UB Paderborn / Katalog / Suche / in CDI

High and intermediate temperature sodium-sulfur batteries for energy storage: development, challenges and perspectives

RSC advances, 2019-02, Vol.9 (1), p.5649-5673

2019

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The 2022 Plasma Roadmap: low temperature plasma science and technology

Journal of physics. D, Applied physics, 2022-07, Vol.55 (37), p.373001

2022

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Surface passivation of high-efficiency silicon solar cells by atomic-layer-deposited Al2O3

Progress in photovoltaics, 2008-09, Vol.16 (6), p.461-466

2008

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Oscillatory vapour shielding of liquid metal walls in nuclear fusion devices

Nature communications, 2017-08, Vol.8 (1), p.192-10, Article 192

2017

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Optical constants of graphene measured by spectroscopic ellipsometry

Applied physics letters, 2010-08, Vol.97 (9), p.091904-091904-3

2010

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Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2011-09, Vol.29 (5), p.050801-050801-26

2011

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Taming microwave plasma to beat thermodynamics in CO2 dissociation

Faraday discussions, 2015-01, Vol.183, p.233-248

2015

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Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition

Physica status solidi. PSS-RRL. Rapid research letters, 2010-02, Vol.4 (1-2), p.10-12

2010

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On the c-Si surface passivation mechanism by the negative-charge-dielectric Al2O3

Journal of applied physics, 2008-12, Vol.104 (11)

2008

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Avoiding solid carbon deposition in plasma-based dry reforming of methane

Green chemistry : an international journal and green chemistry resource : GC, 2023-12, Vol.25 (24), p.1485-1497

2023

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CO and byproduct formation during CO2 reduction in dielectric barrier discharges

Journal of applied physics, 2014-09, Vol.116 (12)

2014

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Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface

Journal of applied physics, 2012-05, Vol.111 (9)

2012

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Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2013-01, Vol.31 (1)

2013

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Excitation and relaxation of the asymmetric stretch mode of CO2 in a pulsed glow discharge

Plasma sources science & technology, 2019-03, Vol.28 (3)

2019

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A hard graphitelike hydrogenated amorphous carbon grown at high deposition rate (>15nm∕s)

Applied physics letters, 2008-06, Vol.92 (22), p.221502

2008

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Role of field-effect on c-Si surface passivation by ultrathin (2–20 nm) atomic layer deposited Al2O3

Applied physics letters, 2010-03, Vol.96 (11)

2010

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Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film

Physica status solidi. PSS-RRL. Rapid research letters, 2011-01, Vol.5 (1), p.22-24

2011

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Self-Regulated Plasma Heat Flux Mitigation Due to Liquid Sn Vapor Shielding

Physical review letters, 2016-04, Vol.116 (13), p.135002-135002, Article 135002

2016

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Observation and rationalization of nitrogen oxidation enabled only by coupled plasma and catalyst

Nature communications, 2022-01, Vol.13 (1), p.402-402, Article 402

2022

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Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2010-01, Vol.28 (1), p.77-87

2010

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Emission spectroscopy of He lines in high-density plasmas in Magnum-PSI

AIP advances, 2020-02, Vol.10 (2), p.025225-025225-7

2020

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Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks

Applied physics letters, 2010-10, Vol.97 (15)

2010

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Atomistic simulations of graphite etching at realistic time scales

Chemical science (Cambridge), 2017-10, Vol.8 (10), p.7160-7168

2017

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Silicon surface passivation by atomic layer deposited Al2O3

Journal of applied physics, 2008-08, Vol.104 (4)

2008

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In situ spectroscopic ellipsometry growth studies on the Al-doped ZnO films deposited by remote plasma-enhanced metalorganic chemical vapor deposition

Journal of applied physics, 2008-02, Vol.103 (3)

2008

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Einstellungen

High and intermediate temperature sodium-sulfur batteries for energy storage: development, challenges and perspectives

The 2022 Plasma Roadmap: low temperature plasma science and technology

Surface passivation of high-efficiency silicon solar cells by atomic-layer-deposited Al2O3

Oscillatory vapour shielding of liquid metal walls in nuclear fusion devices

Optical constants of graphene measured by spectroscopic ellipsometry

Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges

Taming microwave plasma to beat thermodynamics in CO2 dissociation

Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition

On the c-Si surface passivation mechanism by the negative-charge-dielectric Al2O3

Avoiding solid carbon deposition in plasma-based dry reforming of methane

CO and byproduct formation during CO2 reduction in dielectric barrier discharges

Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface

Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth

Excitation and relaxation of the asymmetric stretch mode of CO2 in a pulsed glow discharge

A hard graphitelike hydrogenated amorphous carbon grown at high deposition rate (>15nm∕s)

Role of field-effect on c-Si surface passivation by ultrathin (2–20 nm) atomic layer deposited Al2O3

Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film

Self-Regulated Plasma Heat Flux Mitigation Due to Liquid Sn Vapor Shielding

Observation and rationalization of nitrogen oxidation enabled only by coupled plasma and catalyst

Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes

Emission spectroscopy of He lines in high-density plasmas in Magnum-PSI

Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks

Atomistic simulations of graphite etching at realistic time scales

Silicon surface passivation by atomic layer deposited Al2O3

In situ spectroscopic ellipsometry growth studies on the Al-doped ZnO films deposited by remote plasma-enhanced metalorganic chemical vapor deposition

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