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Characterization of colloidal silica abrasives with different sizes and their chemical–mechanical polishing performance on 4H-SiC (0001)

Applied surface science, 2014-07, Vol.307, p.414-427

2014

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A study of chemical products formed on sapphire (0001) during chemical–mechanical polishing

Surface & coatings technology, 2015-05, Vol.270, p.206-220

2015

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XPS, UV–vis spectroscopy and AFM studies on removal mechanisms of Si-face SiC wafer chemical mechanical polishing (CMP)

Applied surface science, 2014-10, Vol.316, p.643-648

2014

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Automatic Pancreatic Ductal Adenocarcinoma Detection in Whole Slide Images Using Deep Convolutional Neural Networks

Frontiers in oncology, 2021-06, Vol.11, p.665929-665929

2021

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Extended study of the atomic step-terrace structure on hexagonal SiC (0001) by chemical-mechanical planarization

Applied surface science, 2013-11, Vol.284, p.195-206

2013

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Investigation on the surface characterization of Ga-faced GaN after chemical-mechanical polishing

Applied surface science, 2015-05, Vol.338, p.85-91

2015

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Preparation of a novel catalyst (SoFeIII) and its catalytic performance towards the removal rate of sapphire substrate during CMP process

Tribology international, 2018-04, Vol.120, p.99-104

2018

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A quantitative proteomic study reveals oxidative stress and synapse-related proteins contributed to TDCIPP exposure induced neurotoxicity

Ecotoxicology and environmental safety, 2024-02, Vol.271, p.116005-116005, Article 116005

2024

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Chemical mechanical polishing (CMP) of on-axis Si-face 6H-SiC wafer for obtaining atomically flat defect-free surface

Journal of materials science. Materials in electronics, 2013-12, Vol.24 (12), p.5040-5047

2013

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AFM and XPS studies on material removal mechanism of sapphire wafer during chemical mechanical polishing (CMP)

Journal of materials science. Materials in electronics, 2015-12, Vol.26 (12), p.9921-9928

2015

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Inhibition of autophagosome-lysosome fusion contributes to TDCIPP-induced Aβ1-42 production in N2a-APPswe cells

Heliyon, 2024-04, Vol.10 (8), p.e26832-e26832, Article e26832

2024

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Fe-Nx/C assisted chemical–mechanical polishing for improving the removal rate of sapphire

Applied surface science, 2015-07, Vol.343, p.115-120

2015

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Synthesis of dual-doped non-precious metal electrocatalysts and their electrocatalytic activity for oxygen reduction reaction

Journal of energy chemistry, 2014-07, Vol.23 (4), p.498-506

2014

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Enhancing fluid classification using meta-learning and transformer through small-sample drilling data to interpret well logging data

Physics of fluids (1994), 2024-07, Vol.36 (7)

2024

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Characterization of sapphire chemical mechanical polishing performances using silica with different sizes and their removal mechanisms

Colloids and surfaces. A, Physicochemical and engineering aspects, 2017-01, Vol.513, p.153-159

2017

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An in situ study of chemical-mechanical polishing behaviours on sapphire (0001) via simulating the chemical product-removal process by AFM-tapping mode in both liquid and air environments

Nanoscale, 2018-11, Vol.10 (42), p.19692-19700

2018

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Atomically smooth gallium nitride surface prepared by chemical-mechanical polishing with S2O82−-Fe2+ based slurry

Tribology international, 2017-06, Vol.110, p.441-450

2017

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Fe-N x /C assisted chemical-mechanical polishing for improving the removal rate of sapphire

Applied surface science, 2015-07, Vol.343, p.115-120

2015

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Chemical Mechanical Polishing (CMP) of SiC Wafer Using Photo-Catalyst Incorporated Pad

ECS journal of solid state science and technology, 2017, Vol.6 (9), p.P603-P608

2017

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An in situ study of chemical-mechanical polishing behaviours on sapphire (0001) via simulating the chemical product-removal process by AFM-tapping mode in both liquid and air environmentsElectronic supplementary information (ESI) available: Experimental details, Fig. S1-S3 and Video 1-2. See DOI: 10.1039/c8nr04645j

