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Etch characteristics of Si and TiO2 nanostructures using pulse biased inductively coupled plasmas

Nanotechnology, 2020-04, Vol.31 (26)

2020

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Low Global Warming Potential Alternative Gases for Plasma Chamber Cleaning

Science of advanced materials, 2016-12, Vol.8 (12), p.2253-2259

2016

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A study on the etching characteristics of magnetic tunneling junction materials using DC pulse-biased inductively coupled plasmas

Japanese Journal of Applied Physics, 2015-01, Vol.54 (1S), p.1-1-01AE01-6

2015

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Etching of Magnetic Tunnel Junction Materials Using Reactive Ion Beam

Journal of nanoscience and nanotechnology, 2016-11, Vol.16 (11), p.11823-11830

2016

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나노 반도체 소자를 위한 펄스 플라즈마 식각 기술

한국표면공학회지, 2015, 48(6), , pp.360-370

2015

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Highly oxidation-resistant silver nanowires by CxFy polymers using plasma treatment

Nanotechnology, 2019-07, Vol.30 (28)

2019

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Highly oxidation-resistant silver nanowires by C x F y polymers using plasma treatment

Nanotechnology, 2019-07, Vol.30 (28), p.285702-285702

2019

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Effects of superimposed dual-frequency (13.56/2 MHz) inductively coupled plasma source on the uniformity of Ar/CF4 plasma

Vacuum, 2019-10, Vol.168, p.108802, Article 108802

2019

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Etch characteristics of Si and TiO 2 nanostructures using pulse biased inductively coupled plasmas

Nanotechnology, 2020-04, Vol.31 (26), p.265302

2020

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SiO2 etch characteristics and environmental impact of Ar/C3F6O chemistry

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2018-11, Vol.36 (6)

2018

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Effect of pulse phase lag in the dual synchronized pulsed capacitive coupled plasma on the etch characteristics of SiO2 by using a C4F8/Ar/O2 gas mixture

Vacuum, 2015-11, Vol.121, p.294-299

2015

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Etch residue removal of CoFeB using CO/NH3 reactive ion beam for spin transfer torque-magnetic random access memory device

Journal of vacuum science and technology. B, Nanotechnology & microelectronics, 2015-11, Vol.33 (6)

2015

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Etch characteristics of magnetic tunnel junction materials using substrate heating in the pulse-biased inductively coupled plasma

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2015-11, Vol.33 (6)

2015

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Effect of Structure and Material Variation of Focus Ring for Enhanced Etch Resistance

Nanoscience and nanotechnology letters, 2017-01, Vol.9 (1), p.24-29

2017

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Nanoscale Spin-Transfer Torque MRAM Etching Using Various Gases

ECS transactions, 2017, Vol.77 (3), p.29-36

2017

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Etch Damage Reduction of Ultra Low-k Dielectric by Using Pulsed Plasmas

ECS transactions, 2019-04, Vol.89 (3), p.79-86

2019

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Influence of pulsed bias frequency on the etching of magnetic tunneling junction materials

Vacuum, 2016-05, Vol.127, p.82-87

2016

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Low Energy BCl3 Plasma Doping of Few-Layer Graphene

Science of advanced materials, 2016-04, Vol.8 (4), p.884-890

2016

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Effect of RF Pulsing Biasing on the Etching of Magnetic Tunnel Junction Materials Using CH3OH

Journal of nanoscience and nanotechnology, 2014-12, Vol.14 (12), p.9680-9685

2014

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Etch Characteristics of Magnetic Tunnel Junction Materials Using Bias Pulsing in the CH4/N2O Inductively Coupled Plasma

Journal of nanoscience and nanotechnology, 2014-12, Vol.14 (12), p.9541-9547

2014

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Plasma Treatment of Thin Film Coated with Graphene Flakes for the Reduction of Sheet Resistance

Journal of nanoscience and nanotechnology, 2013-12, Vol.13 (12), p.8090-8094

2013

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Effects of Bacillus subtilis CSL2 on the composition and functional diversity of the faecal microbiota of broiler chickens challenged with Salmonella Gallinarum

Journal of animal science and biotechnology, 2017-01, Vol.8 (2), p.450-458, Article 1

2017

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Etch Damage Reduction of Ultra Low-k Dielectric By Using Pulsed Plasmas

Meeting abstracts (Electrochemical Society), 2019-05, Vol.MA2019-01 (23), p.1193-1193

2019

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Nanoscale Spin-Transfer Torque MRAM Etching Using Various Gases

Meeting abstracts (Electrochemical Society), 2017-04, Vol.MA2017-01 (17), p.1018-1018

2017

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Application of Pulsed Plasmas for Nanoscale Etching of Semiconductor Devices : A Review

Journal of the Korean institute of surface engineering, 2015-12, Vol.48 (6), p.360-370

2015

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Etch characteristics of Si and TiO2 nanostructures using pulse biased inductively coupled plasmas

Low Global Warming Potential Alternative Gases for Plasma Chamber Cleaning

A study on the etching characteristics of magnetic tunneling junction materials using DC pulse-biased inductively coupled plasmas

Etching of Magnetic Tunnel Junction Materials Using Reactive Ion Beam

나노 반도체 소자를 위한 펄스 플라즈마 식각 기술

Highly oxidation-resistant silver nanowires by CxFy polymers using plasma treatment

Highly oxidation-resistant silver nanowires by C x F y polymers using plasma treatment

Effects of superimposed dual-frequency (13.56/2 MHz) inductively coupled plasma source on the uniformity of Ar/CF4 plasma

Etch characteristics of Si and TiO 2 nanostructures using pulse biased inductively coupled plasmas

SiO2 etch characteristics and environmental impact of Ar/C3F6O chemistry

Effect of pulse phase lag in the dual synchronized pulsed capacitive coupled plasma on the etch characteristics of SiO2 by using a C4F8/Ar/O2 gas mixture

Etch residue removal of CoFeB using CO/NH3 reactive ion beam for spin transfer torque-magnetic random access memory device

Etch characteristics of magnetic tunnel junction materials using substrate heating in the pulse-biased inductively coupled plasma

Effect of Structure and Material Variation of Focus Ring for Enhanced Etch Resistance

Nanoscale Spin-Transfer Torque MRAM Etching Using Various Gases

Etch Damage Reduction of Ultra Low-k Dielectric by Using Pulsed Plasmas

Influence of pulsed bias frequency on the etching of magnetic tunneling junction materials

Low Energy BCl3 Plasma Doping of Few-Layer Graphene

Effect of RF Pulsing Biasing on the Etching of Magnetic Tunnel Junction Materials Using CH3OH

Etch Characteristics of Magnetic Tunnel Junction Materials Using Bias Pulsing in the CH4/N2O Inductively Coupled Plasma

Plasma Treatment of Thin Film Coated with Graphene Flakes for the Reduction of Sheet Resistance

Effects of Bacillus subtilis CSL2 on the composition and functional diversity of the faecal microbiota of broiler chickens challenged with Salmonella Gallinarum

Etch Damage Reduction of Ultra Low-k Dielectric By Using Pulsed Plasmas

Nanoscale Spin-Transfer Torque MRAM Etching Using Various Gases

Application of Pulsed Plasmas for Nanoscale Etching of Semiconductor Devices : A Review

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