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Behavior of Lamellar Forming Block Copolymers under Nanoconfinement: Implications for Topography Directed Self-Assembly of Sub-10 nm Structures

Macromolecules, 2014-01, Vol.47 (1), p.276-283

2014

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Tuning the Kinetics and Energetics of Diels−Alder Cycloaddition Reactions to Improve Poling Efficiency and Thermal Stability of High-Temperature Cross-Linked Electro-Optic Polymers

Chemistry of materials, 2010-10, Vol.22 (19), p.5601-5608

2010

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Catalytic and Autocatalytic Mechanisms of Acid Amplifiers for Use in EUV Photoresists

Chemistry of materials, 2010-10, Vol.22 (19), p.5609-5616

2010

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Electro-optic polymer cladding ring resonator modulators

Optics express, 2008-10, Vol.16 (22), p.18326-18333

2008

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Patterning of Tailored Polycarbonate Based Non-Chemically Amplified Resists Using Extreme Ultraviolet Lithography

Macromolecular rapid communications., 2010-08, Vol.31 (16), p.1449-1455

2010

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Evidence of speckle in extreme-UV lithography

Optics express, 2012-11, Vol.20 (23), p.25970-25978

2012

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Fluorinated Acid Amplifiers for EUV Lithography

Journal of the American Chemical Society, 2009-07, Vol.131 (29), p.9862-9863

2009

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Time Dependent Behavior of Chemically Amplified Resist Characterized under Sub-millisecond Post Exposure Bake

Journal of Photopolymer Science and Technology, 2011/06/21, Vol.24(5), pp.487-490

2011

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Neutral, Single-Component Nickel (II) Polyolefin Catalysts That Tolerate Heteroatoms

Science (American Association for the Advancement of Science), 2000-01, Vol.287 (5452), p.460-462

2000

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Readying Directed Self-Assembly for Patterning in Semi-Conductor Manufacturing

Journal of Photopolymer Science and Technology, 2013/12/28, Vol.26(6), pp.779-791

2013

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Mask Effects on Resist Variability in Extreme Ultraviolet Lithography

Japanese Journal of Applied Physics, 2013-06, Vol.52 (6), p.06GC02-06GC02-5

2013

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Kinetic Rates of Thermal Transformations and Diffusion in Polymer Systems Measured during Sub-millisecond Laser-Induced Heating

ACS nano, 2012-07, Vol.6 (7), p.5830-5836

2012

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Chain scission resists for extreme ultraviolet lithography based on high performance polysulfone-containing polymers

Journal of materials chemistry, 2011-01, Vol.21 (15), p.5629-5637

2011

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High resolution negative tone molecular resist based on di-functional epoxide polymerization

Microelectronic engineering, 2009-04, Vol.86 (4), p.734-737

2009

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Reinforced Site Isolation Leading to Remarkable Thermal Stability and High Electrooptic Activities in Cross-Linked Nonlinear Optical Dendrimers

Chemistry of materials, 2008-10, Vol.20 (20), p.6372-6377

2008

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Neutral Nickel(II)-Based Catalysts for Ethylene Polymerization

Organometallics, 1998-07, Vol.17 (15), p.3149-3151

1998

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EUV Resist Testing Status and Post Lithography LWR Reduction

Journal of Photopolymer Science and Technology, 2011/06/21, Vol.24(2), pp.127-136

2011

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Synthesis of neutral nickel catalysts for ethylene polymerization--the influence of ligand size on catalyst stability

Chemical communications (Cambridge, England), 2003-09 (18), p.2272-2273

2003

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Insights into the Deactivation of Neutral Nickel Ethylene Polymerization Catalysts in the Presence of Functionalized Olefins

Organometallics, 2004-10, Vol.23 (22), p.5121-5123

2004

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Controlled Diels−Alder Reactions Used To Incorporate Highly Efficient Polyenic Chromophores into Maleimide-Containing Side-Chain Polymers for Electro-Optics

