature filling modeling for step and flash imprint lithography

Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 2009-07, Vol.27 (4), p.1926-1932

2009

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Study of a Two-Stage Photobase Generator for Photolithography in Microelectronics

Journal of organic chemistry, 2013-03, Vol.78 (5), p.1735-1741

2013

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Oligosaccharide/Silicon-Containing Block Copolymers with 5 nm Features for Lithographic Applications

ACS nano, 2012-04, Vol.6 (4), p.3424-3433

2012

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Imprint Materials for Nanoscale Devices

MRS bulletin, 2005-12, Vol.30 (12), p.947-951

2005

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Polarity-Switching Top Coats Enable Orientation of Sub–10-nm Block Copolymer Domains

High-throughput sequencing of the paired human immunoglobulin heavy and light chain repertoire

Directed Self-Assembly and Pattern Transfer of Five Nanometer Block Copolymer Lamellae

New Approaches to Nanofabrication: Molding, Printing, and Other Techniques

Nano Day: Celebrating the Next Decade of Nanoscience and Nanotechnology

Synthesis of Unzipping Polyester and a Study of its Photochemistry

Double-Patterned Sidewall Directed Self-Assembly and Pattern Transfer of Sub-10 nm PTMSS‑b‑PMOST

Structure, Stability, and Reorganization of 0.5 L0 Topography in Block Copolymer Thin Films

Directed Self-Assembly of Silicon-Containing Block Copolymer Thin Films

Synthesis and Characterization of a Two Stage, Nonlinear Photobase Generator

Effect of Ring Functionalization on the Reaction Temperature of Benzocyclobutene Thermoset Polymers

Ordering poly(trimethylsilyl styrene-block-D,L-lactide) block copolymers in thin films by solvent annealing using a mixture of domain-selective solvents

Spatial Control of the Self-assembled Block Copolymer Domain Orientation and Alignment on Photopatterned Surfaces

The future of lithography: SEMATECH Litho Forum 2008

Photopatterning of Block Copolymer Thin Films

Ultraviolet curable branched siloxanes as low-k dielectrics for imprint lithography

Fundamental Optical Properties of Linear and Cyclic Alkanes: VUV Absorbance and Index of Refraction

Polymeric Cross-Linked Surface Treatments for Controlling Block Copolymer Orientation in Thin Films

Pattern Transfer of Sub-10 nm Features via Tin-Containing Block Copolymers

Design and Synthesis of a Photoaromatization-Based Two-Stage Photobase Generator for Pitch Division Lithography

Cracking of Polycrystalline Graphene on Copper under Tension

Feature filling modeling for step and flash imprint lithography

Study of a Two-Stage Photobase Generator for Photolithography in Microelectronics

Oligosaccharide/Silicon-Containing Block Copolymers with 5 nm Features for Lithographic Applications

Imprint Materials for Nanoscale Devices

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