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Comparative analysis of the germination of barley seeds subjected to drying, hydrogen peroxide, or oxidative air plasma treatments

Plasma processes and polymers, 2022-09, Vol.19 (9), p.n/a

2022

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Formation of Nitrogen Functional Groups on Plasma Treated DLC

Plasma processes and polymers, 2009-09, Vol.6 (9), p.555-565

2009

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Physicochemical surface analysis and germination at different irrigation conditions of DBD plasma‐treated wheat seeds

Plasma processes and polymers, 2021-01, Vol.18 (1), p.n/a

2021

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Micron‐scale wedge thin films prepared by plasma enhanced chemical vapor deposition

Plasma processes and polymers, 2017-12, Vol.14 (12), p.n/a

2017

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Modulating Low Energy Ion Plasma Fluxes for the Growth of Nanoporous Thin Films

Plasma processes and polymers, 2015-08, Vol.12 (8), p.719-724

2015

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Comments on "An Essay on Contact Angle Measurements": Determination of Surface Roughness and Modeling of the Wetting Behavior

Plasma processes and polymers, 2011-11, Vol.8 (11), p.998-1002

2011

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About the enhancement of chemical yield during the atmospheric plasma synthesis of ammonia in a ferroelectric packed bed reactor

Plasma processes and polymers, 2017-06, Vol.14 (6), p.n/a

2017

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c-C4F8 Plasmas for the Deposition of Fluorinated Carbon Films

Plasma processes and polymers, 2014-03, Vol.11 (3), p.289-299

2014

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Electrical and reaction performances of packed‐bed plasma reactors moderated with ferroelectric or dielectric materials

Plasma processes and polymers, 2021-03, Vol.18 (3), p.n/a

2021

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Luminescent and Optical Properties of Nanocomposite Thin Films Deposited by Remote Plasma Polymerization of Rhodamine 6G

Plasma processes and polymers, 2009-01, Vol.6 (1), p.17-26

2009

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Back Cover: Plasma Process. Polym. 3∕2014

Plasma processes and polymers, 2014-03, Vol.11 (3), p.300-300

2014

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Stoichiometric Control of SiOx Thin Films Grown by Reactive Magnetron Sputtering at Oblique Angles

Plasma processes and polymers, 2016-12, Vol.13 (12), p.1242-1248

2016

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Plasma Process. Polym. 9/2009

Plasma processes and polymers, 2009-09, Vol.6 (9), p.n/a

2009

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Plasma Process. Polym. 5/2007

Plasma processes and polymers, 2007-07, Vol.4 (5), p.501-501

2007

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Compositional gradients at the nanoscale in substoichiometric thin films deposited by magnetron sputtering at oblique angles: A case study on SiOx thin films

Plasma processes and polymers, 2022-01, Vol.19 (1), p.n/a

2022

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Growth of nanocolumnar thin films on patterned substrates at oblique angles

Plasma processes and polymers, 2019-02, Vol.16 (2), p.n/a

2019

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On the Deposition Rates of Magnetron Sputtered Thin Films at Oblique Angles

Plasma processes and polymers, 2014-06, Vol.11 (6), p.571-576

2014

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High-Rate Deposition of Stoichiometric Compounds by Reactive Magnetron Sputtering at Oblique Angles

Plasma processes and polymers, 2016-10, Vol.13 (10), p.960-964

2016

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Factors that Contribute to the Growth of Ag@TiO2 Nanofibers by Plasma Deposition

Plasma processes and polymers, 2007-07, Vol.4 (5), p.515-527

2007

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Outside Front Cover: Plasma Process. Polym. 9/2022

Plasma processes and polymers, 2022-09, Vol.19 (9), p.n/a

2022

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Plasma Deposition of Superhydrophobic Ag@TiO2 Core@shell Nanorods on Processable Substrates

Plasma processes and polymers, 2014-02, Vol.11 (2), p.164-174

2014

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c -C 4 F 8 Plasmas for the Deposition of Fluorinated Carbon Films: c -C 4 F 8 Plasmas for the Deposition of Fluorinated Carbon Films

Plasma processes and polymers, 2014-03, Vol.11 (3), p.289-299

2014

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Cover Picture: Plasma Process. Polym. 10∕2016

Plasma processes and polymers, 2016-10, Vol.13 (10), p.955-955

2016

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Cover Picture: Plasma Process. Polym. 2∕2014

Plasma processes and polymers, 2014-02, Vol.11 (2), p.97-97

2014

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Plasma Process. Polym. 1/2009

Plasma processes and polymers, 2009-01, Vol.6 (1), p.n/a

2009

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Comparative analysis of the germination of barley seeds subjected to drying, hydrogen peroxide, or oxidative air plasma treatments

Formation of Nitrogen Functional Groups on Plasma Treated DLC

Physicochemical surface analysis and germination at different irrigation conditions of DBD plasma‐treated wheat seeds

Micron‐scale wedge thin films prepared by plasma enhanced chemical vapor deposition

Modulating Low Energy Ion Plasma Fluxes for the Growth of Nanoporous Thin Films

Comments on "An Essay on Contact Angle Measurements": Determination of Surface Roughness and Modeling of the Wetting Behavior

About the enhancement of chemical yield during the atmospheric plasma synthesis of ammonia in a ferroelectric packed bed reactor

c-C4F8 Plasmas for the Deposition of Fluorinated Carbon Films

Electrical and reaction performances of packed‐bed plasma reactors moderated with ferroelectric or dielectric materials

Luminescent and Optical Properties of Nanocomposite Thin Films Deposited by Remote Plasma Polymerization of Rhodamine 6G

Back Cover: Plasma Process. Polym. 3∕2014

Stoichiometric Control of SiOx Thin Films Grown by Reactive Magnetron Sputtering at Oblique Angles

Plasma Process. Polym. 9/2009

Plasma Process. Polym. 5/2007

Compositional gradients at the nanoscale in substoichiometric thin films deposited by magnetron sputtering at oblique angles: A case study on SiOx thin films

Growth of nanocolumnar thin films on patterned substrates at oblique angles

On the Deposition Rates of Magnetron Sputtered Thin Films at Oblique Angles

High-Rate Deposition of Stoichiometric Compounds by Reactive Magnetron Sputtering at Oblique Angles

Factors that Contribute to the Growth of Ag@TiO2 Nanofibers by Plasma Deposition

Outside Front Cover: Plasma Process. Polym. 9/2022

Plasma Deposition of Superhydrophobic Ag@TiO2 Core@shell Nanorods on Processable Substrates

c -C 4 F 8 Plasmas for the Deposition of Fluorinated Carbon Films: c -C 4 F 8 Plasmas for the Deposition of Fluorinated Carbon Films

Cover Picture: Plasma Process. Polym. 10∕2016

Cover Picture: Plasma Process. Polym. 2∕2014

Plasma Process. Polym. 1/2009

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