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Oxygen (3P) atom recombination on a Pyrex surface in an O2 plasma

Plasma sources science & technology, 2019-05, Vol.28 (5)

2019

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Actinometry of O, N and F atoms

Journal of physics. D, Applied physics, 2017-02, Vol.50 (7), p.75202

2017

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Sputtering of amorphous Si by low-energy Ar+, Kr+, and Xe+ ions

Journal of applied physics, 2023-08, Vol.134 (6)

2023

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Oxygen ( 3 P) atom recombination on a Pyrex surface in an O 2 plasma

Plasma sources science & technology, 2019-05, Vol.28 (5), p.55005

2019

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Effect of an electron beam on a dual-frequency capacitive rf plasma: experiment and simulation

Plasma sources science & technology, 2022-09, Vol.31 (9), p.94001

2022

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Experimental study of transition from electron beam to rf-power-controlled plasma in DFCCP in argon with additional ionization by an electron beam

Journal of physics. D, Applied physics, 2022-08, Vol.55 (31), p.315201

2022

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‘Virtual IED sensor’ for df rf CCP discharges

Plasma sources science & technology, 2021-07, Vol.30 (7), p.75020

2021

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Surface recombination of oxygen atoms in O2 plasma at increased pressure: I. The recombination probability and phenomenological model of surface processes

Journal of physics. D, Applied physics, 2011-01, Vol.44 (1), p.015201-015201

2011

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Quenching of O2(b1Σg + ) by O(3P) atoms. Effect of gas temperature

Plasma sources science & technology, 2022-06, Vol.31 (6)

2022

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Low-k protection from F radicals and VUV photons using a multilayer pore grafting approach

Journal of physics. D, Applied physics, 2018-07, Vol.51 (32), p.325202

2018

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Multifold study of volume plasma chemistry in Ar/CF4 and Ar/CHF3 CCP discharges

Plasma sources science & technology, 2017-06, Vol.26 (7)

2017

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Surface recombination of oxygen atoms in O2 plasma at increased pressure: II. Vibrational temperature and surface production of ozone

Journal of physics. D, Applied physics, 2011-01, Vol.44 (1), p.015202-015202

2011

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Oxygen atom and ozone kinetics in the afterglow of a pulse-modulated DC discharge in pure O2: an experimental and modelling study of surface mechanisms and ozone vibrational kinetics

Plasma sources science & technology, 2023-09, Vol.32 (9)

2023

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Determination of absolute O(3P) and O2(a1Δg) densities and kinetics in fully modulated O2 dc glow discharges from the O2(X3Σg−) afterglow recovery dynamics

Plasma sources science & technology, 2020-11, Vol.29 (11)

2020

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Experimental and PIC MCC study of electron cooling-re-heating and plasma density decay in low pressure rf ccp argon afterglow

Plasma sources science & technology, 2020-01, Vol.29 (1), p.15015

2020

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Silicon dioxide and low-k material sputtering in dual frequency inductive discharge by argon ions with energies from 16 to 200 eV

Journal of physics. D, Applied physics, 2018-01, Vol.51 (2), p.2

2018

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Effect of H atoms and UV wideband radiation on cured low-k OSG films

Journal of physics. D, Applied physics, 2022-06, Vol.55 (25), p.255206

2022

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Damage to porous SiCOH low- k dielectrics by O, N and F atoms at lowered temperatures

Journal of physics. D, Applied physics, 2020-04, Vol.53 (17), p.175203

2020

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Volume and surface loss of O( 3 P) atoms in O 2 RF discharge in quartz tube at intermediate pressures (10–100 Torr)

Journal of physics. D, Applied physics, 2019-09, Vol.52 (39), p.395203

2019

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Electron energy probability function in plasma controlled by high-energy run-away electrons

Plasma sources science & technology, 2020-02, Vol.29 (2), p.25026

2020

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Volume and surface loss of O(3P) atoms in O2 RF discharge in quartz tube at intermediate pressures (10-100 Torr)

Journal of physics. D, Applied physics, 2019-07, Vol.52 (39)

2019

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Thermoluminescence of monoclinic ZrO2 after electron irradiation

AIP Conference Proceedings, 2022, Vol.2466 (1)

2022

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Damage and etching of ultra low-k materials in fluorocarbon plasma at lowered temperatures

Journal of physics. D, Applied physics, 2017-12, Vol.50 (48), p.485202

2017

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A single-use cartridge based on an acoustic sensor for a portable device for rapid assessment of the functional state of the hemostasis system

Biomedical engineering, 2024-07, Vol.58 (2), p.102-105

2024

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Interaction of F atoms with SiOCH ultra-low-k films: I. Fluorination and damage

Journal of physics. D, Applied physics, 2015-05, Vol.48 (17), p.175203-13

2015

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Oxygen (3P) atom recombination on a Pyrex surface in an O2 plasma

Actinometry of O, N and F atoms

Sputtering of amorphous Si by low-energy Ar+, Kr+, and Xe+ ions

Oxygen ( 3 P) atom recombination on a Pyrex surface in an O 2 plasma

Effect of an electron beam on a dual-frequency capacitive rf plasma: experiment and simulation

Experimental study of transition from electron beam to rf-power-controlled plasma in DFCCP in argon with additional ionization by an electron beam

‘Virtual IED sensor’ for df rf CCP discharges

Surface recombination of oxygen atoms in O2 plasma at increased pressure: I. The recombination probability and phenomenological model of surface processes

Quenching of O2(b1Σg + ) by O(3P) atoms. Effect of gas temperature

Low-k protection from F radicals and VUV photons using a multilayer pore grafting approach

Multifold study of volume plasma chemistry in Ar/CF4 and Ar/CHF3 CCP discharges

Surface recombination of oxygen atoms in O2 plasma at increased pressure: II. Vibrational temperature and surface production of ozone

Oxygen atom and ozone kinetics in the afterglow of a pulse-modulated DC discharge in pure O2: an experimental and modelling study of surface mechanisms and ozone vibrational kinetics

Determination of absolute O(3P) and O2(a1Δg) densities and kinetics in fully modulated O2 dc glow discharges from the O2(X3Σg−) afterglow recovery dynamics

Experimental and PIC MCC study of electron cooling-re-heating and plasma density decay in low pressure rf ccp argon afterglow

Silicon dioxide and low-k material sputtering in dual frequency inductive discharge by argon ions with energies from 16 to 200 eV

Effect of H atoms and UV wideband radiation on cured low-k OSG films

Damage to porous SiCOH low- k dielectrics by O, N and F atoms at lowered temperatures

Volume and surface loss of O( 3 P) atoms in O 2 RF discharge in quartz tube at intermediate pressures (10–100 Torr)

Electron energy probability function in plasma controlled by high-energy run-away electrons

Volume and surface loss of O(3P) atoms in O2 RF discharge in quartz tube at intermediate pressures (10-100 Torr)

Thermoluminescence of monoclinic ZrO2 after electron irradiation

Damage and etching of ultra low-k materials in fluorocarbon plasma at lowered temperatures

A single-use cartridge based on an acoustic sensor for a portable device for rapid assessment of the functional state of the hemostasis system

Interaction of F atoms with SiOCH ultra-low-k films: I. Fluorination and damage

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