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Enhancement of hole mobility in high-rate reactively sputtered Cu2O thin films induced by laser thermal annealing

Applied surface science, 2024-08, Vol.664, p.160255, Article 160255

2024

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Synergy of experiment and model for reactive HiPIMS: effect of discharge parameters on WOx composition and deposition rate

Journal of physics. D, Applied physics, 2021-03, Vol.54 (12)

2021

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Microwave plasma-assisted reactive HiPIMS of InN films: Plasma environment and material characterisation

Surface & coatings technology, 2023-02, Vol.454, p.129188, Article 129188

2023

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Spatially resolved study of spokes in reactive HiPIMS discharge

Plasma sources science & technology, 2022-05, Vol.31 (5), p.55010

2022

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Photocatalytic activity of TiO2 deposited by reactive HiPIMS with long target-to-substrate distance

Surface & coatings technology, 2023-08, Vol.467, p.129659, Article 129659

2023

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On the surface biasing effectiveness during reactive high-power impulse magnetron sputter deposition of zirconium dioxide

Applied surface science, 2023-11, Vol.638, p.158131, Article 158131

2023

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Effect of positive pulse voltage in bipolar reactive HiPIMS on crystal structure, microstructure and mechanical properties of CrN films

Surface & coatings technology, 2020-07, Vol.393, p.125773, Article 125773

2020

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Influence of sputtered species ionisation on the hysteresis behaviour of reactive HiPIMS with oxygen admixture

Plasma sources science & technology, 2020-02, Vol.29 (2), p.25027

2020

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Structure and properties of Hf-O-N films prepared by high-rate reactive HiPIMS with smoothly controlled composition

Ceramics international, 2017-05, Vol.43 (7), p.5661-5667

2017

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On the description of metal ion return in reactive high power impulse magnetron sputtering

Surface & coatings technology, 2021-07, Vol.418, p.127234, Article 127234

2021

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Ultra-short pulse HiPIMS: a strategy to suppress arcing during reactive deposition of SiO2 thin films with enhanced mechanical and optical properties

Coatings (Basel), 2020-07, Vol.10 (7), p.633

2020

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Process stabilization and a significant enhancement of the deposition rate in reactive high-power impulse magnetron sputtering of ZrO2 and Ta2O5 films

Surface & coatings technology, 2013-12, Vol.236, p.550-556

2013

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Ti1−xAlxN coatings by Reactive High Power Impulse Magnetron Sputtering: film/substrate interface effect on residual stress and high temperature oxidation

Surface & coatings technology, 2018-11, Vol.354, p.56-65

2018

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High-rate reactive high-power impulse magnetron sputtering of transparent conductive Al-doped ZnO thin films prepared at ambient temperature

Thin solid films, 2019-06, Vol.679, p.35-41

2019

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Microstructure of hard and optically transparent HfO2 films prepared by high-power impulse magnetron sputtering with a pulsed oxygen flow control

Thin solid films, 2016-11, Vol.619, p.239-249

2016

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High-rate reactive high-power impulse magnetron sputtering of hard and optically transparent HfO2 films

Surface & coatings technology, 2016-03, Vol.290, p.58-64

2016

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Duty cycle control in reactive high-power impulse magnetron sputtering of hafnium and niobium

Journal of physics. D, Applied physics, 2016-06, Vol.49 (24), p.245201-245211

2016

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Band-gap engineering of zirconia by nitrogen doping in reactive HiPIMS: a step forward in developing innovative technologies for photocatalysts synthesis

Frontiers in chemistry, 2023-08, Vol.11, p.1239964-1239964

2023

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Benefits of the controlled reactive high-power impulse magnetron sputtering of stoichiometric ZrO2 films

Vacuum, 2015-04, Vol.114, p.131-141

2015

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Evolution of discharge parameters and sputtered species ionization in reactive HiPIMS with oxygen, nitrogen and acetylene

Plasma sources science & technology, 2019-02, Vol.28 (2), p.25011

2019

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HiPIMS deposition of silicon nitride for solar cell application

Surface & coatings technology, 2018-06, Vol.344, p.197-203

2018

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Nanostructure and Optical Property Tailoring of Zinc Tin Nitride Thin Films through Phenomenological Decoupling: A Pathway to Enhanced Control

ACS applied nano materials, 2024-03, Vol.7 (6), p.6242-6252

2024

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A Study on the Characteristic and Antibacterial Activity of Ti3Ox Thin Films

Catalysts, 2021-11, Vol.11 (11), p.1416

2021

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Effect of pulsed off-times on the reactive HiPIMS preparation of zirconia thin films

Vacuum, 2015-08, Vol.118, p.38-42

2015

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Ellipsometric and XPS characterization of transparent nickel oxide thin films deposited by reactive HiPIMS

Surface & coatings technology, 2014-07, Vol.250, p.21-25

2014

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Enhancement of hole mobility in high-rate reactively sputtered Cu2O thin films induced by laser thermal annealing

Synergy of experiment and model for reactive HiPIMS: effect of discharge parameters on WOx composition and deposition rate

Microwave plasma-assisted reactive HiPIMS of InN films: Plasma environment and material characterisation

Spatially resolved study of spokes in reactive HiPIMS discharge

Photocatalytic activity of TiO2 deposited by reactive HiPIMS with long target-to-substrate distance

On the surface biasing effectiveness during reactive high-power impulse magnetron sputter deposition of zirconium dioxide

Effect of positive pulse voltage in bipolar reactive HiPIMS on crystal structure, microstructure and mechanical properties of CrN films

Influence of sputtered species ionisation on the hysteresis behaviour of reactive HiPIMS with oxygen admixture

Structure and properties of Hf-O-N films prepared by high-rate reactive HiPIMS with smoothly controlled composition

On the description of metal ion return in reactive high power impulse magnetron sputtering

Ultra-short pulse HiPIMS: a strategy to suppress arcing during reactive deposition of SiO2 thin films with enhanced mechanical and optical properties

Process stabilization and a significant enhancement of the deposition rate in reactive high-power impulse magnetron sputtering of ZrO2 and Ta2O5 films

Ti1−xAlxN coatings by Reactive High Power Impulse Magnetron Sputtering: film/substrate interface effect on residual stress and high temperature oxidation

High-rate reactive high-power impulse magnetron sputtering of transparent conductive Al-doped ZnO thin films prepared at ambient temperature

Microstructure of hard and optically transparent HfO2 films prepared by high-power impulse magnetron sputtering with a pulsed oxygen flow control

High-rate reactive high-power impulse magnetron sputtering of hard and optically transparent HfO2 films

Duty cycle control in reactive high-power impulse magnetron sputtering of hafnium and niobium

Band-gap engineering of zirconia by nitrogen doping in reactive HiPIMS: a step forward in developing innovative technologies for photocatalysts synthesis

Benefits of the controlled reactive high-power impulse magnetron sputtering of stoichiometric ZrO2 films

Evolution of discharge parameters and sputtered species ionization in reactive HiPIMS with oxygen, nitrogen and acetylene

HiPIMS deposition of silicon nitride for solar cell application

Nanostructure and Optical Property Tailoring of Zinc Tin Nitride Thin Films through Phenomenological Decoupling: A Pathway to Enhanced Control

A Study on the Characteristic and Antibacterial Activity of Ti3Ox Thin Films

Effect of pulsed off-times on the reactive HiPIMS preparation of zirconia thin films

Ellipsometric and XPS characterization of transparent nickel oxide thin films deposited by reactive HiPIMS

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