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Biosynthesis of UDP-α‑N‑Acetyl‑d -mannosaminuronic Acid and CMP-β‑N‑Acetyl‑d‑neuraminic Acid for the Capsular Polysaccharides of Campylobacter jejuni

Biochemistry (Easton), 2024-03, Vol.63 (5), p.688-698

2024

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UMP‐CMP kinase 2 inhibits ZIKV replication through activation of type I IFN signaling pathway

Journal of medical virology, 2024-03, Vol.96 (3), p.e29533-n/a

2024

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Understanding and mitigating temperature-induced agglomeration in silica-based chemical mechanical planarization (CMP) slurry storage

Colloids and surfaces. A, Physicochemical and engineering aspects, 2024-06, Vol.691, Article 133802

2024

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Polishing Mechanism of CMP 4H-SiC Crystal Substrate (0001) Si Surface Based on an Alumina ( Al 2 O 3 ) Abrasive

Materials, 2024-01, Vol.17 (3), p.679

2024

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Polishing Mechanism of CMP 4H-SiC Crystal Substrate Abrasive

Materials, 2024-01, Vol.17 (3)

2024

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Characterization of Ceria Nanoparticles as Abrasives Applied with Defoaming Polymers for CMP (Chemical Mechanical Polishing) Applications

Polymers, 2024-03, Vol.16 (6), p.844

2024

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Parameter Inversion Method of Multilayered Media Based on Off-Grid Sparse CMP Model with Refined Orthogonal Matching Pursuit

IEEE transactions on geoscience and remote sensing, 2024, Vol.62, p.1-1

2024

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Impact of a sleep intervention program on anxiety and depression in patients with chronic musculoskeletal pain (CMP)

Sleep medicine, 2024-02, Vol.115

2024

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Trivalent lanthanum and ytterbium doped meso-silica/ceria abrasive systems toward chemical mechanical polishing (CMP) and ultraviolet irradiation-assisted photochemical mechanical polishing (PCMP)

Applied surface science, 2024-06, Vol.657, Article 159733

2024

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The effect of non-ionic surfactants on the removal of cerium oxide particles in STI CMP post cleaning

Materials science in semiconductor processing, 2024-06, Vol.175, Article 108279

2024

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Damascene versus subtractive line CMP process for resistive memory crossbars BEOL integration

Micro and Nano Engineering, 2024-06, Vol.23, Article 100251

2024

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Three anionic surfactants for corrosion inhibition in cobalt CMP: Research on validity and mechanism

Surfaces and interfaces, 2024-04, Vol.47, Article 104202

2024

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Numerical Simulation of Seakeeping Performance of a Barge Using Computational Fluid Dynamics (CFD)-Modified Potential (CMP) Model

Journal of marine science and engineering, 2024-03, Vol.12 (3), p.369

2024

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Efficient integration of electro-coagulation and ceramic membranes for the treatment of real chemical mechanical polishing (CMP) slurry wastewater from the semiconductor industry

Journal of water process engineering, 2024-05, Vol.61, Article 105326

2024

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Carbon Monitor Power-Simulators across countries: a data-driven approach to simulate daily power generation

Geoscientific Model Development, 2024-04, Vol.17 (7), p.2663-2682

2024

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Effect of 2-phosphonobutane-1,2,4-tricarboxylic acid (PBTCA) on Cu/Ta chemical mechanical planarization (CMP) in the barrier layer: A novel complexing agent and the dual role on Cu

Surfaces and interfaces, 2024-03, Vol.46, p.103969, Article 103969

2024

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Polishing performance and mechanism of a novel Fe-based slurry for chemical mechanical polishing

Tribology international, 2024-06, Vol.194, Article 109549

2024

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Effect of Chitosan and Cationic Polyacrylamide on Optical and Mechanical Properties of Paper Made from Chemi-Mechanical Pulps

Bioresources, 2024-05, Vol.19 (2), p.2901-2915

2024

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Validation of the Portuguese Version of the Short-Form Glasgow Composite Measure Pain Scale (CMPS-SF) According to COSMIN and GRADE Guidelines

Animals (Basel), 2024-03, Vol.14 (6), p.831

2024

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The effect of ethylenediamine tetramethylphosphonic acid on the chemical mechanical polishing of TSV barrier layer

