UB Paderborn / Katalog / Suche / in CDI

Sortiert nach

Einfacher Volltextzugriff von (fast) überall

Installieren Sie die LibKey Nomad-Browsererweiterung und erhalten Sie von vielen Webseiten einfachen Zugriff auf lizenzierte Volltexte oder Open Access Publikationen. Mehr erfahren...

Behavior of Lamellar Forming Block Copolymers under Nanoconfinement: Implications for Topography Directed Self-Assembly of Sub-10 nm Structures

Macromolecules, 2014-01, Vol.47 (1), p.276-283

2014

Volltextzugriff (PDF)

Neutral, Single-Component Nickel (II) Polyolefin Catalysts That Tolerate Heteroatoms

Science (American Association for the Advancement of Science), 2000-01, Vol.287 (5452), p.460-462

2000

Volltextzugriff (PDF)

Tuning the Kinetics and Energetics of Diels−Alder Cycloaddition Reactions to Improve Poling Efficiency and Thermal Stability of High-Temperature Cross-Linked Electro-Optic Polymers

Chemistry of materials, 2010-10, Vol.22 (19), p.5601-5608

2010

Volltextzugriff (PDF)

Catalytic and Autocatalytic Mechanisms of Acid Amplifiers for Use in EUV Photoresists

Chemistry of materials, 2010-10, Vol.22 (19), p.5609-5616

2010

Volltextzugriff (PDF)

Kinetic Rates of Thermal Transformations and Diffusion in Polymer Systems Measured during Sub-millisecond Laser-Induced Heating

ACS nano, 2012-07, Vol.6 (7), p.5830-5836

2012

Volltextzugriff (PDF)

RFIC Plenary Speaker 1

2023 IEEE Radio Frequency Integrated Circuits Symposium (RFIC), 2023, p.1-2

Younkin, Todd

2023

Volltextzugriff (PDF)

Electro-optic polymer cladding ring resonator modulators

Optics express, 2008-10, Vol.16 (22), p.18326-18333

2008

Volltextzugriff (PDF)

Patterning of Tailored Polycarbonate Based Non-Chemically Amplified Resists Using Extreme Ultraviolet Lithography

Macromolecular rapid communications., 2010-08, Vol.31 (16), p.1449-1455

2010

Volltextzugriff (PDF)

Evidence of speckle in extreme-UV lithography

Optics express, 2012-11, Vol.20 (23), p.25970-25978

2012

Volltextzugriff (PDF)

Reinforced Site Isolation Leading to Remarkable Thermal Stability and High Electrooptic Activities in Cross-Linked Nonlinear Optical Dendrimers

Chemistry of materials, 2008-10, Vol.20 (20), p.6372-6377

2008

Volltextzugriff (PDF)

Neutral Nickel(II)-Based Catalysts for Ethylene Polymerization

Organometallics, 1998-07, Vol.17 (15), p.3149-3151

1998

Volltextzugriff (PDF)

Synthesis of neutral nickel catalysts for ethylene polymerization--the influence of ligand size on catalyst stability

Chemical communications (Cambridge, England), 2003-09 (18), p.2272-2273

2003

Volltextzugriff (PDF)

Fluorinated Acid Amplifiers for EUV Lithography

Journal of the American Chemical Society, 2009-07, Vol.131 (29), p.9862-9863

2009

Volltextzugriff (PDF)

Insights into the Deactivation of Neutral Nickel Ethylene Polymerization Catalysts in the Presence of Functionalized Olefins

Organometallics, 2004-10, Vol.23 (22), p.5121-5123

2004

Volltextzugriff (PDF)

Time Dependent Behavior of Chemically Amplified Resist Characterized under Sub-millisecond Post Exposure Bake

Journal of Photopolymer Science and Technology, 2011/06/21, Vol.24(5), pp.487-490

2011

Volltextzugriff (PDF)

Controlled Diels−Alder Reactions Used To Incorporate Highly Efficient Polyenic Chromophores into Maleimide-Containing Side-Chain Polymers for Electro-Optics

Macromolecules, 2009-04, Vol.42 (7), p.2438-2445

2009

Volltextzugriff (PDF)

Readying Directed Self-Assembly for Patterning in Semi-Conductor Manufacturing

Journal of Photopolymer Science and Technology, 2013/12/28, Vol.26(6), pp.779-791

2013

Volltextzugriff (PDF)

Frequency multiplication of lamellar phase block copolymers with grapho-epitaxy directed self-assembly sensitivity to prepattern

Journal of micro/nanolithography, MEMS, and MOEMS, 2012-07, Vol.11 (3), p.31303

Gronheid, Roel

2012

Volltextzugriff (PDF)

Extreme ultraviolet (EUV) degradation of poly(olefin sulfone)s: Towards applications as EUV photoresists

Radiation physics and chemistry (Oxford, England : 1993), 2011-02, Vol.80 (2), p.236-241

2011

Volltextzugriff (PDF)

Electron-Beam-Induced Freezing of an Aromatic-Based EUV Resist: A Robust Template for Directed Self-Assembly of Block Copolymers

