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High Performance AlGaInP-Based Micro-LED Displays With Novel Pixel Structures

IEEE photonics technology letters, 2021-12, Vol.33 (24), p.1375-1378

2021

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High-uniformity 1 × 64 linear arrays of silicon carbide avalanche photodiode

Electronics letters, 2020-08, Vol.56 (17), p.895-897

2020

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Model‐based process capability indices: The dry‐etching semiconductor case study

Quality and reliability engineering international, 2020-11, Vol.36 (7), p.2309-2321

2020

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Analysis and improvement of the color anomaly in a‐Si TFT channel with new 4‐mask process

SID International Symposium Digest of technical papers, 2020-07, Vol.51 (S1), p.51-54

2020

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Growth and Selective Etch of Phosphorus-Doped Silicon/Silicon–Germanium Multilayers Structures for Vertical Transistors Application

Nanoscale research letters, 2020-12, Vol.15 (1), p.225-225, Article 225

2020

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A wide measurement pressure range CMOS-MEMS based integrated thermopile vacuum gauge with an XeF2 dry-etching process

Sensors and actuators. A. Physical., 2013-10, Vol.201, p.428-433

2013

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Fabrication and characterization of injection molded multi level nano and microfluidic systems

Microelectronic engineering, 2013-11, Vol.111, p.294-298

2013

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Investigation of Key Technologies for Poly-Si/TaN/HfLaON/IL Gate-Stacks in Advanced Device Applications

IEEE transactions on electron devices, 2014-04, Vol.61 (4), p.991-997

2014

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Greatly enhanced performance of InGaN/GaN nanorod light emitting diodes

Physica status solidi. A, Applications and materials science, 2012-03, Vol.209 (3), p.477-480

2012

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Direction control of colloidal quantum dot emission using dielectric metasurfaces

Nanophotonics (Berlin, Germany), 2020-05, Vol.9 (5), p.1023-1030

2020

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Playing with sizes and shapes of colloidal particles via dry etching methods

Advances in colloid and interface science, 2022-01, Vol.299, p.102538-102538, Article 102538

2022

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Effects of periodic trench structure on cathodo-luminescence in InGaN/GaN multi-quantum wells

Electronics letters, 2014-07, Vol.50 (14), p.1012-1014

2014

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Cooperative stiffening of flexible high aspect ratio nanostructures impart mechanobactericidal activity to soft substrates

Journal of colloid and interface science, 2023-12, Vol.652, p.2127-2138

2023

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Selective dry etching of silicon with heat-mode resist GeSb for the preparation of metasurfaces

Materials science in semiconductor processing, 2024-12, Vol.184, p.108774, Article 108774

2024

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Limitations of Cl2/O2-based ICP-RIE of deep holes for planar photonic crystals in InP

Physica status solidi. C, 2012-02, Vol.9 (2), p.239-242

2012

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Xenon Difluoride Dry Etching for the Microfabrication of Solid Microneedles as a Potential Strategy in Transdermal Drug Delivery (Small 27/2023)

Small (Weinheim an der Bergstrasse, Germany), 2023-07, Vol.19 (27), p.n/a

2023

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P‐101: Zero‐cost solution for TFT Panel non‐film surface strength improvement

SID International Symposium Digest of technical papers, 2024-06, Vol.55 (1), p.1775-1777

2024

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High-rate etching of silicon oxide and nitride using narrow-gap high-pressure (3.3 kPa) hydrogen plasma

Journal of physics. D, Applied physics, 2024-07, Vol.57 (27), p.275204

2024

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Zinc‐Imidazolate Films as an All‐Dry Resist Technology (Adv. Funct. Mater. 12/2024)

Advanced functional materials, 2024-03, Vol.34 (12), p.n/a

2024

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Dry‐etching‐assisted femtosecond laser machining

Laser & photonics reviews, 2017-05, Vol.11 (3), p.n/a

2017

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Effect of the addition of O2 on copper etching using high density plasma of acetylacetonate/Ar

Materials science in semiconductor processing, 2022-12, Vol.152, p.107004, Article 107004

2022

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Rapid Engraving of Artificial Compound Eyes from Curved Sapphire Substrate

Advanced functional materials, 2019-05, Vol.29 (18), p.n/a

2019

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Fluid models calculation of Ar/CF4 radiofrequency capacitively coupled plasmas

Physica scripta, 2024-08, Vol.99 (8)

2024

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Chemical mechanism of oxidative etching of ruthenium: Insights into continuous versus self-limiting conditions

Applied surface science, 2023-11, Vol.636, p.157864, Article 157864

2023

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Fabrication of Vertically Stacked Nanosheet Junctionless Field-Effect Transistors and Applications for the CMOS and CFET Inverters

IEEE transactions on electron devices, 2020-09, Vol.67 (9), p.3504-3509

2020

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High Performance AlGaInP-Based Micro-LED Displays With Novel Pixel Structures

High-uniformity 1 × 64 linear arrays of silicon carbide avalanche photodiode

Model‐based process capability indices: The dry‐etching semiconductor case study

Analysis and improvement of the color anomaly in a‐Si TFT channel with new 4‐mask process

Growth and Selective Etch of Phosphorus-Doped Silicon/Silicon–Germanium Multilayers Structures for Vertical Transistors Application

A wide measurement pressure range CMOS-MEMS based integrated thermopile vacuum gauge with an XeF2 dry-etching process

Fabrication and characterization of injection molded multi level nano and microfluidic systems

Investigation of Key Technologies for Poly-Si/TaN/HfLaON/IL Gate-Stacks in Advanced Device Applications

Greatly enhanced performance of InGaN/GaN nanorod light emitting diodes

Direction control of colloidal quantum dot emission using dielectric metasurfaces

Playing with sizes and shapes of colloidal particles via dry etching methods

Effects of periodic trench structure on cathodo-luminescence in InGaN/GaN multi-quantum wells

Cooperative stiffening of flexible high aspect ratio nanostructures impart mechanobactericidal activity to soft substrates

Selective dry etching of silicon with heat-mode resist GeSb for the preparation of metasurfaces

Limitations of Cl2/O2-based ICP-RIE of deep holes for planar photonic crystals in InP

Xenon Difluoride Dry Etching for the Microfabrication of Solid Microneedles as a Potential Strategy in Transdermal Drug Delivery (Small 27/2023)

P‐101: Zero‐cost solution for TFT Panel non‐film surface strength improvement

High-rate etching of silicon oxide and nitride using narrow-gap high-pressure (3.3 kPa) hydrogen plasma

Zinc‐Imidazolate Films as an All‐Dry Resist Technology (Adv. Funct. Mater. 12/2024)

Dry‐etching‐assisted femtosecond laser machining

Effect of the addition of O2 on copper etching using high density plasma of acetylacetonate/Ar

Rapid Engraving of Artificial Compound Eyes from Curved Sapphire Substrate

Fluid models calculation of Ar/CF4 radiofrequency capacitively coupled plasmas

Chemical mechanism of oxidative etching of ruthenium: Insights into continuous versus self-limiting conditions

Fabrication of Vertically Stacked Nanosheet Junctionless Field-Effect Transistors and Applications for the CMOS and CFET Inverters

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