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Plasma catalytic conversion of methane into syngas: the combined effect of discharge activation and catalysis

Catalysis today, 2004-02, Vol.89 (1), p.21-25

2004

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Characterization of the uppermost layer of plasma-treated carbon nanotubes

Diamond and related materials, 2003-03, Vol.12 (3), p.811-815

2003

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Methane Conversion into Aromatics in a Direct Plasma-Catalytic Process

Journal of catalysis, 2002-02, Vol.206 (1), p.91-97

2002

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Surface modification of carbon nanofibres in low temperature plasmas

Diamond and related materials, 2004-04, Vol.13 (4), p.1177-1181

2004

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Methane conversion at low temperature: the combined application of catalysis and non-equilibrium plasma

Catalysis today, 2004-06, Vol.90 (1-2), p.151-158

2004

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Plasma-assisted partial oxidation of methane to synthesis gas in a dielectric barrier discharge

Applied catalysis. A, General, 2004-04, Vol.261 (1), p.19-24

2004

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Analysis of high-rate a-Si:H deposition in a VHF plasma

Journal of physics. D, Applied physics, 1993-10, Vol.26 (10), p.1781-1786

1993

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The mechanism of plasma-induced deposition of amorphous silicon from silane

Plasma chemistry and plasma processing, 1990-03, Vol.10 (1), p.3-26

1990

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The sign of the Hall effect in hydrogenated amorphous and disordered crystalline silicon

Philosophical magazine letters, 1996-12, Vol.74 (6), p.455-464

1996

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Detection of SiH2 radicals in an a-Si:H deposition plasma by laser-induced fluorescence

Journal of physics. D, Applied physics, 1995-12, Vol.28 (12), p.2470-2472

1995

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Role of higher silanes in the plasma-induced deposition of amorphous silicon from silane

Applied physics letters, 1989-04, Vol.54 (14), p.1320-1322

1989

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Atomic scale study of local TiSi2/Si epitaxies

Journal of applied physics, 1990-02, Vol.67 (4), p.1820-1825

1990

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Characterization of polycrystalline and amorphous silicon films by angle-resolved light scattering

Journal of physics. D, Applied physics, 1993-02, Vol.26 (2), p.271-280

1993

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Oxygen impurity effects on the formation of thin titanium silicide films by rapid thermal annealing

Journal of physics. D, Applied physics, 1990-08, Vol.23 (8), p.1076-1081

1990

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The effects of applied and internal strain on the electronic properties of amorphous silicon

Philosophical magazine. B. Physics of condensed matter. Electronic, optical and magnetic properties, 1986-11, Vol.54 (5), p.343-358

1986

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New diagnostic aspects of high rate a-Si:H deposition in a VHF plasma

Journal of non-crystalline solids, 1996, Vol.198200, p.1038-1041

1996

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Surface functionalisation of carbon nano-fibres in fluidised bed plasma

Surface & coatings technology, 2003, Vol.174-75, p.831-834

2003

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Control of a-Si:H deposition by the ion flux in a VHF plasma

Journal of non-crystalline solids, 1993, Vol.164-66, p.55-58

1993

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Properties of amorphous boron nitride thin films

Journal of non-crystalline solids, 1996, Vol.198200, p.403-406

1996

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Laser induced nucleation and growth of polycrystalline silicon

Journal of non-crystalline solids, 1996, Vol.198200, p.887-890

1996

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Amorphous hydrogenated silicon carbon from VHF deposition

Journal of non-crystalline solids, 1993, Vol.164-66, p.1031-1034

1993

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Deposition of a-Si:H with the hot-wire technique

Journal of non-crystalline solids, 1993, Vol.164-66, p.83-86

1993

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Surface controlled plasma deposition and etching of silicon near the chemical equilibrium

Journal of non-crystalline solids, 1993, Vol.164-66, p.985-988

1993

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Thermally induced changes of conductivity in undoped and doped amorphous germanium

Journal of non-crystalline solids, 1991, Vol.137-38, p.187-190

1991

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Infrared spectroscopy during hydrogen effusion of a-Si:H, a-SiGe:H and a-Ge:H

Journal of non-crystalline solids, 1991, Vol.137-38, p.49-52

1991

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Plasma catalytic conversion of methane into syngas: the combined effect of discharge activation and catalysis

Characterization of the uppermost layer of plasma-treated carbon nanotubes

Methane Conversion into Aromatics in a Direct Plasma-Catalytic Process

Surface modification of carbon nanofibres in low temperature plasmas

Methane conversion at low temperature: the combined application of catalysis and non-equilibrium plasma

Plasma-assisted partial oxidation of methane to synthesis gas in a dielectric barrier discharge

Analysis of high-rate a-Si:H deposition in a VHF plasma

The mechanism of plasma-induced deposition of amorphous silicon from silane

The sign of the Hall effect in hydrogenated amorphous and disordered crystalline silicon

Detection of SiH2 radicals in an a-Si:H deposition plasma by laser-induced fluorescence

Role of higher silanes in the plasma-induced deposition of amorphous silicon from silane

Atomic scale study of local TiSi2/Si epitaxies

Characterization of polycrystalline and amorphous silicon films by angle-resolved light scattering

Oxygen impurity effects on the formation of thin titanium silicide films by rapid thermal annealing

The effects of applied and internal strain on the electronic properties of amorphous silicon

New diagnostic aspects of high rate a-Si:H deposition in a VHF plasma

Surface functionalisation of carbon nano-fibres in fluidised bed plasma

Control of a-Si:H deposition by the ion flux in a VHF plasma

Properties of amorphous boron nitride thin films

Laser induced nucleation and growth of polycrystalline silicon

Amorphous hydrogenated silicon carbon from VHF deposition

Deposition of a-Si:H with the hot-wire technique

Surface controlled plasma deposition and etching of silicon near the chemical equilibrium

Thermally induced changes of conductivity in undoped and doped amorphous germanium

Infrared spectroscopy during hydrogen effusion of a-Si:H, a-SiGe:H and a-Ge:H

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