Colloids and surfaces. A, Physicochemical and engineering aspects, 2024-04, Vol.686, Article 133469

2024

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Corrosion inhibition performance and mechanism of nitrogen-containing organic compounds on copper in an alkaline slurry

Journal of molecular liquids, 2024-03, Vol.398, Article 124207

2024

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An Appraisal for Providing Charge Transfer (CT) Through Synthetic Porous Frameworks for their Semiconductor Applications

Small (Weinheim an der Bergstrasse, Germany), 2024-02, p.e2307828-e2307828

2024

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An efficient wavenumber–space–time domain finite-difference modeling of acoustic wave equation for synthesizing CMP gathers

2014-11

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Effectiveness of Maze IV procedure versus thoracoscopic ablation for atrial fibrillation: a propensity score-matched analysis

Annals of cardiothoracic surgery, 2024-03, Vol.13 (2), p.165-172

2024

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Study on the CMP Characteristics of a Copper Passivity Layer Formed by Dipping in an Oxidizer

Journal of the Korean Physical Society, 2011-01, p.120-124

2011

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Biosynthesis of UDP-α‑N‑Acetyl‑d -mannosaminuronic Acid and CMP-β‑N‑Acetyl‑d‑neuraminic Acid for the Capsular Polysaccharides of Campylobacter jejuni

UMP‐CMP kinase 2 inhibits ZIKV replication through activation of type I IFN signaling pathway

Understanding and mitigating temperature-induced agglomeration in silica-based chemical mechanical planarization (CMP) slurry storage

Polishing Mechanism of CMP 4H-SiC Crystal Substrate (0001) Si Surface Based on an Alumina ( Al 2 O 3 ) Abrasive

Polishing Mechanism of CMP 4H-SiC Crystal Substrate Abrasive

Characterization of Ceria Nanoparticles as Abrasives Applied with Defoaming Polymers for CMP (Chemical Mechanical Polishing) Applications

Parameter Inversion Method of Multilayered Media Based on Off-Grid Sparse CMP Model with Refined Orthogonal Matching Pursuit

Impact of a sleep intervention program on anxiety and depression in patients with chronic musculoskeletal pain (CMP)

Trivalent lanthanum and ytterbium doped meso-silica/ceria abrasive systems toward chemical mechanical polishing (CMP) and ultraviolet irradiation-assisted photochemical mechanical polishing (PCMP)

The effect of non-ionic surfactants on the removal of cerium oxide particles in STI CMP post cleaning

Damascene versus subtractive line CMP process for resistive memory crossbars BEOL integration

Three anionic surfactants for corrosion inhibition in cobalt CMP: Research on validity and mechanism

Numerical Simulation of Seakeeping Performance of a Barge Using Computational Fluid Dynamics (CFD)-Modified Potential (CMP) Model

Efficient integration of electro-coagulation and ceramic membranes for the treatment of real chemical mechanical polishing (CMP) slurry wastewater from the semiconductor industry

Carbon Monitor Power-Simulators across countries: a data-driven approach to simulate daily power generation

Effect of 2-phosphonobutane-1,2,4-tricarboxylic acid (PBTCA) on Cu/Ta chemical mechanical planarization (CMP) in the barrier layer: A novel complexing agent and the dual role on Cu

Polishing performance and mechanism of a novel Fe-based slurry for chemical mechanical polishing

Effect of Chitosan and Cationic Polyacrylamide on Optical and Mechanical Properties of Paper Made from Chemi-Mechanical Pulps

Validation of the Portuguese Version of the Short-Form Glasgow Composite Measure Pain Scale (CMPS-SF) According to COSMIN and GRADE Guidelines

The effect of ethylenediamine tetramethylphosphonic acid on the chemical mechanical polishing of TSV barrier layer

Corrosion inhibition performance and mechanism of nitrogen-containing organic compounds on copper in an alkaline slurry

An Appraisal for Providing Charge Transfer (CT) Through Synthetic Porous Frameworks for their Semiconductor Applications

An efficient wavenumber–space–time domain finite-difference modeling of acoustic wave equation for synthesizing CMP gathers

Effectiveness of Maze IV procedure versus thoracoscopic ablation for atrial fibrillation: a propensity score-matched analysis

Study on the CMP Characteristics of a Copper Passivity Layer Formed by Dipping in an Oxidizer

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