Macromolecules, 2009-04, Vol.42 (7), p.2438-2445

2009

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Frequency multiplication of lamellar phase block copolymers with grapho-epitaxy directed self-assembly sensitivity to prepattern

Journal of micro/nanolithography, MEMS, and MOEMS, 2012-07, Vol.11 (3), p.31303

Gronheid, Roel

2012

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Electron-Beam-Induced Freezing of an Aromatic-Based EUV Resist: A Robust Template for Directed Self-Assembly of Block Copolymers

IEEE transactions on nanotechnology, 2012-11, Vol.11 (6), p.1140-1147

2012

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Extreme ultraviolet (EUV) degradation of poly(olefin sulfone)s: Towards applications as EUV photoresists

Radiation physics and chemistry (Oxford, England : 1993), 2011-02, Vol.80 (2), p.236-241

2011

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Critical material properties for pattern collapse mitigation

Journal of micro/nanolithography, MEMS, and MOEMS, 2012-07, Vol.11 (3), p.33004

Winroth, Gustaf

2012

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Achieving excellent electro-optic activity and thermal stability in poled polymers through an expeditious crosslinking process

Journal of materials chemistry, 2012-01, Vol.22 (3), p.951-959

2012

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Behavior of Lamellar Forming Block Copolymers under Nanoconfinement: Implications for Topography Directed Self-Assembly of Sub-10 nm Structures

Tuning the Kinetics and Energetics of Diels−Alder Cycloaddition Reactions to Improve Poling Efficiency and Thermal Stability of High-Temperature Cross-Linked Electro-Optic Polymers

Catalytic and Autocatalytic Mechanisms of Acid Amplifiers for Use in EUV Photoresists

Electro-optic polymer cladding ring resonator modulators

Patterning of Tailored Polycarbonate Based Non-Chemically Amplified Resists Using Extreme Ultraviolet Lithography

Evidence of speckle in extreme-UV lithography

Fluorinated Acid Amplifiers for EUV Lithography

Time Dependent Behavior of Chemically Amplified Resist Characterized under Sub-millisecond Post Exposure Bake

Neutral, Single-Component Nickel (II) Polyolefin Catalysts That Tolerate Heteroatoms

Readying Directed Self-Assembly for Patterning in Semi-Conductor Manufacturing

Mask Effects on Resist Variability in Extreme Ultraviolet Lithography

Kinetic Rates of Thermal Transformations and Diffusion in Polymer Systems Measured during Sub-millisecond Laser-Induced Heating

Chain scission resists for extreme ultraviolet lithography based on high performance polysulfone-containing polymers

High resolution negative tone molecular resist based on di-functional epoxide polymerization

Reinforced Site Isolation Leading to Remarkable Thermal Stability and High Electrooptic Activities in Cross-Linked Nonlinear Optical Dendrimers

Neutral Nickel(II)-Based Catalysts for Ethylene Polymerization

EUV Resist Testing Status and Post Lithography LWR Reduction

Synthesis of neutral nickel catalysts for ethylene polymerization--the influence of ligand size on catalyst stability

Insights into the Deactivation of Neutral Nickel Ethylene Polymerization Catalysts in the Presence of Functionalized Olefins

Controlled Diels−Alder Reactions Used To Incorporate Highly Efficient Polyenic Chromophores into Maleimide-Containing Side-Chain Polymers for Electro-Optics

Frequency multiplication of lamellar phase block copolymers with grapho-epitaxy directed self-assembly sensitivity to prepattern

Electron-Beam-Induced Freezing of an Aromatic-Based EUV Resist: A Robust Template for Directed Self-Assembly of Block Copolymers

Extreme ultraviolet (EUV) degradation of poly(olefin sulfone)s: Towards applications as EUV photoresists

Critical material properties for pattern collapse mitigation

Achieving excellent electro-optic activity and thermal stability in poled polymers through an expeditious crosslinking process

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