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Using block copolymer architecture to achieve sub-10 nm periods

Polymer (Guilford), 2017-07, Vol.121 (C), p.297-303

2017

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Integration of nanoimprint lithography with block copolymer directed self-assembly for fabrication of a sub-20 nm template for bit-patterned media

Nanotechnology, 2014-10, Vol.25 (39), p.395301-395301

2014

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Graphoepitaxy of cylinder-forming block copolymers for use as templates to pattern magnetic metal dot arrays

Nanotechnology, 2005-07, Vol.16 (7), p.S324-S329

2005

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Advanced Lithography for Bit Patterned Media

IEEE transactions on magnetics, 2009-02, Vol.45 (2), p.833-838

2009

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Circular Nanopatterns over Large Areas from the Self-Assembly of Block Copolymers Guided by Shallow Trenches

ACS nano, 2011-04, Vol.5 (4), p.2855-2860

2011

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A facile route to regular and nonregular dot arrays by integrating nanoimprint lithography with sphere-forming block copolymer directed self-assembly

Journal of polymer science. Part B, Polymer physics, 2014-03, Vol.52 (5), p.361-367

2014

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Solvent-Assisted Directed Self-Assembly of Spherical Microdomain Block Copolymers to High Areal Density Arrays

Advanced materials (Weinheim), 2013-07, Vol.25 (27), p.3677-3682

2013

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A General Route to Macroscopic Hierarchical 3D Nanowire Networks

Angewandte Chemie International Edition, 2004-11, Vol.43 (45), p.6169-6173

2004

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Directed Self‐Assembly of Block Copolymer for Bit Patterned Media with Areal Density of 1.5 Teradot/Inch 2 and Beyond

Journal of nanomaterials, 2013-12, Vol.2013 (1)

2013

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A Novel Approach to Addressable 4 Teradot/in.2 Patterned Media

Advanced materials (Weinheim), 2009-06, Vol.21 (24), p.2516-2519

2009

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Nanoimprint lithography guiding templates for advanced magnetic media fabrication

Journal of vacuum science and technology. B, Nanotechnology & microelectronics, 2024-01, Vol.42 (1)

2024

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Nanoscopic templates using self-assembled cylindrical diblock copolymers for patterned media

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2004-11, Vol.22 (6), p.3331-3334

2004

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Directed Block Copolymer Assembly versus Electron Beam Lithography for Bit-Patterned Media with Areal Density of 1 Terabit/inch(2) and Beyond

ACS nano, 2009-07, Vol.3 (7), p.1844-1858

2009

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Servo-Integrated Patterned Media by Hybrid Directed Self-Assembly

ACS nano, 2014-11, Vol.8 (11), p.11854-11859

2014

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Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template

Advanced materials (Weinheim), 2015-08, Vol.27 (29), p.4364-4370

2015

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Fabrication of Silicon Oxide Nanodots with an Areal Density Beyond 1 Teradots Inch−2

Advanced materials (Weinheim), 2011-12, Vol.23 (48), p.5755-5761

2011

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Fabrication of silicon oxide nanodots with an areal density beyond 1 teradots inch(-2)

Advanced materials (Weinheim), 2011-12, Vol.23 (48), p.5755-5761

2011

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Corrigendum: A facile route to regular and non-regular dot arrays by integrating nanoimprint lithography with sphere-forming block copolymer directed self-assembly

Journal of polymer science. Part B, Polymer physics, 2014-06, Vol.52 (11), p.789-789

2014

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Aligned nanowires and nanodots by directed block copolymer assembly

Nanotechnology, 2011-07, Vol.22 (30), p.305302-1-8

2011

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Directed self-assembly for high-density bit-patterned media fabrication using spherical block copolymers

Journal of micro/nanolithography, MEMS, and MOEMS, 2013-08, Vol.12 (3), p.31110

2013

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Directed Block Copolymer Assembly versus Electron Beam Lithography for Bit-Patterned Media with Areal Density of 1 Terabit/inch 2 and Beyond

ACS nano, 2009-07, Vol.3 (7), p.1844-1858

2009

Volltextzugriff (PDF)

A Novel Approach to Addressable 4 Teradot/in. 2 Patterned Media

Advanced materials (Weinheim), 2009-06, Vol.21 (24), p.2516-2519

2009

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Directed Self-Assembly of Block Copolymer for Bit Patterned Media with Areal Density of 1.5 Teradot/Inch2 and Beyond

Journal of nanomaterials, 2013-01, Vol.2013 (2013), p.1-17

2013

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Heated Dot Magnetic Recording Media - Path to 10 Tdots/in2

2016 International Conference of Asian Union of Magnetics Societies (ICAUMS), 2016, p.1-1

2016

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A General Route to Macroscopic Hierarchical 3D Nanowire Networks

Angewandte Chemie, 2004-11, Vol.116 (45), p.6295-6299

2004

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Using block copolymer architecture to achieve sub-10 nm periods

Integration of nanoimprint lithography with block copolymer directed self-assembly for fabrication of a sub-20 nm template for bit-patterned media

Graphoepitaxy of cylinder-forming block copolymers for use as templates to pattern magnetic metal dot arrays

Advanced Lithography for Bit Patterned Media

Circular Nanopatterns over Large Areas from the Self-Assembly of Block Copolymers Guided by Shallow Trenches

A facile route to regular and nonregular dot arrays by integrating nanoimprint lithography with sphere-forming block copolymer directed self-assembly

Solvent-Assisted Directed Self-Assembly of Spherical Microdomain Block Copolymers to High Areal Density Arrays

A General Route to Macroscopic Hierarchical 3D Nanowire Networks

Directed Self‐Assembly of Block Copolymer for Bit Patterned Media with Areal Density of 1.5 Teradot/Inch 2 and Beyond

A Novel Approach to Addressable 4 Teradot/in.2 Patterned Media

Nanoimprint lithography guiding templates for advanced magnetic media fabrication

Nanoscopic templates using self-assembled cylindrical diblock copolymers for patterned media

Directed Block Copolymer Assembly versus Electron Beam Lithography for Bit-Patterned Media with Areal Density of 1 Terabit/inch(2) and Beyond

Servo-Integrated Patterned Media by Hybrid Directed Self-Assembly

Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template

Fabrication of Silicon Oxide Nanodots with an Areal Density Beyond 1 Teradots Inch−2

Fabrication of silicon oxide nanodots with an areal density beyond 1 teradots inch(-2)

Corrigendum: A facile route to regular and non-regular dot arrays by integrating nanoimprint lithography with sphere-forming block copolymer directed self-assembly

Aligned nanowires and nanodots by directed block copolymer assembly

Directed self-assembly for high-density bit-patterned media fabrication using spherical block copolymers

Directed Block Copolymer Assembly versus Electron Beam Lithography for Bit-Patterned Media with Areal Density of 1 Terabit/inch 2 and Beyond

A Novel Approach to Addressable 4 Teradot/in. 2 Patterned Media

Directed Self-Assembly of Block Copolymer for Bit Patterned Media with Areal Density of 1.5 Teradot/Inch2 and Beyond

Heated Dot Magnetic Recording Media - Path to 10 Tdots/in2

A General Route to Macroscopic Hierarchical 3D Nanowire Networks

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