IEEE transactions on nanotechnology, 2012-11, Vol.11 (6), p.1140-1147

2012

Volltextzugriff (PDF)

Mask Effects on Resist Variability in Extreme Ultraviolet Lithography

Japanese Journal of Applied Physics, 2013-06, Vol.52 (6), p.06GC02-06GC02-5

2013

Volltextzugriff (PDF)

Achieving excellent electro-optic activity and thermal stability in poled polymers through an expeditious crosslinking process

Journal of materials chemistry, 2012-01, Vol.22 (3), p.951-959

2012

Volltextzugriff (PDF)

Critical material properties for pattern collapse mitigation

Journal of micro/nanolithography, MEMS, and MOEMS, 2012-07, Vol.11 (3), p.33004

Winroth, Gustaf

2012

Volltextzugriff (PDF)

Chain scission resists for extreme ultraviolet lithography based on high performance polysulfone-containing polymers

Journal of materials chemistry, 2011-01, Vol.21 (15), p.5629-5637

2011

Volltextzugriff (PDF)

High resolution negative tone molecular resist based on di-functional epoxide polymerization

Microelectronic engineering, 2009-04, Vol.86 (4), p.734-737

2009

Volltextzugriff (PDF)

1 – 25 von 102

Suche als RSS-Feed

Suchergebnisse filtern

Filter anzeigen

Nur zeigen

Geprüft (Peer-Review)
(84)
Mit Volltextzugriff
(95)

Publikationsform

Sprache

Englisch
(101)

Erscheinungsjahr

n.n

Thema

Science & Technology
(68)
Physical Sciences
(32)
Humans
(28)
Life Sciences & Biomedicine
(26)
Alzheimer's Disease
(22)
Science & Technology - Other Topics
(20)
Technology
(17)
Neurosciences & Neurology
(16)
Alzheimer Disease - Genetics
(15)
Chemistry
(14)
Neurology
(13)
Amyloid Beta-Protein Precursor - Metabolism
(12)
Materials Science
(11)
Materials Science, Multidisciplinary
(11)
Neurosciences
(11)
Clinical Neurology
(10)
Female
(10)
Gene Expression
(10)
Multidisciplinary Sciences
(10)
Nanoscience & Nanotechnology
(10)

15 weitere anzeigen...

Weniger anzeigen...

Menü

Weitere Dienste

Einstellungen

Behavior of Lamellar Forming Block Copolymers under Nanoconfinement: Implications for Topography Directed Self-Assembly of Sub-10 nm Structures

Neutral, Single-Component Nickel (II) Polyolefin Catalysts That Tolerate Heteroatoms

Tuning the Kinetics and Energetics of Diels−Alder Cycloaddition Reactions to Improve Poling Efficiency and Thermal Stability of High-Temperature Cross-Linked Electro-Optic Polymers

Catalytic and Autocatalytic Mechanisms of Acid Amplifiers for Use in EUV Photoresists

Kinetic Rates of Thermal Transformations and Diffusion in Polymer Systems Measured during Sub-millisecond Laser-Induced Heating

RFIC Plenary Speaker 1

Electro-optic polymer cladding ring resonator modulators

Patterning of Tailored Polycarbonate Based Non-Chemically Amplified Resists Using Extreme Ultraviolet Lithography

Evidence of speckle in extreme-UV lithography

Reinforced Site Isolation Leading to Remarkable Thermal Stability and High Electrooptic Activities in Cross-Linked Nonlinear Optical Dendrimers

Neutral Nickel(II)-Based Catalysts for Ethylene Polymerization

Synthesis of neutral nickel catalysts for ethylene polymerization--the influence of ligand size on catalyst stability

Fluorinated Acid Amplifiers for EUV Lithography

Insights into the Deactivation of Neutral Nickel Ethylene Polymerization Catalysts in the Presence of Functionalized Olefins

Time Dependent Behavior of Chemically Amplified Resist Characterized under Sub-millisecond Post Exposure Bake

Controlled Diels−Alder Reactions Used To Incorporate Highly Efficient Polyenic Chromophores into Maleimide-Containing Side-Chain Polymers for Electro-Optics

Readying Directed Self-Assembly for Patterning in Semi-Conductor Manufacturing

Frequency multiplication of lamellar phase block copolymers with grapho-epitaxy directed self-assembly sensitivity to prepattern

Extreme ultraviolet (EUV) degradation of poly(olefin sulfone)s: Towards applications as EUV photoresists

Electron-Beam-Induced Freezing of an Aromatic-Based EUV Resist: A Robust Template for Directed Self-Assembly of Block Copolymers

Mask Effects on Resist Variability in Extreme Ultraviolet Lithography

Achieving excellent electro-optic activity and thermal stability in poled polymers through an expeditious crosslinking process

Critical material properties for pattern collapse mitigation

Chain scission resists for extreme ultraviolet lithography based on high performance polysulfone-containing polymers

High resolution negative tone molecular resist based on di-functional epoxide polymerization

Suchergebnisse filtern