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Characterization of the uppermost layer of plasma-treated carbon nanotubes

Diamond and related materials, 2003-03, Vol.12 (3), p.811-815

2003

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Surface modification of carbon nanofibres in low temperature plasmas

Diamond and related materials, 2004-04, Vol.13 (4), p.1177-1181

2004

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New diagnostic aspects of high rate a-Si:H deposition in a VHF plasma

Journal of non-crystalline solids, 1996-05, Vol.198, p.1038-1041

1996

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Surface functionalisation of carbon nano-fibres in fluidised bed plasma

Surface & coatings technology, 2003-09, Vol.174, p.831-834

2003

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Analysis of high-rate a-Si:H deposition in a VHF plasma

Journal of physics. D, Applied physics, 1993-10, Vol.26 (10), p.1781-1786

1993

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Versatile High Rate Plasma Deposition and Processing with very high Frequency Excitation

MRS proceedings, 1997, Vol.467, p.471-482, Article 471

Heintze, M.

1997

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Control of a-Si:H deposition by the ion flux in a VHF plasma

Journal of non-crystalline solids, 1993-12, Vol.164, p.55-58

1993

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Deposition of a-Si:H with the hot-wire technique

Journal of non-crystalline solids, 1993-12, Vol.164, p.83-86

1993

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Surface controlled plasma deposition and etching of silicon near the chemical equilibrium

Journal of non-crystalline solids, 1993-12, Vol.164-166, p.985-988

1993

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The sign of the Hall effect in hydrogenated amorphous and disordered crystalline silicon

Philosophical magazine letters, 1996-12, Vol.74 (6), p.455-464

1996

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Highly Conductive p-type Microcrystalline Silicon Thin Films

MRS proceedings, 1996, Vol.420, Article 277

1996

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Role of higher silanes in the plasma-induced deposition of amorphous silicon from silane

Applied physics letters, 1989-04, Vol.54 (14), p.1320-1322

1989

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Detection of SiH2 radicals in an a-Si:H deposition plasma by laser-induced fluorescence

Journal of physics. D, Applied physics, 1995-12, Vol.28 (12), p.2470-2472

1995

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Laser induced nucleation and growth of polycrystalline silicon

Journal of non-crystalline solids, 1996-05, Vol.198, p.887-890

1996

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Amorphous hydrogenated silicon carbon from VHF deposition

Journal of non-crystalline solids, 1993-12, Vol.164-166, p.1031-1034

1993

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The Effect of Hydrogen Dilution on the Hot-Wire Deposition of Microcrystalline Silicon

MRS proceedings, 1996, Vol.420, Article 295

1996

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Thermally induced changes of conductivity in undoped and doped amorphous germanium

Journal of non-crystalline solids, 1991, Vol.137, p.187-190

1991

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Hall-Effect and Sign Properties in Hydrogenated Amorphous and Disordered Crystalline Silicon

MRS proceedings, 1996, Vol.420, Article 813

1996

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Mechanism of High Rate a-Si:H Deposition in a VHF Plasma

MRS proceedings, 1993, Vol.297, Article 49

1993

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Infrared spectroscopy during hydrogen effusion of a-Si:H, a-SiGe:H and a-Ge:H

Journal of non-crystalline solids, 1991, Vol.137, p.49-52

1991

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The effects of linear strain on the electronic properties of glow discharge amorphous silicon

Journal of non-crystalline solids, 1985-12, Vol.77, p.495-498

1985

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Vibrational Spectra of a-Si:H Obtained by Pds

MRS proceedings, 1991, Vol.219, Article 229

1991

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Deposition of a-Ge:H in a Remote Plasma System

MRS proceedings, 1990, Vol.192, Article 565

1990

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The effects of applied and internal strain on the electronic properties of amorphous silicon

Philosophical magazine. B. Physics of condensed matter. Electronic, optical and magnetic properties, 1986-11, Vol.54 (5), p.343-358

1986

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From the Understanding of the Reaction Mechanism Towards Optimizing the Deposition Rate and Optoelectronic Properties of a-Si:H

MRS proceedings, 1989, Vol.149, Article 3

1989

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Characterization of the uppermost layer of plasma-treated carbon nanotubes

Surface modification of carbon nanofibres in low temperature plasmas

New diagnostic aspects of high rate a-Si:H deposition in a VHF plasma

Surface functionalisation of carbon nano-fibres in fluidised bed plasma

Analysis of high-rate a-Si:H deposition in a VHF plasma

Versatile High Rate Plasma Deposition and Processing with very high Frequency Excitation

Control of a-Si:H deposition by the ion flux in a VHF plasma

Deposition of a-Si:H with the hot-wire technique

Surface controlled plasma deposition and etching of silicon near the chemical equilibrium

The sign of the Hall effect in hydrogenated amorphous and disordered crystalline silicon

Highly Conductive p-type Microcrystalline Silicon Thin Films

Role of higher silanes in the plasma-induced deposition of amorphous silicon from silane

Detection of SiH2 radicals in an a-Si:H deposition plasma by laser-induced fluorescence

Laser induced nucleation and growth of polycrystalline silicon

Amorphous hydrogenated silicon carbon from VHF deposition

The Effect of Hydrogen Dilution on the Hot-Wire Deposition of Microcrystalline Silicon

Thermally induced changes of conductivity in undoped and doped amorphous germanium

Hall-Effect and Sign Properties in Hydrogenated Amorphous and Disordered Crystalline Silicon

Mechanism of High Rate a-Si:H Deposition in a VHF Plasma

Infrared spectroscopy during hydrogen effusion of a-Si:H, a-SiGe:H and a-Ge:H

The effects of linear strain on the electronic properties of glow discharge amorphous silicon

Vibrational Spectra of a-Si:H Obtained by Pds

Deposition of a-Ge:H in a Remote Plasma System

The effects of applied and internal strain on the electronic properties of amorphous silicon

From the Understanding of the Reaction Mechanism Towards Optimizing the Deposition Rate and Optoelectronic Properties of a-Si:H

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