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Effect of fluorine implantation dose on boron thermal diffusion in silicon

Journal of applied physics, 2004-10, Vol.96 (8), p.4114-4121

2004

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Suppression of boron diffusion due to carbon during rapid thermal annealing of SiGe based device materials-some comments

Journal of materials science, 2006-02, Vol.41 (3), p.1013-1016

2006

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Design and processing of porous materials for electronic applications

Philosophical transactions of the Royal Society of London. Series A: Mathematical, physical, and engineering sciences, 2006-01, Vol.364 (1838), p.175-187

Willoughby, A.F.W

2006

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Potability Evaluation of Selected River Waters in Ebonyi State, Nigeria

Nigerian journal of technological development, 2015-06, Vol.12 (1), p.27-35

2015

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Effect of fluorine implantation dose on boron transient enhanced diffusion and boron thermal diffusion in Si1-xGex

IEEE transactions on electron devices, 2005-04, Vol.52 (4), p.518-526

2005

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Zinc diffusion tellurium doped gallium antimonide

Journal of electronic materials, 1996-07, Vol.25 (7), p.1108-1112

1996

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Antimony and boron diffusion in SiGe and Si under the influence of injected point defects

Journal of materials science. Materials in electronics, 2001-06, Vol.12 (4-6), p.219-221

2001

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Stress characterization of device layers and the underlying Si1-xGex virtual substrate with high-resolution micro-Raman spectroscopy

Journal of materials science. Materials in electronics, 2003-05, Vol.14 (5-7), p.455-458

2003

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Diffusion of boron in heavily doped n- and p-type silicon

Journal of applied physics, 1986, Vol.59 (7), p.2392-2397

1986

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Self-diffusion in gallium arsenide

Journal of electronic materials, 1983-09, Vol.12 (5), p.863-877

1983

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Hardness anisotropy of III-V semiconducting compounds and alloys

Journal of applied physics, 1984-09, Vol.56 (6), p.1869-1871

1984

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Characterization of morphology and defects in silicon-germanium virtual substrates

Journal of materials science. Materials in electronics, 2000-10, Vol.11 (7), p.549-556

2000

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Boron diffusion across silicon–silicon germanium boundaries

Journal of applied physics, 1998-02, Vol.83 (4), p.1988-1994

1998

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Growth method, composition, and defect structure dependence of mercury diffusion in CdxHg1-xTe

Journal of electronic materials, 1993-08, Vol.22 (8), p.967-971

1993

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The diffusion of gold in 'semi-infinite' single crystals of silicon

Philosophical magazine (London, England : 1945), 1973-12, Vol.28 (6), p.1319-1340

1973

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Effect of point defect injection on diffusion of boron in silicon and silicon–germanium in the presence of carbon

Journal of applied physics, 2005-06, Vol.97 (11)

2005

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Effect of point defect injection on diffusion of boron in siliconand silicon-germanium in the presence of carbon

Journal of applied physics, 2005-06, Vol.97 (11), p.113531-113531-7

2005

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The Effect of Dislocation Density on the Diffusion of Gold in Thin Silicon Slices

Journal of the Electrochemical Society, 1973, Vol.120 (3), p.414

1973

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Indentation fracture in the In1-xGaxAsyP1-y/InP system and its effect on microhardness anisotropy characteristics

Journal of materials science, 1988, Vol.23 (1), p.272-280

1988

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Effect of fluorine implantation dose on boron transient enhanced diffusion and boron thermal diffusion in Si sub(1-x)Ge sub(x)

IEEE transactions on electron devices, 2005-01, Vol.52 (4)

2005

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Arsenic diffusion in Si and strained SixGe1-x alloys at 1000DGC

Materials science & engineering. B, Solid-state materials for advanced technology, 2004-12, Vol.114-115, p.349-351

2004

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Effect of fluorine implantation dose on boron transient enhanced diffusion and boron thermal diffusion in Si/sub 1-x/Ge/sub x

IEEE transactions on electron devices, 2005-04, Vol.52 (4), p.518-526

2005

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Precious metal content of alloys

British dental journal, 1988-08, Vol.165 (4), p.118-119

1988

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The microhardness of CdxHg1-xTe

Journal of materials science, 1982-07, Vol.17 (7), p.2061-2066

1982

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Development and performance evaluation of single row manual seed planter

Journal of Agricultural and Crop Research, 2019-03, Vol.7 (3), p.31-37

2019

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Effect of fluorine implantation dose on boron thermal diffusion in silicon

Suppression of boron diffusion due to carbon during rapid thermal annealing of SiGe based device materials-some comments

Design and processing of porous materials for electronic applications

Potability Evaluation of Selected River Waters in Ebonyi State, Nigeria

Effect of fluorine implantation dose on boron transient enhanced diffusion and boron thermal diffusion in Si1-xGex

Zinc diffusion tellurium doped gallium antimonide

Antimony and boron diffusion in SiGe and Si under the influence of injected point defects

Stress characterization of device layers and the underlying Si1-xGex virtual substrate with high-resolution micro-Raman spectroscopy

Diffusion of boron in heavily doped n- and p-type silicon

Self-diffusion in gallium arsenide

Hardness anisotropy of III-V semiconducting compounds and alloys

Characterization of morphology and defects in silicon-germanium virtual substrates

Boron diffusion across silicon–silicon germanium boundaries

Growth method, composition, and defect structure dependence of mercury diffusion in CdxHg1-xTe

The diffusion of gold in 'semi-infinite' single crystals of silicon

Effect of point defect injection on diffusion of boron in silicon and silicon–germanium in the presence of carbon

Effect of point defect injection on diffusion of boron in siliconand silicon-germanium in the presence of carbon

The Effect of Dislocation Density on the Diffusion of Gold in Thin Silicon Slices

Indentation fracture in the In1-xGaxAsyP1-y/InP system and its effect on microhardness anisotropy characteristics

Effect of fluorine implantation dose on boron transient enhanced diffusion and boron thermal diffusion in Si sub(1-x)Ge sub(x)

Arsenic diffusion in Si and strained SixGe1-x alloys at 1000DGC

Effect of fluorine implantation dose on boron transient enhanced diffusion and boron thermal diffusion in Si/sub 1-x/Ge/sub x

Precious metal content of alloys

The microhardness of CdxHg1-xTe

Development and performance evaluation of single row manual seed planter

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