2018-11

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A non-noble material cathode catalyst dual-doped with sulfur and nitrogen as efficient electrocatalysts for oxygen reduction reaction

Electrochimica acta, 2015-09, Vol.177, p.57-64

2015

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Atomically smooth gallium nitride surface prepared by chemical-mechanical polishing with different abrasives

Proceedings of the Institution of Mechanical Engineers. Part J, Journal of engineering tribology, 2014-10, Vol.228 (10), p.1144-1150

2014

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The Deterioration Characteristics and Mechanism of Polishing Pads in Chemical Mechanical Polishing of Fused Silica

ECS journal of solid state science and technology, 2019-01, Vol.8 (1), p.P7-P11

2019

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Preparation of Bioactive Calcium Phosphate Coating on Porous C/C Substrate by a Novel Deposition Technique

Journal of Wuhan University of Technology. Materials science edition, 2008-08, Vol.23 (4), p.486-489

2008

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Atomically smooth gallium nitride surface prepared by chemical-mechanical polishing with S^sub 2^O^sub 8^^sup 2-^-Fe^sup 2+^ based slurry

Tribology international, 2017-06, Vol.110, p.441

2017

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Characterization of colloidal silica abrasives with different sizes and their chemical–mechanical polishing performance on 4H-SiC (0001)

A study of chemical products formed on sapphire (0001) during chemical–mechanical polishing

XPS, UV–vis spectroscopy and AFM studies on removal mechanisms of Si-face SiC wafer chemical mechanical polishing (CMP)

Automatic Pancreatic Ductal Adenocarcinoma Detection in Whole Slide Images Using Deep Convolutional Neural Networks

Extended study of the atomic step-terrace structure on hexagonal SiC (0001) by chemical-mechanical planarization

Investigation on the surface characterization of Ga-faced GaN after chemical-mechanical polishing

Preparation of a novel catalyst (SoFeIII) and its catalytic performance towards the removal rate of sapphire substrate during CMP process

A quantitative proteomic study reveals oxidative stress and synapse-related proteins contributed to TDCIPP exposure induced neurotoxicity

Chemical mechanical polishing (CMP) of on-axis Si-face 6H-SiC wafer for obtaining atomically flat defect-free surface

AFM and XPS studies on material removal mechanism of sapphire wafer during chemical mechanical polishing (CMP)

Inhibition of autophagosome-lysosome fusion contributes to TDCIPP-induced Aβ1-42 production in N2a-APPswe cells

Fe-Nx/C assisted chemical–mechanical polishing for improving the removal rate of sapphire

Synthesis of dual-doped non-precious metal electrocatalysts and their electrocatalytic activity for oxygen reduction reaction

Enhancing fluid classification using meta-learning and transformer through small-sample drilling data to interpret well logging data

Characterization of sapphire chemical mechanical polishing performances using silica with different sizes and their removal mechanisms

An in situ study of chemical-mechanical polishing behaviours on sapphire (0001) via simulating the chemical product-removal process by AFM-tapping mode in both liquid and air environments

Atomically smooth gallium nitride surface prepared by chemical-mechanical polishing with S2O82−-Fe2+ based slurry

Fe-N x /C assisted chemical-mechanical polishing for improving the removal rate of sapphire

Chemical Mechanical Polishing (CMP) of SiC Wafer Using Photo-Catalyst Incorporated Pad

A non-noble material cathode catalyst dual-doped with sulfur and nitrogen as efficient electrocatalysts for oxygen reduction reaction

Atomically smooth gallium nitride surface prepared by chemical-mechanical polishing with different abrasives

The Deterioration Characteristics and Mechanism of Polishing Pads in Chemical Mechanical Polishing of Fused Silica

Preparation of Bioactive Calcium Phosphate Coating on Porous C/C Substrate by a Novel Deposition Technique

Atomically smooth gallium nitride surface prepared by chemical-mechanical polishing with S^sub 2^O^sub 8^^sup 2-^-Fe^sup 2+^ based slurry

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