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Oxide interfacial phases and the electrical properties of SrBi2Ta2O9 thin films prepared by plasma-enhanced metalorganic chemical vapor deposition

Applied physics letters, 1998-03, Vol.72 (11), p.1374-1376

1998

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Transient pattern analysis for fault detection and diagnosis of HVAC systems

Energy conversion and management, 2005-11, Vol.46 (18), p.3103-3116

2005

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Chemical vapor deposition of Ru thin films by direct liquid injection of Ru(OD) 3 (OD=octanedionate)

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2000-09, Vol.18 (5), p.2400-2403

2000

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Metallorganic CVD of High-Quality PZT Thin Films at Low Temperature with New Zr and Ti Precursors Having MMP Ligands

Journal of the Electrochemical Society, 2004, Vol.151 (5), p.C283

2004

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Low temperature preparation of ferroelectric SrBi2Ta2O9 thin films by a modified RF magnetron sputtering technique

Integrated ferroelectrics, 1998-09, Vol.21 (1-4), p.475-483

1998

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MOCVD of PZT Thin Films with Different Precursor Solutions for Testing Mass-Production Compatibility

Journal of the Electrochemical Society, 2003-10, Vol.150 (10), p.C678

2003

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The low temperature processing for removal of metallic bismuth in ferroelectric SrBi2Ta2O9 thin films

Applied surface science, 1999-02, Vol.140 (1-2), p.150-155

1999

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Effect of bismuth on the ferroelectric properties of SrBi2Ta2O9 thin films deposited on Pt/SiO2/Si by a modified radio-frequency magnetron sputtering technique

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1998-07, Vol.16 (4), p.2505-2509

1998

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Preparation of fatigue-free SrBi2Ta2O9 thin films by r.f. magnetron sputtering and their ferroelectric properties

Journal of materials science, 1998, Vol.33 (11), p.2851-2855

1998

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Preparation and characterization of (Ba,Sr)TiO3 thin films by liquid source chemical vapor deposition

MRS proceedings, 2001, Vol.672

2001

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Electrical properties of SrBi2Ta2O9 thin films deposited by RF magnetron sputtering

Integrated ferroelectrics, 1997-01, Vol.18 (1-4), p.377-387

1997

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Preparation of ferroelectric YMnO3 thin films for nonvolatile memory devices by metalorganic chemical vapor deposition

Integrated ferroelectrics, 1998-01, Vol.21 (1-4), p.319-329

1998

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Temperature Dependence of the Electrical Properties of SrBi2Ta2 O 9 Thin Films Deposited by Radio‐Frequency Magnetron Sputtering

Journal of the Electrochemical Society, 1998-04, Vol.145 (4), p.1330-1334

1998

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The low temperature processing for removal of metallic bismuth in ferroelectric SrBi 2Ta 2O 9 thin films

Applied surface science, 1999, Vol.140 (1), p.150-155

1999

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Characterization of Ferroelectric SrBi2Ta2 O 9 Thin Films Deposited by a Radio Frequency Magnetron Sputtering Technique

Journal of the Electrochemical Society, 1997-08, Vol.144 (8), p.2855-2858

1997

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Chemical vapor deposition of Ru thin films by direct liquid injection of Ru(OD) sub(3) (OD identical with octanedionate)

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2000-09, Vol.18 (5), p.2400-2403

2000

Volltextzugriff (PDF)

Low temperature preparation of ferroelectric SrBi 2 Ta 2 O 9 thin films by a modified RF magnetron sputtering technique

Integrated ferroelectrics, 1998-09, Vol.21 (1-4), p.475-483

1998

Volltextzugriff (PDF)

Preparation and characterization of (Ba,Sr)TiO 3 thin films by liquid source chemical vapor deposition

MRS proceedings, 2001, Vol.672, Article O9.2

2001

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Electrical properties of SrBi 2 Ta 2 O 9 thin films deposited by RF magnetron sputtering

Integrated ferroelectrics, 1997-09, Vol.18 (1-4), p.377-387

1997

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Low temperature metal-organic chemical vapor deposition of (Ba, Sr)TiO 3 thin films for capacitor applications

