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Optical absorption in plasma-deposited silicon oxynitride films

Applied physics letters, 1992-03, Vol.60 (11), p.1399-1401

1992

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Influence de la température de recuit sur les queues d'absorption optique exponentielle de couches minces de silicium amorphe hydrogéné déposé par “glow discharge”

Thin solid films, 1983-07, Vol.105 (2), p.107-113

1983

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Propriétés électriques des couches minces de GaSb amorphe

Thin solid films, 1977-10, Vol.46 (2), p.187-191

1977

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Static refractive index of hydrogenated amorphous and polycrystalline silicon between 293 K and 973 K

Thin solid films, 1989-06, Vol.173 (2), p.155-161

1989

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Influence de l'état de la surface sur les propriétés optiques de couches minces de silicium amorphe hydrogéné déposées par “glow discharge”

Thin solid films, 1983, Vol.103 (1), p.243-248

1983

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Optical gap of hydrogenated amorphous and polycrystalline silicon between 4 and 973 K

Thin solid films, 1987-07, Vol.150 (2), p.181-188

1987

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Temperature dependent studies of the optical properties of post-hydrogenated sputtered a-Si:H

Journal of non-crystalline solids, 1984-01, Vol.64 (1), p.1-10

1984

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Temperature dependent optical properties of boron doped a-Si and boron doped a-Si:H prepared by CVD

Journal of non-crystalline solids, 1984-01, Vol.64 (1), p.11-20

1984

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Temperature dependent optical absorption in hydrogenated silicon from amorphous to crystalline state

Journal of non-crystalline solids, 1987-05, Vol.91 (2), p.243-252

1987

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Temperature effects on the optical properties of amorphous hydrogenated silicon nitrogen alloys prepared by RF sputtering

Journal of non-crystalline solids, 1987-12, Vol.94 (3), p.353-364

1987

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Boron doping and post-hydrogenation effects on optical gaps and urbach tails of amorphous hydrogenated silicon films prepared by chemical vapour deposition

Thin solid films, 1984-05, Vol.115 (4), p.263-268

1984

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Refractive index dependence on optical gap in amorphous silicon—Part I. Si prepared by glow discharge

Infrared physics, 1983, Vol.23 (2), p.99-108

1983

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Influence de la température de recuit sur les queues d'absorption optique exponentielle de couches minces de silicium amorphe hydrogéné déposé par «flow discharge

Thin solid films, 1983, Vol.105 (2), p.107-113

1983

Volltextzugriff (PDF)

Boron doping and posthydrogenation effects on optical gaps and Urbach tails on amorphous hydrogenated silicon films prepared by chemical vapor deposition

Thin solid films, 1984-01, Vol.115 (4), p.263-268

1984

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Variations of optical properties between 95 and 723 K of boron doped a:SiH films prepared by glow discharge

Solar energy materials, 1983-10, Vol.9 (3), p.301-309

1983

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Influence de la température de recuit sur les queues d'absorption optique exponentielle de couches minces de silicium amorphe hydrogéné déposé par “glow discharge”

Thin solid films, 1983-07, Vol.105 (2), p.107-113

1983

Volltextzugriff (PDF)

Erratum

physica status solidi (b), 1982-12, Vol.114 (2), p.742-742

1982

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Erratum

physica status solidi (b), 1982-12, Vol.114 (2), p.742-742

1982

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Erratum

physica status solidi (b), 1982-12, Vol.114 (2), p.742-742

1982

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Calculation Model for Valence Electrons and Hydrogen Concentration in a-Si:H

physica status solidi (b), 1982-09, Vol.113 (1), p.105-111

1982

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Boron doping effect on optical properties of a-Si films prepared by CVD: Post-hydrogenated and H-exodiffusion study

Journal of non-crystalline solids, 1983, Vol.59, p.305-308

1983

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Urbach tail and optical gap of G D a-Si:H films: Temperature and doping effects

Journal of non-crystalline solids, 1983-01, Vol.59, p.313-316

1983

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Dispersion energy and oscillation strength in a-Si:H

Journal of non-crystalline solids, 1983-01, Vol.59, p.173-176

1983

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Collision vs. subduction-related magmatism: Two contrasting ways of granite formation and implications for crustal growth

Lithos, 2017-04, Vol.277, p.154-177

2017

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Refractive index dependence on optical gap in amorphous silicon—part II. Si prepared by chemical vapour deposition

Infrared physics, 1983, Vol.23 (4), p.223-232

1983

Volltextzugriff (PDF)

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Optical absorption in plasma-deposited silicon oxynitride films

Influence de la température de recuit sur les queues d'absorption optique exponentielle de couches minces de silicium amorphe hydrogéné déposé par “glow discharge”

Propriétés électriques des couches minces de GaSb amorphe

Static refractive index of hydrogenated amorphous and polycrystalline silicon between 293 K and 973 K

Influence de l'état de la surface sur les propriétés optiques de couches minces de silicium amorphe hydrogéné déposées par “glow discharge”

Optical gap of hydrogenated amorphous and polycrystalline silicon between 4 and 973 K

Temperature dependent studies of the optical properties of post-hydrogenated sputtered a-Si:H

Temperature dependent optical properties of boron doped a-Si and boron doped a-Si:H prepared by CVD

Temperature dependent optical absorption in hydrogenated silicon from amorphous to crystalline state

Temperature effects on the optical properties of amorphous hydrogenated silicon nitrogen alloys prepared by RF sputtering

Boron doping and post-hydrogenation effects on optical gaps and urbach tails of amorphous hydrogenated silicon films prepared by chemical vapour deposition

Refractive index dependence on optical gap in amorphous silicon—Part I. Si prepared by glow discharge

Influence de la température de recuit sur les queues d'absorption optique exponentielle de couches minces de silicium amorphe hydrogéné déposé par «flow discharge

Boron doping and posthydrogenation effects on optical gaps and Urbach tails on amorphous hydrogenated silicon films prepared by chemical vapor deposition

Variations of optical properties between 95 and 723 K of boron doped a:SiH films prepared by glow discharge

Influence de la température de recuit sur les queues d'absorption optique exponentielle de couches minces de silicium amorphe hydrogéné déposé par “glow discharge”

Erratum

Erratum

Erratum

Calculation Model for Valence Electrons and Hydrogen Concentration in a-Si:H

Boron doping effect on optical properties of a-Si films prepared by CVD: Post-hydrogenated and H-exodiffusion study

Urbach tail and optical gap of G D a-Si:H films: Temperature and doping effects

Dispersion energy and oscillation strength in a-Si:H

Collision vs. subduction-related magmatism: Two contrasting ways of granite formation and implications for crustal growth

Refractive index dependence on optical gap in amorphous silicon—part II. Si prepared by chemical vapour deposition

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