UB Paderborn / Katalog / Suche / in CDI

Sortiert nach

Einfacher Volltextzugriff von (fast) überall

Installieren Sie die LibKey Nomad-Browsererweiterung und erhalten Sie von vielen Webseiten einfachen Zugriff auf lizenzierte Volltexte oder Open Access Publikationen. Mehr erfahren...

Atmospheric pressure plasmas for surface modification of flexible and printed electronic devices: A review

Thin solid films, 2016-01, Vol.598, p.315-334

2016

Volltextzugriff (PDF)

The enhancement of Hall mobility and conductivity of CVD graphene through radical doping and vacuum annealing

RSC advances, 2017, Vol.7 (26), p.16104-16108

2017

Volltextzugriff (PDF)

Recent Advances in Doping of Molybdenum Disulfide: Industrial Applications and Future Prospects

Advanced materials (Weinheim), 2016-11, Vol.28 (41), p.9024-9059

2016

Volltextzugriff (PDF)

Effect of large work function modulation of MoS2 by controllable chlorine doping using a remote plasma

Journal of materials chemistry. C, Materials for optical and electronic devices, 2020, Vol.8 (5), p.1846-1851

2020

Volltextzugriff (PDF)

Selective etching of silicon nitride over silicon oxide using ClF3/H2 remote plasma

Scientific reports, 2022-04, Vol.12 (1), p.5703-5703, Article 5703

2022

Volltextzugriff (PDF)

Atomically Thin-Layered Molybdenum Disulfide (MoS2) for Bulk-Heterojunction Solar Cells

ACS applied materials & interfaces, 2017-02, Vol.9 (4), p.3223-3245

2017

Volltextzugriff (PDF)

Anisotropic atomic layer etching of W using fluorine radicals/oxygen ion beam

Plasma processes and polymers, 2019-09, Vol.16 (9), p.n/a

2019

Volltextzugriff (PDF)

High-Performance 2D Rhenium Disulfide (ReS2) Transistors and Photodetectors by Oxygen Plasma Treatment

Advanced materials (Weinheim), 2016-08, Vol.28 (32), p.6985-6992

2016

Volltextzugriff (PDF)

Low-Temperature Synthesis of Large-Scale Molybdenum Disulfide Thin Films Directly on a Plastic Substrate Using Plasma-Enhanced Chemical Vapor Deposition

Advanced materials (Weinheim), 2015-09, Vol.27 (35), p.5223-5229

2015

Volltextzugriff (PDF)

An Optogenetics‐Inspired Flexible van der Waals Optoelectronic Synapse and its Application to a Convolutional Neural Network

Advanced materials (Weinheim), 2021-10, Vol.33 (40), p.e2102980-n/a

2021

Volltextzugriff (PDF)

Ultrasensitive MoS2 photodetector by serial nano-bridge multi-heterojunction

Nature communications, 2019-10, Vol.10 (1), p.1-10, Article 4701

2019

Volltextzugriff (PDF)

Atomic Layer Etching Mechanism of MoS2 for Nanodevices

ACS applied materials & interfaces, 2017-04, Vol.9 (13), p.11967-11976

2017

Volltextzugriff (PDF)

A High-Performance WSe2/h-BN Photodetector using a Triphenylphosphine (PPh3)-Based n-Doping Technique

Advanced materials (Weinheim), 2016-06, Vol.28 (24), p.4824-4831

2016

Volltextzugriff (PDF)

The device level modulation of carrier transport in a 2D WSe2 field effect transistor via a plasma treatment

Nanoscale, 2019-10, Vol.11 (37), p.17368-17375

2019

Volltextzugriff (PDF)

Direct nanoparticle coating using atmospheric plasma jet

Journal of nanoparticle research : an interdisciplinary forum for nanoscale science and technology, 2020-06, Vol.22 (6), Article 136

2020

Volltextzugriff (PDF)

Hierarchical nanostructures of nitrogen-doped molybdenum sulphide for supercapacitors

RSC advances, 2018-01, Vol.8 (69), p.39749-39755

2018

Volltextzugriff (PDF)

A Van Der Waals Reconfigurable Multi‐Valued Logic Device and Circuit Based on Tunable Negative‐Differential‐Resistance Phenomenon

Advanced materials (Weinheim), 2022-09, Vol.34 (36), p.e2202799-n/a

2022

Volltextzugriff (PDF)

A comparative study of CF4/O2/Ar and C4F8/O2/Ar plasmas for dry etching applications

Thin solid films, 2015-03, Vol.579, p.136-143

2015

Volltextzugriff (PDF)

Atomic layer etching of chrome using ion beams

Nanotechnology, 2019-02, Vol.30 (8), p.85303-085303

2019

Volltextzugriff (PDF)

Selective isotropic etching of SiO2 over Si3N4 using NF3/H2 remote plasma and methanol vapor

Scientific reports, 2023-07, Vol.13 (1), p.11599-11599, Article 11599

2023

Volltextzugriff (PDF)