Integrated ferroelectrics, 2000-10, Vol.30 (1-4), p.37-44

2000

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Preparation of ferroelectric YMnO 3 thin films for nonvolatile memory devices by metalorganic chemical vapor deposition

Integrated ferroelectrics, 1998-09, Vol.21 (1-4), p.319-329

1998

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The Correlation Between Composition and Preferred Orientation of Ferroelectric SrBi[sub 2]Ta[sub 2]O[sub 9] Thin Films

Electrochemical and solid-state letters, 1999, Vol.2 (1), p.39

Yang, Cheol-Hoon

1999

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Ferroelectric Properties of SrBi 2 Ta 2 O 9 Thin Films Deposited on Various Bottom Electrodes by a Modified Radio-Frequency Magnetron Sputtering Technique

Japanese Journal of Applied Physics, 1998-10, Vol.37 (10R), p.5549

1998

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Low temperature metal-organic chemical vapor deposition of (Ba, Sr)TiO3 thin films for capacitor applications

Integrated ferroelectrics, 2000-01, Vol.30 (1-4), p.37-44

2000

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Identification of contributors to HDD servo errors by measuring PES only

IEEE transactions on magnetics, 2001-03, Vol.37 (2), p.883-887

2001

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Oxide interfacial phases and the electrical properties of SrBi2Ta2O9 thin films prepared by plasma-enhanced metalorganic chemical vapor deposition

Transient pattern analysis for fault detection and diagnosis of HVAC systems

Chemical vapor deposition of Ru thin films by direct liquid injection of Ru(OD) 3 (OD=octanedionate)

Metallorganic CVD of High-Quality PZT Thin Films at Low Temperature with New Zr and Ti Precursors Having MMP Ligands

Low temperature preparation of ferroelectric SrBi2Ta2O9 thin films by a modified RF magnetron sputtering technique

MOCVD of PZT Thin Films with Different Precursor Solutions for Testing Mass-Production Compatibility

The low temperature processing for removal of metallic bismuth in ferroelectric SrBi2Ta2O9 thin films

Effect of bismuth on the ferroelectric properties of SrBi2Ta2O9 thin films deposited on Pt/SiO2/Si by a modified radio-frequency magnetron sputtering technique

Preparation of fatigue-free SrBi2Ta2O9 thin films by r.f. magnetron sputtering and their ferroelectric properties

Preparation and characterization of (Ba,Sr)TiO3 thin films by liquid source chemical vapor deposition

Electrical properties of SrBi2Ta2O9 thin films deposited by RF magnetron sputtering

Preparation of ferroelectric YMnO3 thin films for nonvolatile memory devices by metalorganic chemical vapor deposition

Temperature Dependence of the Electrical Properties of SrBi2Ta2 O 9 Thin Films Deposited by Radio‐Frequency Magnetron Sputtering

The low temperature processing for removal of metallic bismuth in ferroelectric SrBi 2Ta 2O 9 thin films

Characterization of Ferroelectric SrBi2Ta2 O 9 Thin Films Deposited by a Radio Frequency Magnetron Sputtering Technique

Chemical vapor deposition of Ru thin films by direct liquid injection of Ru(OD) sub(3) (OD identical with octanedionate)

Low temperature preparation of ferroelectric SrBi 2 Ta 2 O 9 thin films by a modified RF magnetron sputtering technique

Preparation and characterization of (Ba,Sr)TiO 3 thin films by liquid source chemical vapor deposition

Electrical properties of SrBi 2 Ta 2 O 9 thin films deposited by RF magnetron sputtering

Low temperature metal-organic chemical vapor deposition of (Ba, Sr)TiO 3 thin films for capacitor applications

Preparation of ferroelectric YMnO 3 thin films for nonvolatile memory devices by metalorganic chemical vapor deposition

The Correlation Between Composition and Preferred Orientation of Ferroelectric SrBi[sub 2]Ta[sub 2]O[sub 9] Thin Films

Ferroelectric Properties of SrBi 2 Ta 2 O 9 Thin Films Deposited on Various Bottom Electrodes by a Modified Radio-Frequency Magnetron Sputtering Technique

Low temperature metal-organic chemical vapor deposition of (Ba, Sr)TiO3 thin films for capacitor applications

Identification of contributors to HDD servo errors by measuring PES only

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