Silicon Nitride Deposition for Flexible Organic Electronic Devices by VHF (162 MHz)-PECVD Using a Multi-Tile Push-Pull Plasma Source

Scientific reports, 2017-10, Vol.7 (1), p.13585-7, Article 13585

2017

Volltextzugriff (PDF)

Fabrication of high-performance graphene nanoplatelet-based transparent electrodes via self-interlayer-exfoliation control

Nanoscale, 2018-02, Vol.10 (5), p.2351-2362

2018

Volltextzugriff (PDF)

Preface for ENGE 2014 special issue

Thin solid films, 2015-09, Vol.590, p.306

2015

Volltextzugriff (PDF)

Atomic layer etching of graphene through controlled ion beam for graphene-based electronics

Scientific reports, 2017-05, Vol.7 (1), p.2462-9, Article 2462

2017

Volltextzugriff (PDF)

A Van Der Waals Reconfigurable Multi‐Valued Logic Device and Circuit Based on Tunable Negative‐Differential‐Resistance Phenomenon (Adv. Mater. 36/2022)

Advanced materials (Weinheim), 2022-09, Vol.34 (36), p.n/a

2022

Volltextzugriff (PDF)

1 – 25 von 512

Suche als RSS-Feed

Suchergebnisse filtern

Filter anzeigen

Nur zeigen

Geprüft (Peer-Review)
(413)
Mit Volltextzugriff
(413)

Publikationsform

Sprache

Erscheinungsjahr

n.n

Thema

Science & Technology
(298)
Physical Sciences
(269)
Physics
(265)
Physics, Applied
(218)
Materials Science
(185)
Technology
(185)
Materials Science, Multidisciplinary
(127)
Science & Technology - Other Topics
(95)
Nanoscience & Nanotechnology
(90)
Chemistry
(89)
Physics, Condensed Matter
(76)
Chemistry, Multidisciplinary
(56)
Materials Science, Coatings & Films
(53)
Etching
(52)
Exact Sciences And Technology
(49)
Inductively Coupled Plasma
(43)
Plasma
(43)
Chemistry, Physical
(36)
Engineering
(23)
Thin Films
(23)

15 weitere anzeigen...

Weniger anzeigen...

Neu hinzugefügt

... seit 30 Tagen
(3)
... seit 90 Tagen
(11)

Menü

Weitere Dienste

Einstellungen

Atmospheric pressure plasmas for surface modification of flexible and printed electronic devices: A review

The enhancement of Hall mobility and conductivity of CVD graphene through radical doping and vacuum annealing

Recent Advances in Doping of Molybdenum Disulfide: Industrial Applications and Future Prospects

Effect of large work function modulation of MoS2 by controllable chlorine doping using a remote plasma

Selective etching of silicon nitride over silicon oxide using ClF3/H2 remote plasma

Atomically Thin-Layered Molybdenum Disulfide (MoS2) for Bulk-Heterojunction Solar Cells

Anisotropic atomic layer etching of W using fluorine radicals/oxygen ion beam

High-Performance 2D Rhenium Disulfide (ReS2) Transistors and Photodetectors by Oxygen Plasma Treatment

Low-Temperature Synthesis of Large-Scale Molybdenum Disulfide Thin Films Directly on a Plastic Substrate Using Plasma-Enhanced Chemical Vapor Deposition

An Optogenetics‐Inspired Flexible van der Waals Optoelectronic Synapse and its Application to a Convolutional Neural Network

Ultrasensitive MoS2 photodetector by serial nano-bridge multi-heterojunction

Atomic Layer Etching Mechanism of MoS2 for Nanodevices

A High-Performance WSe2/h-BN Photodetector using a Triphenylphosphine (PPh3)-Based n-Doping Technique

The device level modulation of carrier transport in a 2D WSe2 field effect transistor via a plasma treatment

Direct nanoparticle coating using atmospheric plasma jet

Hierarchical nanostructures of nitrogen-doped molybdenum sulphide for supercapacitors

A Van Der Waals Reconfigurable Multi‐Valued Logic Device and Circuit Based on Tunable Negative‐Differential‐Resistance Phenomenon

A comparative study of CF4/O2/Ar and C4F8/O2/Ar plasmas for dry etching applications

Atomic layer etching of chrome using ion beams

Selective isotropic etching of SiO2 over Si3N4 using NF3/H2 remote plasma and methanol vapor

Silicon Nitride Deposition for Flexible Organic Electronic Devices by VHF (162 MHz)-PECVD Using a Multi-Tile Push-Pull Plasma Source

Fabrication of high-performance graphene nanoplatelet-based transparent electrodes via self-interlayer-exfoliation control

Preface for ENGE 2014 special issue

Atomic layer etching of graphene through controlled ion beam for graphene-based electronics

A Van Der Waals Reconfigurable Multi‐Valued Logic Device and Circuit Based on Tunable Negative‐Differential‐Resistance Phenomenon (Adv. Mater. 36/2022)

Suchergebnisse filtern